Temperature dependent impedance mitigation in non-volatile memory

ABSTRACT

A memory system is provided with technology for performing temperature dependent impedance mitigation, in addition to or instead of other techniques to compensate for differences in impedance. For example, the memory system comprises a plurality of non-volatile memory cells, a first pathway connected to the plurality of non-volatile memory cells, a second pathway connected to the plurality of non-volatile memory cells, and a control circuit connected to the first pathway and the second pathway. The control circuit is configured to compensate based on temperature for a temperature dependent impedance mismatch between the first pathway and the second pathway during a memory operation on the plurality of non-volatile memory cells.

BACKGROUND

A “pathway” is any tangible medium capable of transmitting an electrical signal along the pathway. A pathway may include a wire, trace, transmission line, track, pad, layer, lead, metal, portion of a printed circuit board or assembly, conducting material and other material that may transfer or carry an electrical signal.

Impedance mismatches can occur between different pathways in an electrical circuit. Impedance is a function of resistance and capacitance. An impedance mismatch between two pathways can result in different voltage drops along the two pathways. An impedance mismatch between two pathways can also result in different RC (resistance-capacitance) delays along the two pathways. The different voltage drops or different delays due to an impedance mismatch may degrade performance of a circuit.

BRIEF DESCRIPTION OF THE DRAWINGS

Like-numbered elements refer to common components in the different figures.

FIG. 1 is a functional block diagram of one embodiment of a memory device.

FIG. 2 is a block diagram depicting one embodiment of a memory system.

FIG. 3 is a perspective view of one embodiment of a memory device comprising a set of blocks in an example 3D configuration.

FIG. 3A is a block diagram of one embodiment of a memory structure having two planes.

FIG. 3B is a perspective view of a portion of one example embodiment of a monolithic three dimensional memory array.

FIG. 3C depicts a diagram of one embodiment of a memory structure having four planes.

FIG. 3D depicts a top view of a portion of one embodiment of a block comprising memory cells.

FIG. 4 depicts an example cross-sectional view along line AA in FIG. 3C.

FIG. 5 depicts an example transistor 590.

FIG. 6A depicts a close-up view of the region 522 of the stack of FIG. 4.

FIG. 6B depicts a close-up view of the region 523 of the stack of FIG. 4.

FIG. 6C is a diagram that shows details of one embodiment of circuits for applying voltages to a memory structure.

FIG. 7 depicts one embodiment of a process for performing an erase operation.

FIG. 8 depicts the movement of holes and electrons in a NAND string during one embodiment of a two-sided erase.

FIGS. 9A and 9B are circuit diagrams of embodiments of a NAND string and pathways for the NAND string.

FIG. 10 depicts an example voltage pulse.

FIGS. 10A, 10B, and 10C depicts possible voltage pulses in embodiments of operating a memory device.

FIG. 11 is a flowchart of one embodiment of a process of a two-sided GIDL erase.

FIGS. 12A, 12B, and 12C depict voltage pulses of embodiments of two-sided GIDL erase.

FIGS. 13A and 13B are circuit diagrams of embodiments of a NAND string and pathways for the NAND string.

FIGS. 14A and 14B are diagrams of embodiments of circuitry that is configured to provide a voltage pulse to a select line.

FIG. 15A is a graph of voltage pulses that occur at select transistors, in one embodiment of a two-sided GIDL erase.

FIG. 15B is a graph of voltage pulses that are applied to pathways, in one embodiment of a two-sided GIDL erase.

FIG. 16 depicts voltage pulses that occur at the select transistors in one embodiment of a two-sided GIDL erase.

FIG. 17 is a diagram of voltage pulses that are applied to various pathways in one embodiment of a two-sided GIDL erase.

FIG. 18 shows voltage pulses of one embodiment of a two-sided GIDL erase.

FIG. 19 is a diagram of one embodiment of an apparatus that is configured to compensate for impedance differences between pathways.

FIG. 20 is a flowchart of one embodiment of a process of mitigating for impedance mismatch between pathways.

FIG. 21 is a flowchart of one embodiment of a process of mitigating for impedance mismatch between pathways.

FIG. 22 is a diagram of plane that contains blocks (BLK) of non-volatile memory cells.

FIG. 23 is a diagram of a plane that contains blocks (BLK) of non-volatile memory cells.

FIG. 24 is a diagram to illustrate one embodiment of pathways to a selected block.

FIG. 25 is a diagram to illustrate one embodiment of pathways to a selected block.

FIG. 26 is a graph depicting voltage versus time at selected blocks for several signals that may be generated for the memory system of FIGS. 23-25.

FIG. 27 is a flowchart of an embodiment of a process of compensating for impedance mismatch.

FIG. 28 is a graph depicting voltage versus time at selected blocks for several signals that may be generated for the memory system in FIGS. 23-25.

FIG. 29 depicts further details of an embodiment of controlling the timing of the signals from the sense amplifiers and SGD driver.

FIG. 30 is a table showing one embodiment of compensation parameters.

FIG. 31 is a table of an embodiment that controls the steady state magnitudes of the bit line voltage from a sense amplifier and the SGD voltage from the SGD driver.

FIG. 32 is a graph of voltage versus time for two different signals in a non-volatile memory system.

FIG. 33 is a flow chart describing one embodiment of a process for erasing that includes mitigating for impedance mismatches.

FIG. 34 is a circuit diagram of embodiments of a NAND string and pathways for the NAND string.

FIG. 35 is a circuit diagram of embodiments of a NAND string and pathways for the NAND string.

FIG. 36A is a block diagram of one embodiment of a temperature compensation circuit.

FIG. 36B is a circuit diagram of one embodiment of a temperature compensation circuit.

FIG. 36C is a table describing one example of operating one embodiment of a temperature compensation circuit.

FIG. 37 depicts further details of an embodiment of controlling the timing of the signals from the sense amplifiers and SGD driver.

DETAILED DESCRIPTION

Technology is provided to compensate for impedance mismatches between different pathways.

A set of electrical circuit elements may include a first pathway, a second pathway, a third pathway and a fourth pathway. The first pathway is connected to a first voltage source. The second pathway is connected to a second voltage source. The third pathway is connected to a third voltage source. The four pathway is connected to a fourth voltage source. Due to an impedance mismatch between the first pathway and the second pathway, the signals from the first voltage source and the second voltage source may not be as effective as designed. To compensate for that impedance mismatch between the first pathway and the second pathway, a first technique includes adjusting the magnitude, start time and/or ramp time of the signals from the first voltage source and/or second voltage source. In a second technique, rather than or in addition to making a compensation based on a signal applied to the first and/or the second pathways, a compensation is made to mitigate an impedance mismatch between the first and second pathways by adjusting a signal applied to third pathway from the third voltage source and/or a signal applied to fourth pathway from the fourth voltage source. In a third technique, rather than or in addition to the first technique and/or the second technique mentioned above, a compensation is made to mitigate an impedance mismatch between the first pathway and the second pathway based on the location of the circuit elements in relation to the voltage drivers (e.g., the first voltage source, the second voltage source, the third voltage source and the fourth voltage source).

A fourth technique to compensate for impedance mismatches between pathways is now proposed that includes accounting for temperature dependence of impedance of the pathways. This fourth technique can be performed in addition to or instead of any one of or all of the first, second or third techniques mentioned above.

The techniques to compensate for impedance mismatches between pathways can be used on many different types of circuits. One example includes a memory system being provided with technology for performing temperature dependent impedance mitigation (the fourth technique) in addition to or instead of the first, second and/or third techniques. In one embodiment, the memory system comprises a plurality of non-volatile memory cells, a first pathway connected to the plurality of non-volatile memory cells, a second pathway connected to the plurality of non-volatile memory cells, a third pathway connected to the plurality of non-volatile memory cells, a fourth pathway connected to the plurality of non-volatile memory cells, and a control circuit connected to the first pathway and the second pathway. The control circuit is configured to compensate based on temperature for a temperature dependent impedance mismatch between the first pathway and the second pathway during a memory operation on the plurality of non-volatile memory cells.

In one embodiment of a memory system, the first pathway includes a bit line connected to a terminal (e.g., “bit line terminal”) of a first select transistor on a NAND string, the second pathway includes a source line connected to a terminal (e.g., “source line terminal”) of a second select transistor on the NAND string, the third pathway includes a first select line connected to a control terminal (e.g., gate terminal) of the first select transistor, and the fourth pathway includes a second select line connected to a control terminal (e.g., gate terminal) of the second select transistor. In one embodiment, the first and second pathways have different impedances. For example, the bit line and the source line might have different impedances that are voltage independent (e.g., the impedances are not the same regardless of the voltage); the first and second pathways may have different lengths due to positioning of the NAND string and the voltage sources; and/or the first and second pathways may change impedance at different rates per change in temperature. Thus, while voltage pulses applied to the first and second pathways may have substantially the same magnitude and substantially the same start time, due to the impedance mismatch between the first and second pathways, the voltage magnitudes, start times and/or ramp times are different at the terminals of the select transistors connected to the bit line and source line. In one embodiment, the voltages that are applied to the bit line, source line, first select line and/or second select line are adjusted to compensate for the different voltage magnitudes, ramp times and/or start times at the terminals of the select transistors connected to the bit line and source line. In one embodiment, this results in substantially the same magnitude for the gate terminal to bit line terminal voltage for the first select transistor and the gate terminal to source line terminal voltage for the second select transistor. In one embodiment, the impedance of any one or more of the pathways can be adjusted to account for any of the impedance mismatches discussed above.

As mentioned above, it is proposed to compensate based on temperature for a temperature dependent impedance mismatch between the first pathway and the second pathway during a memory operation on the plurality of non-volatile memory cells. One example of a memory operation is an erase operation. However, the proposed technology can also be used with program/write operations, read operations or other operations.

One technique to erase memory cells in some memory devices is to bias a p-well (or other types of) substrate to a high voltage to charge up a NAND channel. An erase enable voltage is applied to control gates of memory cells while the NAND channel is at a high voltage to erase the non-volatile storage elements (memory cells). Another approach to erasing memory cells is to generate gate induced drain leakage (GIDL) current to charge up the NAND string channel. An erase enable voltage is applied to control gates of the memory cells, while maintaining the string channel potential to erase the memory cells.

In one embodiment, the GIDL current is generated by causing a drain-to-gate voltage at a select transistor. A transistor drain-to-gate voltage that generates a GIDL current is referred to herein as a GIDL voltage. The GIDL current may result when the select transistor drain voltage is significantly higher than the select transistor control gate voltage. GIDL current is a result of carrier generation, i.e., electron-hole pair generation due to band-to-band tunneling and/or trap-assisted generation. In one embodiment, GIDL current may result in one type of carriers, e.g., holes, predominantly moving into NAND channel, thereby raising potential of the channel. The other type of carriers, e.g., electrons, are extracted from the channel, in the direction of a bit line or in the direction of a source line, by an electric field. During erase, the holes may tunnel from the channel to a charge storage region of memory cells and recombine with electrons there, to lower the threshold voltage of the memory cells.

The GIDL current may be generated at either end of the NAND string. A first GIDL voltage may be created between two terminals of a select transistor (e.g., drain side select transistor) that is connected to a bit line to generate a first GIDL current. A second GIDL voltage may be created between two terminals of a select transistor (e.g., source side select transistor) that is connected to a source line to generate a second GIDL current. Erasing based on GIDL current at only one end of the NAND string is referred to as a one-sided GIDL erase. Erasing based on GIDL current at both ends of the NAND string is referred to as a two-sided GIDL erase.

Technology is disclosed herein for efficient two-sided GIDL erase of non-volatile memory cells. If there is an asymmetry between the GIDL voltages at the two ends of the NAND string, the two-sided GIDL erase may be negatively impacted. One embodiment equalizes voltages (such as GIDL voltages) at each of the two ends of the NAND string. A voltage pulse, as the term is defined herein, has a first transient period in which the voltage changes (e.g., increases) from an initial voltage to a steady state magnitude, a steady state period during which the voltage (referred to as steady state voltage) stays relatively stable at the steady state magnitude, and a second transient period in which the voltage changes (e.g., decreases) from steady state magnitude to a final voltage. The initial voltage, the steady state voltage, and the final voltage are relatively stable voltages. The final voltage is not required to have the same magnitude as the initial voltage. If the initial voltage is lower than the steady state voltage, the final voltage may be less than or greater than the steady state voltage. If the initial voltage is greater than the steady state voltage, the final voltage could be less than or greater than the steady state voltage. Although the voltage is relatively stable during the steady state period, there may be some small variations in the steady state magnitude during the steady state period due to, for example, noise or other non-ideal factors. Thus, the steady state magnitude of a voltage pulse is defined herein as the average voltage during the steady state period. Techniques are disclosed herein to create erase voltage pulses (e.g., GIDL voltage pulses) at each end of the NAND string that have substantially the same steady state voltage magnitudes. Herein, two voltage pulses have substantially the same steady state voltage magnitude if the difference in steady state voltage magnitudes is within 3% of the larger steady state voltage magnitude. In one embodiment, the difference in steady state voltage magnitudes of two substantially symmetric erase voltage pulses is within 2% of the larger steady state voltage magnitude. In one embodiment, the difference in steady state voltage magnitudes of two substantially symmetric erase voltage pulses is within 1% of the larger steady state voltage magnitude. If two voltage pulses do not have substantially the same steady state voltage magnitudes, then their steady state voltage magnitudes are defined as being different.

Techniques are disclosed herein to create voltage pulses at select transistors at each end of the NAND string that are substantially symmetric. These voltage pulses could be GIDL voltage pulses, or other voltage pulses applied to terminals of select transistors during a GIDL erase, as disclosed herein. Herein, “two voltage pulses are substantially symmetric” if they have substantially the same steady state voltage magnitudes and the difference in voltage magnitudes at any given time during the first transient period of either of the two voltages are within 3% of the larger steady state magnitude of the two voltages. The second transient period is not a factor in whether two voltage pulses are substantially symmetric. In one embodiment, the difference in steady state voltage magnitudes of two substantially symmetric voltage pulses is within 2% of the larger steady state magnitude and the difference in voltage magnitudes of two substantially symmetric voltages at any given time during the first transient period of either of the two voltages is within 2% of the larger steady state magnitude. In one embodiment, the difference in steady state voltage magnitudes of two substantially symmetric voltage pulses is within 1% of the larger steady state magnitude and the difference in voltage magnitudes of two substantially symmetric voltages at any given time during the first transient period of either of the two voltages is within 1% of the larger steady state magnitude.

Herein, two voltage pulses are asymmetric if they do not have substantially the same steady state voltage magnitudes or if the difference in voltage magnitudes at any given time during the first transient period of either of the two voltages are more than 3% of the larger steady state magnitude of the two voltages.

If there is an asymmetry between the GIDL currents at the two ends of the NAND string, the two-sided GIDL erase may be negatively impacted. In one embodiment, the GIDL currents at the two ends of the NAND string are equalized with each other, which improves erase efficiency. In some embodiments, the compensation that is used to equalize these GIDL currents depends on the location of the selected blocks and/or temperature. A GIDL current, in one embodiment, comprises a non-linear transient response to a GIDL voltage pulse. The magnitude of the GIDL current does not necessarily closely track the magnitude of the GIDL voltage pulse. A GIDL current may increase rapidly to a peak current and then decrease. In one embodiment, the increase in GIDL current occurs while the GIDL voltage is increasing during a first transient period. It is possible that the GIDL current could increase during the steady state period of the GIDL voltage, but that is not required. The GIDL current might remain at the peak current for a steady state period, but that is not required. The GIDL current may decrease while the GIDL voltage is still increasing (during the first transient period) and/or during the steady state period of the GIDL voltage.

Techniques are disclosed herein to create GIDL currents at each end of the NAND string that have substantially the same current magnitude while GIDL voltage pulses are applied to select transistors at each end of a NAND string. In some embodiments, the compensation that is used to depends on the location of the selected block and/or temperature. Herein, two GIDL currents have substantially the same magnitude if their magnitudes are within 3% of the larger peak magnitude of the two GIDL currents. In one embodiment, the GIDL currents at each end of the NAND string have substantially the same current magnitude at any given time while either GIDL voltage pulse applied to select transistors at opposite ends of a NAND string is in a first transient period (e.g., increasing to a steady state magnitude). In one embodiment, the difference in current of two GIDL currents at each end of a NAND string at any given time during the first transient period of either GIDL voltage is within 2% of the larger peak GIDL current magnitude. In one embodiment, the difference in current of two GIDL currents at each end of a NAND string at any given time during the first transient period of either GIDL voltage is within 1% of the larger peak GIDL current magnitude.

In one embodiment, the GIDL currents at each end of the NAND string have substantially the same current magnitude while either GIDL voltage pulse applied to select transistors at opposite ends of a NAND string is in a steady state period. In one embodiment, the difference in current of two GIDL currents at each end of a NAND string at any given time during the steady state period of either GIDL voltage is within 2% of the larger peak GIDL current magnitude. In one embodiment, the difference in current of two GIDL currents at each end of a NAND string at any given time during the steady state period of either GIDL voltage is within 1% of the larger peak GIDL current magnitude.

Techniques are disclosed herein to create GIDL currents at each end of the NAND string that are substantially symmetric. In some embodiments, the compensation that is used to create GIDL currents at each end of the NAND string that are substantially symmetric depends on the location of the selected block and/or temperature. Herein, two GIDL currents are substantially symmetric if the difference in GIDL current magnitudes at any given time during both the first transient period and the steady state period of either of the two GIDL voltages are within 3% of the larger peak magnitude of the two GIDL currents. The second transient period of the GIDL voltages is not a factor in whether two GIDL currents are substantially symmetric. In one embodiment, the difference in current magnitude of two substantially symmetric GIDL currents at any given time during the first transient periods and the steady state periods of either of the two GIDL voltages are within 2% of the larger peak GIDL current magnitude. In one embodiment, the difference in current magnitude of two substantially symmetric GIDL currents at any given time during the first transient periods and the steady state periods of either of the two GIDL voltages are within 1% of the larger peak GIDL current magnitude.

Creating substantially symmetric GIDL voltage pulses and/or substantially symmetric GIDL currents at each end of the NAND string improves two-sided GIDL erase efficiency. Creating GIDL voltage pulses at each end of the NAND string having substantially the same steady state magnitude and/or GIDL currents at each end of the NAND string having substantially the same steady state magnitude improves two-sided GIDL erase efficiency. Erase speed is improved when performing embodiments of two-sided GIDL erase. Current consumption may be reduced when performing embodiments of two-sided GIDL erase. Power consumption may be reduced when performing embodiments of two-sided GIDL erase.

One reason an asymmetry in GIDL voltage pulses at each end of the NAND string could possibly occur is due to differences in impedances on pathways that deliver voltages to the select transistors at each end of the NAND string. In some embodiments, the impedances of pathways depend on the location of the selected block and/or temperature. In one embodiment, a first pathway that resides along a bit line delivers a voltage to a first select transistor at one end of the NAND string, and a second pathway that resides along a source line delivers a voltage to a second select transistor at the other end of the NAND string. The first and second pathways may have different impedances. The different impedances may be due, at least in part, to different bit line and source line impedances. For example, the first and second pathways may have different temperature independent and/or temperature dependent resistances and/or the capacitances. Therefore, the first and second pathways may have different RC delays. The first and second pathways may have different voltage drops along the respective first and second pathways. In one embodiment, the different impedances are compensated for when creating GIDL voltage pulses at terminals of the select transistors.

One reason that an asymmetry in GIDL pulse could occur at each end of the NAND string is due to structural differences at each end of the NAND string. For some NAND strings, there may be an asymmetry between the two ends such that even if the drain-to-gate voltages of select transistors at each end of the NAND string have the same magnitude, the GIDL currents may have different magnitudes. A possible reason for this asymmetry in GIDL currents is due to different doping at each end of the NAND string. Techniques are disclosed herein to generate GIDL currents at each end of the NAND string that have substantially the same magnitude. In one embodiment, the GIDL voltages that are created at the select transistors at each end of the NAND string have different magnitudes in order to generate GIDL currents that have substantially the same magnitude.

FIG. 1-FIG. 6C describe one example of a memory system that can be used to implement the technology proposed herein. FIG. 1 is a functional block diagram of an example memory system 100 (e.g. solid state drive, memory card, USB drive, etc.). The components depicted in FIG. 1 are electrical circuits. Memory system 100 includes one or more memory dies 108. The one or more memory dies 108 can be complete memory dies or partial memory dies. In one embodiment, each memory die 108 includes a memory structure 126, control circuitry 110, and read/write/erase circuits 128. Memory structure 126 is addressable by word lines via a row decoder 124 and by bit lines via a column decoder 132. The read/write/erase circuits 128 include multiple sense blocks 150 including SB1, SB2, . . . , SBp (sensing circuitry) and allow a page of memory cells to be read or programmed in parallel. Also, many strings of memory cells can be erased in parallel.

In some systems, a controller 122 is included in the same package (e.g., a removable storage card) as the one or more memory die 108. However, in other systems, the controller can be separated from the memory die 108. In some embodiments the controller will be on a different die than the memory die 108. In some embodiments, one controller 122 will communicate with multiple memory die 108. In other embodiments, each memory die 108 has its own controller. Commands and data are transferred between a host 140 and controller 122 via a data bus 120, and between controller 122 and the one or more memory die 108 via lines 118. In one embodiment, memory die 108 includes a set of input and/or output (I/O) pins that connect to lines 118.

Control circuitry 110 cooperates with the read/write/erase circuits 128 to perform memory operations (e.g., write, read, erase and others) on memory structure 126, and includes state machine 112, on-chip address decoder 114, power control circuit 116 and temperature sensor 117. In one embodiment, control circuitry 110 includes buffers such as registers, ROM fuses and other storage devices for storing default values such as base voltages and other parameters.

The on-chip address decoder 114 provides an address interface between addresses used by host 140 or controller 122 to the hardware address used by the decoders 124 and 132. Power control circuit 116 controls the power and voltages supplied to the word lines, bit lines, and select lines during memory operations. The power control circuit 116 includes voltage circuitry, in one embodiment. Power control circuit 116 may include charge pumps for creating voltages. The sense blocks include bit line drivers. The power control circuit 116 executes under control of the state machine 112, in one embodiment. In one embodiment, power control circuit 116 includes P1 circuitry 922, P2 circuitry 924, P3 circuitry 926, and P4 circuitry 928 (see FIGS. 9A, 9B, 13A, 13B, 34, 35). In one embodiment, power control circuit 116 includes P5 circuitry 1922, P6 circuitry 1924, P7 circuitry 1926, and P8 circuitry 1928 (see FIG. 19).

State machine 112 (or equivalently functioned circuits) and/or controller 122 (or equivalently functioned circuits), in combination with all or a subset of the other circuits depicted in FIG. 1 (other than the memory structure 126), can be considered a control circuit that performs the functions described herein. The control circuit can include hardware only or a combination of hardware and software (including firmware). For example, a controller programmed by firmware to perform the functions described herein is one example of a control circuit. A control circuit can include a processor, microcontroller, PGA (Programmable Gate Array), FPGA (Field Programmable Gate Array), ASIC (Application Specific Integrated Circuit), integrated circuit or other type of circuit.

Temperature sensor 117 is an electrical circuit that provides an output that is proportional or otherwise indicative of the current temperature at memory die 108.

The (on-chip or off-chip) controller 122 (which in one embodiment is an electrical circuit) may comprise one or more processors 122 c, ROM 122 a, RAM 122 b, a memory interface (MI) 122 d and a host interface (HI) 122 e, all of which are interconnected. The storage devices (ROM 122 a, RAM 122 b) store code (software) such as a set of instructions (including firmware), and one or more processors 122 c is/are operable to execute the set of instructions to provide the functionality described herein. Alternatively or additionally, one or more processors 122 c can access code from a storage device in the memory structure, such as a reserved area of memory cells connected to one or more word lines. RAM 122 b can be to store data for controller 122, including caching program data (discussed below). Memory interface 122 d, in communication with ROM 122 a, RAM 122 b and processor 122 c, is an electrical circuit that provides an electrical interface between controller 122 and one or more memory die 108. For example, memory interface 122 d can change the format or timing of signals, provide a buffer, isolate from surges, latch I/O, etc. One or more processors 122 c can issue commands to control circuitry 110 (or another component of memory die 108) via Memory Interface 122 d. Host interface 122 e provides an electrical interface with host 140 data bus 120 in order to receive commands, addresses and/or data from host 140 to provide data and/or status to host 140.

In one embodiment, memory structure 126 comprises a three-dimensional memory array of non-volatile memory cells in which multiple memory levels are formed above a single substrate, such as a wafer. The memory structure may comprise any type of non-volatile memory that are monolithically formed in one or more physical levels of arrays of memory cells having an active area disposed above a silicon (or other type of) substrate. In one example, the non-volatile memory cells comprise vertical NAND strings with charge-trapping material.

In another embodiment, memory structure 126 comprises a two-dimensional memory array of non-volatile memory cells. In one example, the non-volatile memory cells are NAND flash memory cells utilizing floating gates. Other types of memory cells (e.g., NOR-type flash memory) can also be used.

The exact type of memory array architecture or memory cell included in memory structure 126 is not limited to the examples above. Many different types of memory array architectures or memory technologies can be used to form memory structure 126. No particular non-volatile memory technology is required for purposes of the new claimed embodiments proposed herein. Other examples of suitable technologies for memory cells of the memory structure 126 include ReRAM memories, magnetoresistive memory (e.g., MRAM, Spin Transfer Torque MRAM, Spin Orbit Torque MRAM), phase change memory (e.g., PCM), and the like. Examples of suitable technologies for memory cell architectures of the memory structure 126 include two-dimensional arrays, three-dimensional arrays, cross-point arrays, stacked two-dimensional arrays, vertical bit line arrays, and the like.

One example of a ReRAM, or PCMRAM, cross point memory includes reversible resistance-switching elements arranged in cross point arrays accessed by X lines and Y lines (e.g., word lines and bit lines). In another embodiment, the memory cells may include conductive bridge memory elements. A conductive bridge memory element may also be referred to as a programmable metallization cell. A conductive bridge memory element may be used as a state change element based on the physical relocation of ions within a solid electrolyte. In some cases, a conductive bridge memory element may include two solid metal electrodes, one relatively inert (e.g., tungsten) and the other electrochemically active (e.g., silver or copper), with a thin film of the solid electrolyte between the two electrodes. As temperature increases, the mobility of the ions also increases causing the programming threshold for the conductive bridge memory cell to decrease. Thus, the conductive bridge memory element may have a wide range of programming thresholds over temperature.

Magnetoresistive memory (MRAM) stores data by magnetic storage elements. The elements are formed from two ferromagnetic plates, each of which can hold a magnetization, separated by a thin insulating layer. One of the two plates is a permanent magnet set to a particular polarity; the other plate's magnetization can be changed to match that of an external field to store memory. A memory device is built from a grid of such memory cells. In one embodiment for programming, each memory cell lies between a pair of write lines arranged at right angles to each other, parallel to the cell, one above and one below the cell. When current is passed through them, an induced magnetic field is created.

Phase change memory (PCM) exploits the unique behavior of chalcogenide glass. One embodiment uses a GeTe—Sb2Te3 super lattice to achieve non-thermal phase changes by simply changing the co-ordination state of the Germanium atoms with a laser pulse (or light pulse from another source). Therefore, the doses of programming are laser pulses. The memory cells can be inhibited by blocking the memory cells from receiving the light. Note that the use of “pulse” in this document does not require a square pulse, but includes a (continuous or non-continuous) vibration or burst of sound, current, voltage light, or other wave.

A person of ordinary skill in the art will recognize that the technology described herein is not limited to a single specific memory structure, but covers many relevant memory structures within the spirit and scope of the technology as described herein and as understood by one of ordinary skill in the art.

FIG. 2 is a block diagram of example memory system 100, depicting more details of one embodiment of controller 122. The controller in FIG. 2 is a flash memory controller, but note that the non-volatile memory 108 is not limited to flash. Thus, the controller 122 is not limited to the example of a flash memory controller. As used herein, a flash memory controller is a device that manages data stored on flash memory and communicates with a host, such as a computer or electronic device. A flash memory controller can have various functionality in addition to the specific functionality described herein. For example, the flash memory controller can format the flash memory to ensure the memory is operating properly, map out bad flash memory cells, and allocate spare memory cells to be substituted for future failed cells. Some part of the spare cells can be used to hold firmware to operate the flash memory controller and implement other features. In operation, when a host needs to read data from or write data to the flash memory, it will communicate with the flash memory controller. If the host provides a logical address to which data is to be read/written, the flash memory controller can convert the logical address received from the host to a physical address in the flash memory. (Alternatively, the host can provide the physical address). The flash memory controller can also perform various memory management functions, such as, but not limited to, wear leveling (distributing writes to avoid wearing out specific blocks of memory that would otherwise be repeatedly written to) and garbage collection (after a block is full, moving only the valid pages of data to a new block, so the full block can be erased and reused).

The interface between controller 122 and non-volatile memory die 108 may be any suitable flash interface, such as Toggle Mode 200, 400, or 800. In one embodiment, memory system 100 may be a card-based system, such as a secure digital (SD) or a micro secure digital (micro-SD) card. In an alternate embodiment, memory system 100 may be part of an embedded memory system. For example, the flash memory may be embedded within the host. In other example, memory system 100 can be in the form of a solid state drive (SSD).

In some embodiments, non-volatile memory system 100 includes a single channel between controller 122 and non-volatile memory die 108, the subject matter described herein is not limited to having a single memory channel. For example, in some memory system architectures, 2, 4, 8 or more channels may exist between the controller and the memory die, depending on controller capabilities. In any of the embodiments described herein, more than a single channel may exist between the controller and the memory die, even if a single channel is shown in the drawings.

As depicted in FIG. 2, controller 122 includes a front end module 208 that interfaces with a host, a back end module 210 that interfaces with the one or more non-volatile memory die 108, and various other modules that perform functions which will now be described in detail.

The components of controller 122 depicted in FIG. 2 may take the form of a packaged functional hardware unit (e.g., an electrical circuit) designed for use with other components, a portion of a program code (e.g., software or firmware) executable by a (micro) processor or processing circuitry that usually performs a particular function of related functions, or a self-contained hardware or software component that interfaces with a larger system, for example. For example, each module may include an application specific integrated circuit (ASIC), a Field Programmable Gate Array (FPGA), a circuit, a digital logic circuit, an analog circuit, a combination of discrete circuits, gates, or any other type of hardware or combination thereof. Alternatively or in addition, each module may include software stored in a processor readable device (e.g., memory) to program a processor for controller 122 to perform the functions described herein. The architecture depicted in FIG. 2 is one example implementation that may (or may not) use the components of controller 122 depicted in FIG. 1 (i.e. RAM, ROM, processor, interface).

Referring again to modules of the controller 122, a buffer manager/bus control 214 manages buffers in random access memory (RAM) 216 and controls the internal bus arbitration of controller 122. A read only memory (ROM) 218 stores system boot code. Although illustrated in FIG. 2 as located separately from the controller 122, in other embodiments one or both of the RAM 216 and ROM 218 may be located within the controller. In yet other embodiments, portions of RAM and ROM may be located both within the controller 122 and outside the controller. Further, in some implementations, the controller 122, RAM 216, and ROM 218 may be located on separate semiconductor die.

Front end module 208 includes a host interface 220 and a physical layer interface (PHY) 222 that provide the electrical interface with the host or next level storage controller. The choice of the type of host interface 220 can depend on the type of memory being used. Examples of host interfaces 220 include, but are not limited to, SATA, SATA Express, SAS, Fibre Channel, USB, PCIe, and NVMe. The host interface 220 typically facilitates transfer for data, control signals, and timing signals.

Back end module 210 includes an error correction code (ECC) engine 224 that encodes the data bytes received from the host, and decodes and error corrects the data bytes read from the non-volatile memory. A command sequencer 226 generates command sequences, such as program and erase command sequences, to be transmitted to non-volatile memory die 108. A RAID (Redundant Array of Independent Dies) module 228 manages generation of RAID parity and recovery of failed data. The RAID parity may be used as an additional level of integrity protection for the data being written into the non-volatile memory system 100. In some cases, the RAID module 228 may be a part of the ECC engine 224. Note that the RAID parity may be added as an extra die or dies as implied by the common name, but it may also be added within the existing die, e.g. as an extra plane, or extra block, or extra WLs within a block. A memory interface 230 provides the command sequences to non-volatile memory die 108 and receives status information from non-volatile memory die 108. In one embodiment, memory interface 230 may be a double data rate (DDR) interface, such as a Toggle Mode 200, 400, or 800 interface. A flash control layer 232 controls the overall operation of back end module 210.

One embodiment includes a writing/reading manager 236, which can be used to manage (in conjunction with the circuits on the memory die) the writing and reading of memory cells. One embodiment includes an erase manager 234, which can be used to manage (in conjunction with the circuits on the memory die) the erase of memory cells. The erase manager 234, in combination with all or a subset of the circuits depicted in FIG. 1, can be considered an erase controller.

Additional components of controller 122 illustrated in FIG. 2 include media management layer 238, which performs wear leveling of memory cells of non-volatile memory die 108, and temperature sensor 242, which is an electrical circuit that provides an output that is proportional or otherwise indicative of the current temperature at controller 122. In alternative embodiments, one or more of the physical layer interface 222, RAID module 228, media management layer 238 and buffer management/bus controller 214 are optional components that are not necessary in the controller 122. System 100 also includes other discrete components 240, such as external electrical interfaces, external RAM, resistors, capacitors, or other components that may interface with controller 122.

The Flash Translation Layer (FTL) or Media Management Layer (MML) 238 may be integrated as part of the flash management that may handle flash errors and interfacing with the host. In particular, MML may be a module in flash management and may be responsible for the internals of NAND management. In particular, the MML 238 may include an algorithm in the memory device firmware which translates writes from the host into writes to the memory 126 of die 108. The MML 238 may be needed because: 1) the memory may have limited endurance; 2) the memory 126 may only be written in multiples of pages; and/or 3) the memory 126 may not be written unless it is erased as a block. The MML 238 understands these potential limitations of the memory 126 which may not be visible to the host. Accordingly, the MML 238 attempts to translate the writes from host into writes into the memory 126. As described below, erratic bits may be identified and recorded using the MML 238. This recording of erratic bits can be used for evaluating the health of blocks and/or word lines (the memory cells on the word lines).

Controller 122 may interface with one or more memory dies 108. In one embodiment, controller 122 and multiple memory dies (together comprising non-volatile storage system 100) implement a solid state drive (SSD), which can emulate, replace or be used instead of a hard disk drive inside a host, as a NAS device, in a laptop, in a tablet, in a server, etc. Additionally, the SSD need not be made to work as a hard drive.

Some embodiments of a non-volatile storage system will include one memory die 108 connected to one controller 122. However, other embodiments may include multiple memory die 108 in communication with one or more controllers 122. In one example, the multiple memory die can be grouped into a set of memory packages. Each memory package includes one or more memory die in communication with controller 122. In one embodiment, a memory package includes a printed circuit board (or similar structure) with one or more memory die mounted thereon. In some embodiments, a memory package can include molding material to encase the memory dies of the memory package. In some embodiments, controller 122 is physically separate from any of the memory packages.

In one embodiment, memory system 100 includes temperature sensor 244, which is an electrical circuit (or other type of temperature sensor) that provides an output indicative of the current temperature at memory system 100.

FIG. 3 is a perspective view of a memory device 300 comprising a set of blocks in an example 3D configuration of the memory structure 126 of FIG. 1A. On the substrate are example blocks BLK0, BLK1, BLK2 and BLK3 of memory cells (storage elements) and peripheral areas with circuitry for use by the blocks. The substrate has a major surface that extends in the x-y plane. The blocks may be formed over the major surface. The peripheral area 304 runs along an edge of each block while the peripheral area 305 is at an end of the set of blocks.

Each peripheral area can include circuitry, including but not limited to voltage drivers which can be connected to control gate layers, bit lines and source lines of the blocks. The control gate layers may have control gates of memory cell transistors, as well as control gates of select transistors. The peripheral areas 304, 305 can include some or all of the on-die circuitry depicted in FIG. 1. For example, peripheral areas 304, 305 can include some or all of sense blocks 150 depicted in FIG. 1. The peripheral areas 304, 305 can include some or all of read/write/erase circuits 128 depicted in FIG. 1. The peripheral areas 304, 305 can include all or part of control circuitry 110 depicted in FIG. 1.

The substrate 301 can also carry circuitry under the blocks (also referred to as circuitry under array), along with one or more lower metal layers which are patterned in conductive paths to carry signals of the circuitry. For example, the substrate 301 can include some or all of the on-die circuitry depicted in FIG. 1. For example, the substrate 301 can include some or all of sense blocks 150 depicted in FIG. 1. The substrate 301 can include some or all of read/write/erase circuits 128 depicted in FIG. 1. The substrate 301 can include all or part of control circuitry 110 depicted in FIG. 1.

The blocks are formed in an intermediate region 302 of the memory device. In an upper region 303 of the memory device, one or more upper metal layers are patterned in conductive paths to carry signals of the circuitry. Each block comprises a stacked area of memory cells, where alternating levels of the stack represent word lines. In one possible approach, each block has opposing tiered sides from which vertical contacts extend upward to an upper metal layer to form connections to conductive paths. While four blocks are depicted as an example, two or more blocks can be used, extending in the x- and/or y-directions.

In one possible approach, the blocks are in a plane, and the length of the plane, in the x-direction, represents a direction in which signal paths to word lines extend in the one or more upper metal layers (a word line or SGD line direction), and the width of the plane, in the y-direction, represents a direction in which signal paths to bit lines extend in the one or more upper metal layers (a bit line direction). The z-direction represents a height of the memory device. The blocks could also be arranged in multiple planes.

FIG. 3A is a block diagram explaining one example organization of memory structure 126, which is divided into two planes 320 and 330. Each plane is then divided into M blocks. In one example, each plane has about 2000 blocks. However, different numbers of blocks and planes can also be used. In one embodiment, a block comprising memory cells is a unit of erase. That is, all memory cells of a block are erased together. In other embodiments, memory cells can be grouped into blocks for other reasons, such as to organize the memory structure 126 to enable the signaling and selection circuits. In one embodiment, a block represents a groups of connected memory cells as the memory cells of a block share a common set of unbroken word lines and unbroken bit lines. In the structure of FIG. 3A, Block 0 and Block M−1 of both planes 320 and 330 are at the edge of the memory structure (or otherwise referred to as being located in an edge region/section of the memory structure).

FIG. 3B is a perspective view of a portion of one example embodiment of a monolithic three dimensional memory array that can comprise memory structure 126, which includes a plurality non-volatile memory cells. For example, FIG. 3B shows a portion of one block comprising memory. The structure depicted includes a set of bit lines BL positioned above a stack of alternating dielectric layers and conductive layers with vertical columns of materials extending through the dielectric layers and conductive layers. For example purposes, one of the dielectric layers is marked as D and one of the conductive layers (also called word line layers) is marked as W. The number of alternating dielectric layers and conductive layers can vary based on specific implementation requirements. One set of embodiments includes between 108-300 alternating dielectric layers and conductive layers. One example embodiment includes 96 data word line layers, 8 select layers, 6 dummy word line layers and 110 dielectric layers. More or fewer than 108-300 layers can also be used. The alternating dielectric layers and conductive layers are divided into four “fingers” or sub-blocks by local interconnects LI, in an embodiment. FIG. 3B shows two fingers and two local interconnects LI. Below the alternating dielectric layers and word line layers is a source line layer SL. Vertical columns of materials (also known as memory holes) are formed in the stack of alternating dielectric layers and conductive layers. For example, one of the vertical columns/memory holes is marked as MH. Note that in FIG. 3B, the dielectric layers are depicted as see-through so that the reader can see the memory holes positioned in the stack of alternating dielectric layers and conductive layers. In one embodiment, NAND strings are formed by filling the vertical column/memory hole with materials including a charge-trapping material to create a vertical column of memory cells. Each memory cell can store one or more bits of data.

FIG. 3C depicts a diagram of a memory structure having four planes. The diagram illustrates locations for source line drivers, in one embodiment. Four planes 352, 354, 356, 358 are depicted in a similar x-y perspective as used in FIG. 3A. Blocks are not expressly depicted in FIG. 3C. Several source line drivers 362, 364, 366, 368 are depicted. The source line drivers 362-368 are located in circuitry under the array in an embodiment of FIG. 3C. Plane 352 has source line driver 362 under the blocks of memory cells. Plane 354 has source line driver 364 under the blocks of memory cells. Plane 356 has source line driver 366 under the blocks of memory cells. Plane 358 has source line driver 368 under the blocks of memory cells. In some embodiments, the source line drivers 362, 364, 366, 368 are used to provide power to various elements in the memory array. Seven shunt regions 382 are depicted in each plane. The shunt regions 382 are used to deliver voltages/power from the source line drivers.

Two bit line tap regions are depicted for each plane. Plane 352 has bit line tap regions 372 a, 372 b. Plane 354 has bit line tap regions 374 a, 374 b. Plane 356 has bit line tap regions 376 a, 376 b. Plane 358 has bit line tap regions 378 a, 378 b. The bit line tap regions are used to deliver voltages from sense amplifiers to bit lines. The sense amplifiers are located in circuitry under the array, in one embodiment. The sense amplifiers are not depicted in FIG. 3C, but could be located under the array in the general region of the bit line tap regions 378 a, 378 b. The bit lines are located above the array, in one embodiment.

In some embodiments, a voltage from a source line driver may be provided to bit lines, for at least some memory operations. For example, a voltage from a source line driver is provided to both a source line and bit lines during one embodiment of an erase operation. The points at which the bit line tap regions cross with the shunt regions 382 have buried source line drivers, in some embodiments A buried source line driver is used to selectively deliver a voltage from a source line driver to a bit line, as opposed to using a sense amplifier to provide the voltage to the bit line, in one embodiment. Thus, the bit line voltage could come from either a source line driver or a sense amplifier, in some embodiments.

FIG. 3D is a block diagram depicting a top view of a portion of one block from memory structure 126. The portion of the block depicted in FIG. 3D corresponds to portion 340 in block 2 of FIG. 3A. As can be seen from FIG. 3D, the block depicted in FIG. 3D extends in the direction of 332. In one embodiment, the memory array has many layers; however, FIG. 3D only shows the top layer.

FIG. 3D depicts a plurality of circles that represent the vertical columns. Each of the vertical columns include multiple select transistors (also referred to as a select gate or selection gate) and multiple memory cells. In one embodiment, each vertical column implements a NAND string. For example, FIG. 3D depicts vertical columns 422, 432, 442 and 452. Vertical column 422 implements NAND string 482. Vertical column 432 implements NAND string 484. Vertical column 434 implements NAND string 485. Vertical column 442 implements NAND string 486. Vertical column 452 implements NAND string 488. More details of the vertical columns are provided below. Since the block depicted in FIG. 3D extends in the direction of arrow 332, the block includes more vertical columns than depicted in FIG. 3D

FIG. 3D also depicts a set of bit lines 415, including bit lines 411, 412, 413, 414, . . . 419. FIG. 3D shows twenty four bit lines because only a portion of the block is depicted. It is contemplated that more than twenty four bit lines connected to vertical columns of the block. Each of the circles representing vertical columns has an “x” to indicate its connection to one bit line. For example, bit line 414 is connected to vertical columns 422, 432, 442 and 452. In some embodiments, bit lines are positioned over the memory structure 325 and run along the entire length of the plane (e.g., from the top of plane 320 to the bottom of plane 320). Each bit line is connected to a vertical column in other blocks (not depicted in FIG. 3D). For example, the bit lines are connected to vertical columns in Block 0, Block 1, Block 2, . . . Block M−1 in a plane (e.g., plane 320 or 330).

The block depicted in FIG. 3D includes a set of local interconnects 402, 404, 406, 408 and 410 that connect the various layers to a source line below the vertical columns. Local interconnects 402, 404, 406, 408 and 410 also serve to divide each layer of the block into four regions; for example, the top layer depicted in FIG. 3D is divided into regions 420, 430, 440 and 450, which are referred to as fingers or sub-blocks. In the layers of the block that implement memory cells, the four regions are referred to as word line fingers that are separated by the local interconnects. In one embodiment, the word line fingers on a common level of a block connect together to form a single word line. In another embodiment, the word line fingers on the same level are not connected together. In one example implementation, a bit line only connects to one vertical column in each of regions 420, 430, 440 and 450. In that implementation, each block has sixteen rows of active columns and each bit line connects to four rows in each block. In one embodiment, all of four rows connected to a common bit line are connected to the same word line (via different word line fingers on the same level that are connected together); therefore, the system uses the source side selection lines and the drain side selection lines to choose one (or another subset) of the four to be subjected to a memory operation (program, verify, read, and/or erase).

Although FIG. 3D shows each region having four rows of vertical columns, four regions and sixteen rows of vertical columns in a block, those exact numbers are an example implementation. Other embodiments may include more or less regions per block, more or less rows of vertical columns per region and more or less rows of vertical columns per block.

FIG. 3D also shows the vertical columns being staggered. In other embodiments, different patterns of staggering can be used. In some embodiments, the vertical columns are not staggered.

FIG. 4 depicts an example cross-sectional view along line AA in FIG. 3D. The block comprises a stack 510 of alternating conductive and dielectric layers. In this example, the conductive layers comprise SGD layer, SGS layers, dummy word line layers (or word lines) DWLd, DWLs, in addition to data word line layers (or word lines) WLL0-WLL14. The dielectric layers are labelled as DL0-DL19. Further, regions of the stack which comprise NAND strings 484 and 485 are depicted. Each NAND string encompasses a memory hole 432 or 434 which is filled with materials which form memory cells adjacent to the word lines. A region 522 of the stack is shown in greater detail in FIG. 6A. A region 523 of the stack is shown in greater detail in FIG. 6B. Note that there may be more or fewer SGD layers, SGS layers, dummy word line layers, and data word line layers.

Underneath the stack is a source line (SL) 511. In one approach, a portion of the source line SL comprises a polysilicon layer 511 a which is in contact with a source end of each string of memory cells in a block. The polysilicon layer 511 a is in electrical contact with the NAND string channel (not shown in FIG. 4). The polysilicon layer 511 a is in contact with a metal 511 b (e.g., tungsten) layer. The source line 511 may be shared by all of the blocks in a plane, in one example approach.

NAND string 484 has a source-end 513 at a bottom 516 b of the stack 516 and a drain-end 515 at a top 516 a of the stack. Metal-filled slits 404, 406 may be provided periodically across the stack as interconnects which extend through the stack, such as to connect the source line to a line above the stack. The slits may be used during the formation of the word lines and subsequently filled with metal. A portion of a bit line 414 is also depicted. A conductive via 521 connects the drain-end 515 of NAND string 484 to bit line 414.

In one approach, the block comprising memory cells comprises a stack of alternating control gate and dielectric layers, and the memory cells are arranged in vertically extending memory holes in the stack.

In one approach, each block comprises a terraced edge in which vertical interconnects connect to each layer, including the SGS, WL and SGD layers, and extend upward to horizontal paths to voltage sources.

FIG. 5 depicts an example transistor 590. The transistor comprises a control gate CG, a drain D, a source S and a channel CH. The control gate may also be referred to as a control terminal or as a gate terminal. The control gate is formed by a portion of one of the conductive layers (e.g., SGD, DWL, WLL, SGS), in one embodiment. The drain and source may also be referred to as terminals of the transistor. Note that which physical terminals of the transistor functions as the source and drain may depend on the voltages that are applied to the transistor. The transistor may be part of a select gate or a memory cell. In the case that the transistor is part of a select gate, the drain may be biased to a significantly higher voltage than the control gate during a portion of an erase procedure, which may result in a GIDL current. For example, the drain may be biased to a first voltage, while the control gate is biased to a second voltage. The GIDL current may help to pass the drain voltage to the channel of the NAND string, such that the channel of the memory cells may be at a voltage that is high enough to erase the memory cells.

In the case of a memory cell transistor, the control gate voltage can be set to a low value during erase such as 0 V so that the channel-to-control gate voltage results in a significant electrical field. In one embodiment, carrier recombination of holes from the channel with electrons in the charge trapping region of memory cells results in a lowering of the Vth of the memory cell. In the case of a select gate transistor, the control gate voltage can be set to a higher value such as 10 V so that the channel-to-control gate voltage is not high enough to lower the Vth of the transistor.

In one embodiment, a select gate transistor has a region having the same material as the memory film of a memory cell. This material serves as a gate dielectric in the select gate transistor. In this case, the threshold voltage of the select gate transistor can be altered similar to how a memory cell transistor's threshold voltage can be altered. In one embodiment a select gate transistor does not have the memory film material, but has a single dielectric (e.g., silicon dioxide) as a gate dielectric. In such as case, the select gate transistor's threshold voltage cannot be altered, in a significant way, by a voltage applied to the gate.

FIG. 6A depicts a close-up view of the region 522 of the stack of FIG. 4. Memory cells are formed at the different levels of the stack at the intersection of a word line layer and a memory hole. In this example, SGS transistor 670 is provided below dummy memory cell 671. The SGS transistor 670 may comprise one or more gate layers, in one embodiment. The SGS transistor gate layers may be electrically connected to the same voltage source, in one embodiment. Data memory cells 672, 673 are above the dummy memory cell 671. A number of layers can be deposited along the sidewall (SW) of the memory hole 630 and/or within each word line layer, e.g., using atomic layer deposition. For example, each pillar 699 or column which is formed by the materials within a memory hole can include a blocking oxide/block high-k material 660, charge-trapping layer 663 or film such as silicon nitride (Si₃N₄) or other nitride, a tunneling layer 664, a channel 665, and a dielectric core 666. The channel 665 is formed from a semiconductor, such as, silicon, silicon germanium, etc. In one embodiment, the channel 665 is formed from a polycrystalline semiconductor. In one embodiment, the channel 665 is formed from a crystalline semiconductor. A word line layer can include a conductive metal 662 such as Tungsten. A portion a word line layer that is adjacent to layer 660 is referred to as a control gate. For example, control gates 651, 652, 653 and 654 are provided. In this example, all of the layers except the metal are provided in the memory hole. In other approaches, some of the layers can be in the control gate layer. Additional pillars are similarly formed in the different memory holes. A pillar can form a columnar active area of a NAND string.

When a memory cell is programmed, electrons are stored in a portion of the charge-trapping layer which is associated with the memory cell. These electrons are drawn into the charge-trapping layer from the channel, and through the tunneling layer. The threshold voltage (Vth) of a memory cell is increased in proportion to the amount of stored charge. In one embodiment, during erase, holes tunnel from the channel to the charge trapping layer to recombine with electrons thereby decreasing the Vth of memory cells.

Each of the memory holes can be filled with a plurality of annular layers comprising a blocking oxide layer, a charge trapping layer, a tunneling layer and a channel layer. A core region of each of the memory holes is filled with a dielectric material, and the plurality of annular layers are between the core region and the word line in each of the memory holes.

The NAND string can be considered to have a floating body channel because the length of the channel is not formed on a substrate. Further, the NAND string is provided by a plurality of word line layers above one another in a stack, and separated from one another by dielectric layers.

The source line 511 includes a polysilicon layer 511 a and a metal layer 511 b. The polysilicon layer 511 a is in direct contact with the channel 665. Thus, the channel 665 is in electrical contact with the polysilicon layer 511 a. The channel 665 is not in direct electrical contact with a p-well, in this example. Thus, the configuration in FIG. 6A does not allow the memory cells to be erased by raising a p-well voltage to a voltage to charge up the channel 665. However, note that even if the channel 665 is in direct electrical contact with a p-well, a two-sided GIDL erase may still be performed. Thus, embodiments of two-sided GIDL erase disclosed herein are not limited to the configuration of FIG. 6A.

A portion of the channel 665 that is indicated by region 635 is doped with an n-type donor, in one embodiment. For example, the portion of the channel 665 that is indicated by region 635 may be doped with phosphorus or arsenic. The doping is N+, in one embodiment. The rest of the channel 665 is not intentionally doped, in one embodiment. However, the undoped portion of the channel 665 may behave as p−. Thus, there is an N+/p− junction in the channel 665 at the interface between region 635 and the undoped portion of the channel 665, in one embodiment.

FIG. 6B depicts a close-up view of the region 523 of the stack of FIG. 4. Memory cells are formed at the different levels of the stack at the intersection of a word line layer and a memory hole. In this example, SGD transistor 680 is provided above dummy memory cell 681 and data memory cells 682 and 683. The SGD transistor 680 may comprise one or more gate layers, in one embodiment. The SGD transistor gate layers may be electrically connected to the same voltage source, in one embodiment. Pillar 699 or column which is formed by the materials within a memory hole can include a blocking oxide/block high-k material 660, charge-trapping layer 663 or film such as silicon nitride (Si₃N₄) or other nitride, a tunneling layer 664, a channel 665, and a dielectric core 666. Control gates 691, 692, 693 and 694 are provided. In this example, all of the layers except the control gates are provided in the memory hole. In other approaches, some of the layers can be in the control gate layer. Additional pillars are similarly formed in the different memory holes.

A polysilicon plug 675 forms an electrical contact between channel 665 and conductive via 521. The polysilicon plug 675 is doped with an n-type donor, in one embodiment. For example, the polysilicon plug 675 may be doped with phosphorus and/or arsenic. The doping is N+, in one embodiment. The channel 665 is not intentionally doped, in one embodiment. However, the channel 665 may behave as p−. Thus, there is an N+/p− junction at the interface between the polysilicon plug 675 and the channel 665, in one embodiment.

As discussed above, there may also be an N+/p− junction near the transistor 670. These two N+/p− junctions may have different doping concentrations. For example, the N+ concentration in region 635 may be different than the N+ concentration in the polysilicon plug 675. This may result in a different magnitude of GIDL current at transistors 670 and 680 even if those transistors have the same drain-to-gate voltages (or GIDL voltages). In one embodiment, different magnitude drain-to-gate voltages (or GIDL voltages) are deliberately created at terminals of transistors 670 and 680 in order to compensate for physical differences (such as doping concentrations) at each end of the NAND string in order to achieve substantially the same magnitude GIDL current at each end of the NAND string (e.g., at transistors 670 and 680). This may improve erase speed, reduce current consumption, and/or reduce power consumption.

FIG. 6C is a diagram that shows details of one embodiment of circuits for applying voltages to a memory structure 126. Two blocks 700, 720 of memory cells are depicted. Circuits of FIG. 6C apply voltages to word lines and select lines. State machine 112 provides control signals to the circuits, in one embodiment. For example, state machine 112 may issue control signals to one or more of CONTROL 780, High Voltage Generator (HV GEN) 772, Page Buffer Driver (PB DRV) 774, Command Register (CMD REG) 776 and Input/Output (I/O) Buffer 778. In an embodiment, state machine 112 issues control signals to CONTROL 780, which in turn controls other elements such as HV GEN 772 and PB DRV 774.

In an embodiment, HV GEN 772 is connected to word line driver 750, to control magnitudes and timing of voltages. PB DRV 774 is connected to page buffer 740 to control the page buffer 740. The page buffer 740 may include sense blocks, such as SB1 of FIG. 1.

Each block comprising storage elements is associated with a set of transfer transistors, in one possible embodiment. For example, block 700, which is a selected block in this example, e.g., a block in which a programming, erase, or sense operation is to take place, includes a drain-side select gate (SGD) connected to a transfer transistor 704, a drain-side dummy word line (WLDD) connected to a transfer transistor 706, a word line (WL47) connected to a transfer transistor 708, intermediate word lines WL30-WL1 (not shown) connected to respective transfer transistors (not shown), a word line (WL0) connected to a transfer transistor 710, a source-side dummy word line (WLDS) connected to a transfer transistor 712, and a source-side select gate (SGS) connected to a transfer transistor 714.

The control gate of each transfer transistor of block 700 is connected to a block decoder circuit (BD) 702 via a common path 703. The BD 702 receives a voltage from a transfer transistor driver (TT DRV) 764 and a control signal from an address register (ADD REG) 770. The control signal includes an address. If the address matches an address of the BD 702, BD 702 acts as a conductive switch which passes the voltage to the control gates of the associated transfer transistors via path 703. If the address does not match the address of BD 702, BD 702 acts as a non-conductive switch which does not pass the voltage to the control gates of the associated transfer transistors.

Each transfer transistor may be an n-channel MOSFET, for example, which has a drain node on the left hand side and a source node on the right hand side. The drain node for each transfer transistor is connected to a respective voltage driver in a set of high-voltage voltage drivers 750. Each driver may include an on-chip charge pump.

For example, the transfer transistor 704 is connected to a drain select gate driver (SGD DRV) 752, the transfer transistor 706 is connected to a dummy word line driver (WLDD DRV) 754, the transfer transistor 708 is connected to the word line driver (WL47 DRV) 756, . . . , the transfer transistor 710 is connected to the word line driver (WL0 DRV) 758, the transfer transistor 712 is connected to the source side dummy word line driver (WLDS DRV) 760, and the transfer transistor 714 is connected to the source select gate driver (SGS DRV). Each voltage driver can be independently controlled to provide a desired output voltage.

A similar arrangement is used for the example unselected block 720, which includes a transfer transistor 724 connected to SGD and SGD DRV 752, a transfer transistor 726 connected to WLDD and WLDD DRV 754, a transfer transistor 728 connected to WL47 and WL47 DRV 756, . . . , a transfer transistor 730 connected to WL0 and WL0 DRV 758, a transfer transistor 732 connected to WLDS and WLDS DRV 760, and a transfer transistor 734 connected to SGS and SGS DRV 762.

The SGD lines for a plane may be referred to herein as local SGD lines and a global SGD line. For example, the SGD line in block 700 may be referred to as a local SGD line 757 a. The SGD line in block 720 may also be referred to as a local SGD line 757 b. The line 755 connected to SGD DRV 752 may be referred to herein as a global SGD line (e.g., SGGg). Each local SGD line 757 may be connected to the global SGD line 755 by a transfer transistor (e.g., 704, 724).

The SGS lines for a plane may be referred to herein as local SGS lines and a global SGS line. For example, the SGS line in block 700 may be referred to as a local SGS line 761 a. The SGD line in block 720 may also be referred to as a local SGD line 761 b. The line 759 connected to SGS DRV 762 may be referred to herein as a global SGS line (e.g., SGSg) Each local SGS line 761 may be connected to the global SGS line 759 by a transfer transistor (e.g., 714, 734).

The control gates of the transfer transistors of unselected block 720 are connected to a respective block decoder (BD) 722 via a common path 723. BD 722 also is connected to TT DRV 764 to receive a voltage, and to address register 770 to receive a control signal which instructs BD 722 to pass or not pass the voltage to the control gates of the associated transfer transistors via path 723. Address register (ADD REG) 770 also communicates with the voltage drivers in the set of high-voltage voltage drivers 750.

A number of bit lines (BLs) 742 extend across the selected block 700 and the unselected block 720 (and across additional unselected blocks, not shown, in some implementations) and into a page buffer 740, which is responsive to column decoder 132. Page buffer 740 stores data which are written into, or read from, a selected word line of the selected block.

During an operation of the memory device, address register 770 provides a data load command to an input-output buffer 778 and to a command register 776. Input-output buffer 778 provides the command to page buffer 740. Command register 776 provides a command to a control circuit 780, which instructs a high voltage generator 772 to control voltage drivers 750 at appropriate levels.

Typically, during programming, the driver of the selected word line provides a programming level voltage, such as 12-26 V and the unselected word lines receive a pass voltage V_(PASS) such as 4-6 V. During sensing, the driver of the selected word line provides a read or verify level voltage (V_(CGR) or V_(VERIFY), respectively), while the unselected word lines receive a read pass voltage, V_(READ-PASS). Control 780 also instructs the page buffer driver (PB DRV) 774 to control page buffer 740. Address register 770 also communicates with column decoder 132.

FIG. 7 depicts one embodiment of a process for performing an erase operation. The Process is described with respect to a string of memory cells. The string includes a select transistor on each end of the string. For example, a first select transistor may be a drain side select transistor, which has one of its terminals (e.g., drain) coupled to a bit line. A second select transistor may be a source side select transistor, which has one of its terminals coupled to a source line. In one embodiment, the string is a NAND string of memory cells. The process may be performed in parallel on many strings. The process may be used to erase a NAND string such as depicted in FIGS. 3, 4, 6A and 6B.

Step 782 sets a magnitude of an initial steady state erase voltage (Ver). In one embodiment, the process performs a two-sided GIDL erase. The erase voltage pulse is to be applied to the bit line and to the source line. In one embodiment, the steady state magnitude of the erase voltage pulse is different for the bit line and the source line. In one embodiment, the magnitude of the steady state erase voltage is the same for the bit line and the source line. Step 782 refers to the voltage that is applied to the end of the bit line and the source line that is not adjacent to the select transistors.

Due to factors such as voltage drop due to the resistances of the bit line and source line, the steady state erase voltage may have a smaller magnitude when it reaches a select transistor. In one embodiment, the magnitude of the steady state erase voltages that are applied to the bit line and source line are different, such that the magnitudes will be substantially the same at the select transistors. In some embodiments, the magnitudes of the steady state erase voltages depend on the location of the block that is selected for erase, which may compensate for location dependent impedance mismatches between the bit line and the source line. In some embodiments, the magnitudes of the steady state erase voltages depend on the temperature of the block that is selected for erase (or the controller or the memory system), which may compensate for temperature dependent impedance mismatches between the bit line and the source line.

Due to factors such as a different RC delay along the bit line and source line, the erase voltage pulses may experience different delays in getting to the select transistors. In one embodiment, the timing of starting the erase voltage pulses applied to the bit line and source line are different, such that the erase voltage pulses will arrive at the select transistors at the substantially same time. In some embodiments, the timing depends on the location of the block that is selected for erase, which may compensate for location dependent impedance mismatches between the bit line and the source line. In some embodiments, the timing depends on the temperature of the block that is selected for erase (or the controller or the memory system), which may compensate for temperature dependent impedance mismatches between the bit line and the source line.

Step 784 sets a magnitude of an initial steady state select gate voltage (Vsg). Herein, Vsg may be referred to as an erase voltage, as it helps to establish a GIDL voltage between two terminals of a select transistor. A select gate voltage (Vsgd) pulse is provided to the drain side select line that is connected to a control gate of a drain side select transistor. A select gate voltage (Vsgs) pulse is provided to the source side select line that is connected to a control gate of a source side select transistor. The steady state magnitudes of Vsgd and Vsgs may be the same as each other or different from each other. In some embodiments, the steady state magnitudes of Vsgd and Vsgs depends on the location of the block that is selected for erase, which may compensate for location dependent impedance mismatches between the select lines and bit lines. In some embodiments, the steady state magnitudes of Vsgd and Vsgs depends on the temperature of the block that is selected for erase (or the controller or the memory system), which may compensate for temperature dependent impedance mismatches between the select lines and bit lines.

Due to factors such as voltage drop due to the resistances along the drain side select line and source side select line, the select gate voltage may have a smaller magnitude when it reaches the select transistor. In one embodiment, the magnitude of the select gate voltages that are applied to the drain side select line and drain side select line are different, such that the magnitudes will be substantially the same at the select transistors. In some embodiments, the magnitude of the select gate voltages that are applied to the drain side select line and drain side select line are adjusted based on temperature, which may compensate for temperature dependent impedance mismatches between the select lines,

Due to factors such as a different RC delay along the drain side select line and source side select line, the select gate voltage pulses may experience different delays in getting to the select transistors. In one embodiment, the timing of starting the select gate voltage pulses applied to the drain side select line and source side select line are different, such that the select gate voltage pulses will arrive at the select transistors at substantially the same time. In some embodiments, the timing of starting the select gate voltage pulses applied to the drain side select line and source side select line are adjusted based on temperature, which may compensate for temperature dependent impedance mismatches between the select lines.

Step 786 includes applying erase conditions. Step 786 may include applying voltage pulses to a bit line, a source line, a select line connected to a drain side select transistor, a select line connected to a source side select transistor, and word lines connected to control gates of memory cells. The same magnitude or different magnitude erase voltages may be applied to the bit line and the source line. The erase voltage pulses applied to the bit line and the source line may start at the same time or different times. The same magnitude or different magnitude gate voltages may be applied to the drain select line and the source select line, and may start at the same time or a different time. In one embodiment, the drain select line and the source select line are left floating. Erase enable voltages may be applied to the word lines. Step 786 may include controlling the timing of the various signals. Techniques are discussed below for configuring various attributes of the voltage pulses in step 786 in order to improve erase performance.

Step 786 may include charging up (e.g., increasing the voltage of) a channel of the memory string from both the source and the drain end, and setting a low voltage such as 0 volts on the word lines connected to the control gates of the memory cells. In one embodiment, charging up the channels includes applying a suitable voltage to the drain side and/or the source side select gates to generate GIDL current.

Step 788 includes performing an erase verify test for a string. Typically, this involves setting an erase verify voltage VvEr to the word lines that are connected to control gates of memory cells on the string while sensing a current in the memory string. If the current is sufficiently high, the string is considered to pass the verify test. If the string passes the erase verify test at decision step 790, the erase operation is completed, at step 792. If the string does not pass the erase verify test at decision step 790, the process continues at step 794.

Step 794 includes a determination of whether the select gate voltage is to be incremented. If so, then the select gate voltage is incremented in step 796. Whether or not the select gate voltage is incremented, the erase voltage is incremented in step 798. Then, the next iteration of the erase procedure is performed by returning to step 786. An erase iteration (or loop) typically involves applying erase conditions followed by performing a verify test, although in some cases the verify test is omitted.

FIG. 8 depicts the movement of holes and electrons in a NAND string during a two-sided GIDL erase. An example NAND string 800 that includes a channel layer 665 connected to a bit line (BL) and to a source line (SL). A tunnel layer (TNL) 664, charge trapping layer (CTL) 663, and a block oxide (BOX) 660 are layers which extend around the memory hole of the string. Different regions of the channel layers represent channel regions which are associated with respective storage elements or select gate transistors. These channel regions are at a same height and stack level in the stacked memory device as the control gates of the storage elements or select gate transistors.

The NAND string 800 includes an SGD transistor 680 with a control gate 806 and a channel region 807. The NAND string 800 also includes storage elements 810, 815, 820, and 825, control gates 811, 816, 821, and 826, CTL regions 813, 818, 823, and 828, and channel regions 812, 817, 822, and 827, respectively.

The NAND string 800 includes an SGS transistor 670 with a control gate 856 and a channel region 857. The NAND string 800 also includes storage elements 860, 865, 870, and 875, control gates 861, 866, 871, and 876, CTL regions 863, 868, 873, and 878, and channel regions 862, 867, 872, and 877, respectively.

Representative holes are depicted in the channel layers as circles with a “+” sign and representative electrons are depicted in the channel layers as circles with a “−” sign. Electron-hole pairs are generated by a GIDL process. Initially, during an erase operation, the electron-hole pairs are generated at the SGD and SGS transistors. The holes move away from the driven ends into the channel, thereby charging the channel to a positive potential. The electrons generated at the SGD transistor 680 move toward the bit line (BL) due to the positive potential there. The electrons generated at the SGS transistor 670 move toward the source line (SL) due to the positive potential there. Subsequently, during the erase period of each storage element, additional holes are generated by GIDL at virtual junctions which are formed in the channel at the edges of the control gate of the storage element. However, some holes are also removed from the channel as they tunnel to the CTL regions.

Electrons are also generated by the GIDL process. Initially, during the erase operation, the electrons are generated at the SGD and SGS transistors and move toward the driven ends. Subsequently, during the erase period of each storage element, additional electrons are generated by GIDL at virtual junctions, which are formed in the channel at the edges of the control gate of the storage element.

At one end (e.g., drain side) of the NAND string, example electrons 840 and 841 move toward the bit line. Electron 840 is generated at the SGD transistor and electron 841 is generated at a junction of the storage element 815 in the channel region 817. Also, in the drain side, example holes including a hole 842 move away from the bit line as indicated by arrows. The hole 842 is generated at a junction of the storage element 815 in the channel region 817 and can tunnel into the CTL region 818 as indicated by arrow 843.

At the other end (e.g., source side) of the NAND string, example electrons 845 and 849 move toward the source line. Electron 845 is generated at the SGS transistor and electron 849 is generated at a junction of the storage element 865 in the channel region 867. Also, in the source side, example holes including a hole 847 move away from the source line as indicated by the arrow. The hole 847 is generated at a junction of the storage element 865 in the channel region 867 and can tunnel into the CTL region 868 as indicated by arrow 848.

FIG. 9A is a diagram of NAND string 900 and pathways that may provide voltages to select transistors of the NAND string. The NAND string 900 has a first select transistor 680 at one end of the NAND string, and a second select transistor 670 at the other end of the NAND string. The first select transistor 680 may be referred to as a drain side select transistor. The second select transistor 670 may be referred to as a source side select transistor. There are a number of memory cells connected between the two select transistors (also referred to as select gates). The control gates of data memory cells are connected to various data word lines (e.g., WL0-WLn). The control gates of dummy memory cells are connected to various dummy word lines (e.g., DWLs, DWLd). The NAND string 900 in FIG. 9A is implemented with the NAND string depicted in FIGS. 4, 6A, and 6B, in one embodiment. However, the NAND string in FIG. 9A is not limited to the NAND string depicted in FIGS. 4, 6A, and 6B.

FIG. 9A depicts a number of pathways 906, 908, 910, and 912. Herein, a “pathway” is any tangible medium capable of transmitting an electrical signal (e.g., a voltage pulse or a current pulse) along the pathway. A pathway may include an electrically conductive path. In embodiments, a pathway may include, but is not limited to, one or more of a wire, trace, transmission line, track, pad, layer, lead, metal, portion of a printed circuit board or assembly, conducting material and other material that may transfer or carry an electrical signal. A pathway may include an electrical component such as a transistor. The transistor may act as a switch that is closed to allow the electrical signal to propagate along the pathway, and opened to prevent the electrical signal from propagating along the pathway. In embodiments, a pathway may form one or more geometric shapes, such as a line or multiple connected lines. In embodiments, a pathway may be unidirectional or bidirectional in transferring electrical signals between circuits and within circuits.

Pathway P1 906 is connected to one terminal (e.g., drain terminal) of the first select transistor 680. Pathway P1 906 resides along a bit line, in one embodiment. Pathway P1 906 may include other elements such as switches (e.g., transistors). Pathway P1 906 may also be referred to as an electrically conductive pathway. Pathway P1 906 has an impedance, which is represented by resistance (R_P1) and a capacitance (C_P1). Resistance (R_P1) and capacitance (C_P1) include a bit line resistance and a bit line capacitance, in one embodiment. Resistance (R_P1) and a capacitance (C_P1) may include resistances and/or capacitances of other components along the pathway P1.

P1 circuitry 922 is configured to apply a voltage pulse V_P1 a to one end of pathway P1 906. P1 circuitry 922 may comprise any electrical components that are capable of providing a voltage. The voltage is relative to some common point, such as ground. P1 circuitry 922 includes one or more charge pumps (voltage source), in one embodiment. Due to the impedance of pathway P1 906, there may be an RC delay along the pathway P1 906. Due to the impedance of pathway P1 906, there may be a voltage drop along the pathway P1 906. The voltage pulse is referred to as V_P1 b at the other end of the pathway P1 906 to indicate the possible delay and/or change in magnitude.

Pathway P2 908 is connected to one terminal (e.g., drain terminal) of the second select transistor 670. Pathway P2 908 resides along a source line, in one embodiment. Pathway P2 908 may include other elements such as switches (e.g., transistors). Pathway P2 908 may also be referred to as an electrically conductive pathway. Pathway P2 908 has an impedance, which is represented by resistance (R_P2) and a capacitance (C_P2). Resistance (R_P2) and capacitance (C_P2) include a source line resistance and a source line capacitance, in one embodiment. Resistance (R_P2) and a capacitance (C_P2) may include resistances and/or capacitances of other components along the pathway P2.

P2 circuitry 924 is configured to apply a voltage pulse V_P2 a to pathway P2 908. P2 circuitry 924 may comprise any electrical components that are capable of providing a voltage. The voltage is relative to some common point, such as ground. P2 circuitry 924 includes one or more charge pumps (voltage source), in one embodiment. Due to the impedance of pathway P2 908, there may be an RC delay along the pathway P2 908. Due to the impedance of pathway P2 908, there may be a voltage drop along the pathway P2 908. The voltage pulse is referred to as V_P2 b at the other end of the pathway P2 908 to indicate the possible delay and/or change in magnitude.

Pathway P3 910 is connected to one terminal (e.g., gate terminal) of the first select transistor 680. Pathway P3 910 resides along a select line, in one embodiment. The select line is referred to as a drain side select line, in one embodiment. The select line includes a global drain side select line (in one embodiment). Pathway P3 910 may include other elements such as switches (e.g., transistors). Pathway P3 910 may also be referred to as an electrically conductive pathway. Pathway P3 910 has an impedance, which is represented by resistance (R_P3) and a capacitance (C_P3). Resistance (R_P3) and capacitance (C_P3) include a select line resistance and a select line capacitance, in one embodiment. Resistance (R_P3) and a capacitance (C_P3) may include resistances and/or capacitances of other components along the pathway P3 910.

P3 circuitry 926 is configured to apply a voltage pulse V_P3 a to pathway P3 910. P3 circuitry 926 may comprise any electrical components that are capable of providing a voltage. The voltage is relative to some common point, such as ground. P3 circuitry 926 includes one or more charge pumps (voltage source), in one embodiment. Due to the impedance of pathway P3 910, there may be an RC delay along the pathway P3 910. Due to the impedance of pathway P3 910, there may be a voltage drop along the pathway P3 910. The voltage pulse is referred to as V_P3 b at the other end of the pathway P3 910 to indicate the possible delay and/or change in magnitude. In one embodiment, P3 circuitry 926 leaves pathway P3 910 floating, such that the voltage of the gate terminal of transistor 680 floats during a two-sided GIDL erase.

Pathway P4 912 is connected to one terminal (e.g., gate terminal) of the second select transistor 670. Pathway P4 912 resides along a select line, in one embodiment. The select line is referred to as a source side select line, in one embodiment. The select line includes a global source side select line, in one embodiment. Pathway P4 912 may include other elements such as switches (e.g., transistors). Pathway P4 912 may also be referred to as an electrically conductive pathway. Pathway P4 912 has an impedance, which is represented by resistance (R_P4) and a capacitance (C_P4). Resistance (R_P4) and capacitance (C_P4) include a select line resistance and a select line capacitance, in one embodiment. Resistance (R_P4) and a capacitance (C_P4) may include resistances and/or capacitances of other components along the pathway P4 912.

P4 circuitry 928 is configured to apply a voltage pulse V_P4 a to pathway P4 912. P4 circuitry 928 may comprise any electrical components that are capable of providing a voltage. The voltage is relative to some common point, such as ground. P4 circuitry 928 includes one or more charge pumps (voltage source), in one embodiment. Due to the impedance of pathway P4 912, there may be an RC delay along the pathway P4 912. Due to the impedance of pathway P4 912, there may be a voltage drop along the pathway P4 912. The voltage pulse is referred to as V_P4 b at the other end of the pathway P4 912 to indicate the possible delay and/or change in magnitude. In one embodiment, P4 circuitry 928 leaves pathway P4 912 floating, such that the voltage of the gate terminal of transistor 670 floats during a two-sided GIDL erase.

Therefore, voltage V_P1 b is applied to one terminal (e.g., drain) of transistor 680, and voltage V_P3 b is applied to another terminal (e.g., gate) of transistor 680. In one embodiment, V_P1 b-V_P3 b causes a GIDL current (I_gidl_s) at transistor 680 during a two-sided GIDL erase. Therefore, V_P1 b-V_P3 b may be referred to as a GIDL voltage (Vgidl_d). The magnitude of V_P1 b-V_P3 b is not necessarily the same as the magnitude of V_P1 a-V_P3 a.

In another embodiment, voltage V_P1 b is applied to one terminal (e.g., drain) of transistor 680, while the voltage on pathway 910 is floating. However, the gate terminal of select transistor 680 may rise due to capacitive coupling. Hence, there will be a GIDL voltage Vdigl_a across two terminals of select transistor 680.

Therefore, voltage V_P2 b is applied to one terminal (e.g., drain) of transistor 670, with voltage V_P4 b is applied to another terminal (e.g., gate) of transistor 670, in one embodiment. In one embodiment, V_P2 b-V_P4 b causes a GIDL current (I_gidl_s) at transistor 670 during a two-sided GIDL erase. Therefore, V_P2 b-V_P4 b may be referred to as a GIDL voltage (Vgidl_s). The magnitude of V_P2 b-V_P4 b is not necessarily the same as the magnitude of V_P2 a-V_P4 a.

In another embodiment, voltage V_P2 b is applied to one terminal (e.g., drain) of transistor 670, while the voltage on pathway 912 is floating. However, the gate terminal of select transistor 670 may rise due to capacitive coupling. Hence, there will be a GIDL voltage Vdigl_a across two terminals of select transistor 670.

Herein any of the voltages (e.g., V_P1 b, V_P2 b, V_P3 b, V_P4 b) that are applied to a terminal of a select transistor during a two-sided GIDL erase may be referred to as an erase voltage. Also, the voltage (e.g., Vgidl_d, Vgidl_s) that appears between the drain and gate terminals of a select transistor during a two-sided GIDL erase may be referred to as an erase voltage.

In one embodiment, voltage pulses that are applied to pathways at each end of the NAND string are configured to compensate for different impedances of the pathways at each end of the NAND string. For example, the voltage pulses applied to pathway P1 906 and pathway P2 908 may be configured to compensate for different impedances of the pathway P1 906 and pathway P2 908. As another example, the voltage pulses applied to pathway P3 910 and pathway P4 912 may be configured to compensate for different impedances of the pathway P3 910 and pathway P4 912. In one embodiment, the voltage pulses applied to pathway P3 910 and pathway P4 912 are configured to compensate for different impedances of the pathway P1 906 and pathway P2 908.

In one embodiment, one or more attributes of voltage pulses that are applied to pathways at each end of the NAND string is configured such that a first erase voltage at the first select transistor 680 is substantially symmetric with a second erase voltage at the second select transistor 670. For example, V_P1 b may be substantially symmetric with V_P2 b; V_P3C may be substantially symmetric with V_P4 b; and/or Vgidl_d may be substantially symmetric with Vgidl_s. Achieving substantially symmetric erase voltages may include setting one or more attributes of the voltage pulses to compensate for different impedances of pathways at each end of the NAND string.

In one embodiment, one or more attributes of voltage pulses that are applied to pathways at each end of the NAND string are configured such that Igidl_d and Igidl_s have substantially the same steady state magnitudes. Achieving substantially the same magnitudes in Igidl_d and Igidl_s may include setting attributes of the voltage pulses to compensate for different impedances of pathways at each end of the NAND string.

FIG. 9A also shows some details of the GIDL currents generated at each end of the NAND string during a two-sided GIDL erase. Representative holes are depicted as circles with a “+” sign and representative electrons are depicted as circles with a “−” sign. Electron-hole pairs are generated at the first and second select transistors 680, 670. GIDL current Igidl_d is generated at first select transistor 680. The electrons move to the first pathway P1 906, and holes move to the NAND channel. GIDL current Igidl_s is generated at second select transistor 680. The electrons move to the second pathway P2 908, and holes move to the NAND channel. The memory cells have an erase enable voltage (not depicted in FIG. 9A) applied to their control gates. The erase enable voltage is significantly lower than the voltage in the NAND channel. Therefore, some of the holes are removed from the NAND channel as they tunnel to the charge trap regions of the memory cells.

Note that although the example in FIG. 9A is with respect to applying GIDL voltages at the select transistors 680, 670, the voltages that are applied at the select transistors 680, 670 are not required to be GIDL voltages. FIG. 9B is a schematic diagram of one embodiment of a NAND string and pathways connected to select transistors. The NAND string 900 is similar to the string of FIG. 9A. However, a GIDL voltage is not applied and a GIDL current is not generated at the select transistors 680, 670, in this embodiment. Instead, the voltage between the gate terminal 920 to bit line terminal 918 for select transistor 680 is labeled as Vg_bl. The voltage between the gate terminal 930 to bit line terminal 932 for select transistor 670 is labeled as Vg_sl. The gate terminal 920 to bit line terminal 918 for select transistor 680 has substantially the same steady state magnitude as the gate terminal 930 to bit line terminal 932 voltage for select transistor 670, in one embodiment. The gate terminal 920 to bit line terminal 918 voltage for select transistor 680 is a first voltage pulse, and the gate terminal 930 to bit line terminal 932 voltage for select transistor 670 is a second voltage pulse, in one embodiment. The first voltage pulse and the second voltage pulse are substantially symmetric voltage pulses, in one embodiment.

With reference to FIGS. 9A and 9B, the impedances of one or more of pathway P1 906, pathway P2 908, pathway P3 910, and/or pathway P4 912 depends on the location of a block comprising memory cells that is selected to perform a memory operation, in some embodiments. As will be discussed more fully below, the length of a pathway may depend on the location of the selected block. In some embodiments, the impedance depends on the length of the path. Moreover, the block location dependence of the impedance can differ for the pathways. For example, pathway P1 906 may be relatively long for selected block A, but relatively short for selected block B. In contrast, pathway P3 910 (or pathway P2 908) may be relatively short for selected block A, but relatively long for selected block B. A consequence of the foregoing is that the impedance mismatch between two pathways depends on the location of the selected block, in some embodiments. One or more control circuits compensate for block location dependent impedance mismatch between pathways during memory operations on non-volatile memory cells, in some embodiments.

With reference to FIGS. 9A and 9B, the impedances of one or more of pathway P1 906, pathway P2 908, pathway P3 910, and/or pathway P4 912 depends on temperature. Therefore, in some embodiments, an impedance mismatch between two pathways may depend on the current temperature. One or more control circuits compensate for temperature dependent impedance mismatch between pathways during memory operations on non-volatile memory cells, in some embodiments.

FIG. 10 depicts an example voltage pulse 1000. The voltage pulse 1000 has a first transient period between time t1 to time t2, a steady state period between time t2 to time t3, and a second transient period between time t3 to time t4. The voltage pulse 1000 changes (e.g., increases) from an initial voltage to a steady state voltage during a first transient period, first ramp time. The voltage pulse 1000 stays at the steady state voltage for a “pulse duration,” which extends from time t2 to time t3. The voltage pulse 1000 changes (e.g., decreases) from the steady state voltage to a final voltage during a second transient period, second ramp time.

Note that although the pulse 1000 ramps down in voltage during the second transient period, the pulse could ramp up in the second transient period (in combination with also ramping up in the first transient period). Also note that the steady state voltage of a first voltage pulse may serve as the initial voltage for an immediately following voltage pulse. In this case, the second transient period of the first voltage pulse is also the first transient period of the immediately following voltage pulse. Moreover, in this case, the steady state voltage of the immediately following voltage pulse is the final voltage of first voltage pulse.

The start time of a voltage pulse is defined herein as the beginning of the first transient period, when the voltage first begins to change from the initial voltage. The end time of a voltage pulse is defined herein as the end of the second transient period, when the voltage first reaches the final voltage. The first ramp time of a voltage pulse is defined herein as the time to change from the initial voltage to the steady state voltage. The first ramp time may be a ramp-up in voltage or a ramp-down in voltage. The second ramp time of a voltage pulse is defined herein as the time to change from the steady state voltage to the final voltage. The second ramp time may be a ramp-up in voltage or a ramp-down in voltage. The term “ramp time” is used herein to refer to either the first ramp time or the second ramp time.

A voltage pulse attribute is defined herein as any attribute that describes the shape of a voltage pulse 1000. Examples of voltage pulse attributes include, but are not limited to, first ramp time, second ramp time, ramp-up time, ramp-down time, steady state magnitude, pulse duration, start time, end time, and the like.

The voltage pulse may be the electric potential relative to a common point in a circuit (e.g., ground). For example, a voltage pulse applied to a bit line may be the difference in electric potential of the bit line and the electric potential of a common point (e.g., ground). However, herein a voltage pulse is not required to be the electric potential relative to ground. A voltage pulse may be the difference in electric potential between any two points in a circuit. For example, a voltage pulse may be the difference in electric potential between the gate and drain of a transistor.

FIG. 10A depicts possible voltage pulses in one embodiment of operating the memory device of FIG. 9A or 9B. Note that to simplify the diagram only the first transient period and a portion of the steady state period is depicted. The second transient period is not depicted. This simplification applies to other voltage pulses depicted in the drawings. Voltage pulse 1002 a represents voltage pulse V_P1 a that is applied by P1 circuitry 922 to one end of pathway P1 906, in one embodiment. Voltage pulse 1004 a represents voltage pulse V_P2 a that is applied by P2 circuitry 924 to one end of pathway P2 908.

Voltage pulse 1002 a has a steady state magnitude of VP1 a_ss. Voltage pulse 1004 a has a steady state magnitude of VP2 a_ss. The two voltage pulses 1002 a, 1004 a have different steady state magnitudes. Voltage pulse 1002 a starts at time t1. Voltage pulse 1002 a starts at time t2. The two voltage pulses 1002 a, 1004 a have different start times. The two voltage pulses 1002 a, 1004 a have different first ramp times. The dotted arrows lines labeled “first ramp time” represents the time to increase from the starting voltage to the steady state voltage. In FIG. 10A, the voltage pulses are somewhat simplified in that the voltage pulses are depicted with straight line segments. However, the voltage pulses may have segments with other than straight line segments. Note that the times t1-t4 in FIG. 10A do not correspond to times t1 to t4 in FIG. 10.

In this example, several of the pulse attributes (e.g., steady state magnitude, start time, and ramp time) of these voltage pulses 1002 a, 1004 a are different to compensate for different impedances of pathway P1 906 and pathway P2 908. In one embodiment, one or more of the pulse attributes (e.g., steady state magnitude, start time, and/or ramp time) of these voltage pulses are different to compensate for different impedances of pathway P1 906 and pathway P2 908. In one embodiment, at least one of the attributes of the voltage pulse applied to pathway P1 906 has a different value than the same attribute of the voltage pulse applied to pathway P2 908 such that the two voltage pulses are substantially symmetric at the respective terminals of the select transistors 680, 670.

Voltage pulse 1002 b (solid line) represents the voltage V_P1 b at the other end of pathway P1 906, in one embodiment. Thus, voltage pulse 1002 b is applied to one terminal (e.g., drain) of select transistor 680. Voltage pulse 1004 b (dotted line) represents the voltage V_P2 b at the other end of pathway P2 908, in one embodiment. Thus, voltage pulse 1004 b is applied to one terminal (e.g., drain) of select transistor 670. The two voltage pulses 1002 b, 1004 b have substantially the same steady state magnitude, substantially the same the same start time, and substantially the same the same first ramp time.

Herein, “substantially the same ramp time” of two voltage pulses means that time difference in ramp times of the two voltage pulses is less than 3% of the shorter of the two ramp times of the two voltage pulses. This may apply to either the first ramp time or the second ramp time (the comparison is with respect to either the first ramp time of each voltage pulse or the second ramp time of each voltage pulse). Two voltage pulses that do not have substantially the same ramp time are defined as having different ramp times. In one embodiment, the time difference in ramp times of the two voltage pulses 1002 b, 1004 b is less than 2% of the shorter of the two ramp times of the two voltage pulses. In one embodiment, the time difference in ramp times of the two voltage pulses 1002 b, 1004 b is less than 1% of the shorter of the two ramp times of the two voltage pulses.

Herein, “substantially the same start time of two voltage pulses” means that the time difference in start times of the two voltage pulses is less than 3% of the longer of the two first ramp times of the two voltage pulses. Two voltage pulses that do not have substantially the same start time are defined as having different start times. In one embodiment, the time difference in start times of the two voltage pulses is less than 2% of the longer of the two first ramp times of the two voltage pulses. In one embodiment, the time difference in start times of the two voltage pulses is less than 1% of the longer of the two first ramp times of the two voltage pulses.

The two voltage pulses 1002 b, 1004 b are substantially symmetric. The two voltage pulses 1002 b, 1004 b each have a first transient period, which is depicted between about times t3 to about t4. Note that the two pulses 1002 b, 1004 b do not necessarily both start at exactly the same time, or reach their steady state values at exactly the same time. In one embodiment, the difference in steady state voltage magnitudes of pulses 1002 b, 1004 b is within 2% of the larger steady state magnitude and the difference in voltage magnitudes during the first transient period are within 2% of the larger steady state magnitude. In one embodiment, the difference in steady state voltage magnitudes of pulses 1002 b, 1004 b are within 1% of the larger steady state magnitude and the difference in voltage magnitudes during the first transient period are within 1% of the larger steady state magnitude.

FIG. 10B depicts possible voltage pulses in one embodiment of operating the memory device of FIG. 9A or 9B. Voltage pulse 1012 a represents voltage pulse V_P3 a that is applied by P3 circuitry 926 to one end of pathway P3 910, in one embodiment. Voltage pulse 1014 a represents voltage pulse V_P4 a that is applied by P4 circuitry 928 to one end of pathway 912, in one embodiment.

Voltage pulse 1012 a has a steady state magnitude of VP3 a_ss. Voltage pulse 1014 a has a steady state magnitude of VP4 a_ss. The two voltage pulses 1012 a, 1014 a have different steady state magnitudes. Voltage pulse 1012 a starts at time t1′. Voltage pulse 1012 a starts at time t2′. The two voltage pulses 1012 a, 1014 a have different start times. The two voltage pulses 1012 a, 1014 a have different first ramp times.

In this example, several of the pulse attributes (e.g., steady state magnitude, start time, and first ramp time) of these voltage pulses 1012 a, 1014 a are different to compensate for different impedances of pathway P3 910 and pathway P4 912. In one embodiment, one or more of the pulse attributes (e.g., steady state magnitude, start time, and/or ramp time) of these voltage pulses are different to compensate for different impedances of pathway P3 910 and pathway P4 912. The differences are block location dependent, in some embodiments. In one embodiment, at least one of the attributes of the voltage pulse applied to pathway P3 910 has a different value than the same attribute of the voltage pulse applied to pathway P4 912 such that the two voltage pulses are substantially symmetric at the respective terminals of the select transistors 680, 670.

Voltage pulse 1012 b (solid line) represents the voltage V_P3C at the other end of pathway P3 910, in one embodiment. Thus, voltage pulse 1012 b is applied to one terminal (e.g., drain) of select transistor 680. Voltage pulse 1014 b (dotted line) represents the voltage V_P2 b at the other end of pathway P4 912, in one embodiment. Thus, voltage pulse 1012 b is applied to one terminal (e.g., drain) of select transistor 670. The two voltage pulses 1012 b, 1014 b have substantially the same steady state magnitude, substantially the same the same start time, and substantially the same the same first ramp time.

In one embodiment, the time difference in first ramp times of the two voltage pulses 1012 b, 1014 b is less than 2% of the shorter of the two first ramp times of the two voltage pulses. In one embodiment, the time difference in first ramp times of the two voltage pulses 1012 b, 1014 b is less than 1% of the shorter of the two first ramp times of the two voltage pulses.

In one embodiment, the time difference in start times of the two voltage pulses 1012 b, 1014 b is less than 2% of the shorter of the two first ramp times of the two voltage pulses. In one embodiment, the time difference in start times of the two voltage pulses 1012 b, 1014 b is less than 1% of the shorter of the two first ramp times of the two voltage pulses.

The two voltage pulses 1012 b, 1014 b are substantially symmetric. The two voltage pulses 1012 b, 1014 b each have a first transient period, which is depicted between about times t3′ to about t4′. Note that the two pulses 1012 b, 1014 b do not necessarily both start at exactly the same time, or reach their steady state values at exactly the same time. In one embodiment, the difference in steady state voltage magnitudes of pulses 1012 b, 1014 b is within 2% of the larger steady state magnitude and the difference in voltage magnitudes during the first transient period are within 2% of the larger steady state magnitude. In one embodiment, the difference in steady state voltage magnitudes of pulses 1012 b, 1014 b is within 1% of the larger steady state magnitude and the difference in voltage magnitudes during the first transient period are within 1% of the larger steady state magnitude.

In one embodiment, the attributes of the voltage pulses that are applied to the various pathways 906, 908, 910, 912 have attributes that are configured such that the GIDL voltage (Vgidl_d) at transistor 680 and the GIDL voltage (Vgidl_s) at transistor 670 are substantially symmetric. In one embodiment, the attributes of the voltage pulses depend on the location of the block that is selected for erase, and/or the current temperature (and/or change in temperature). FIG. 10C depicts possible voltage pulses in one embodiment of operating the memory device of FIG. 9A or 9B. Voltage pulse 1022 represents voltage pulse V_P1 a that is applied by P1 circuitry 922 to one end of pathway 906, in one embodiment. Voltage pulse 1024 represents voltage pulse V_P3 a that is applied by P3 circuitry 926 to one end of pathway P3 910, in one embodiment. Voltage pulse 1026 represents voltage pulse V_P2 a that is applied by P2 circuitry 924 to one end of pathway 908, in one embodiment. Voltage pulse 1028 represents voltage pulse V_P4 a that is applied by P4 circuitry 928 to one end of pathway 912, in one embodiment.

Voltage pulse 1030 (solid line) represents the voltage Vgidl_d that is between two terminals of select transistor 680, in one embodiment. For example, voltage pulse 1030 may be the drain to gate voltage of select transistor 680. Voltage pulse 1032 (dotted line) represents the voltage Vgidl_ds that is between two terminals of select transistor 670, in one embodiment. For example, voltage pulse 1032 may be the drain to gate voltage of select transistor 670.

The values for various attributes (e.g., start time, steady state magnitude, first ramp time) of voltage pulses 1022, 1024, 1026, and/or 1026 are selected such that voltage pulse 1030 and voltage pulse 1032 are substantially symmetric, in one embodiment. In one embodiment, the difference in steady state voltage magnitudes of pulses 1030, 1032 is within 2% of the larger steady state magnitude and the difference in voltage magnitudes during the first transient period are within 2% of the larger steady state magnitude. In one embodiment, the difference in steady state voltage magnitudes of pulses 1030, 1032 is within 1% of the larger steady state magnitude and the difference in voltage magnitudes during the first transient period are within 1% of the larger steady state magnitude.

In one embodiment, the steady state magnitudes of voltage pulse 1022 is substantially the same as the steady state magnitudes of voltage pulse 1026; however, the steady state magnitudes of voltage pulse 1024 is different from the steady state magnitude of voltage pulse 1028. This combination of voltages results in the steady state magnitudes of voltage pulses 1030 and 1032 being substantially the same, in one embodiment. The different steady state magnitudes of voltage pulse 1024 and voltage pulse 1028 may compensate for impedance differences of the first pathway P1 906 and the second pathway 908. The different steady state magnitudes of voltage pulses 1024 and 1028 are selected such that voltage pulse 1030 and voltage pulse 1032 are substantially symmetric, in one embodiment.

In one embodiment, the start time of voltage pulse 1022 is substantially the same as the start time of voltage pulse 1026; however, the start times of voltage pulse 1024 is different from the start time of voltage pulse 1028. The different start times of voltage pulse 1024 and voltage pulse 1028 may compensate for impedance differences of the first pathway P1 906 and the second pathway 908. The different start times of voltage pulses 1024 and 1028 are selected such that voltage pulse 1030 and voltage pulse 1032 are substantially symmetric, in one embodiment. The different start times of voltage pulses 1024 and 1028 are selected such that voltage pulse 1030 and voltage pulse 1032 start at substantially the same time, in one embodiment. The different start times of voltage pulses 1024 and 1028 are selected such that voltage pulse 1030 and voltage pulse 1032 have substantially the same steady state magnitudes, in one embodiment

In one embodiment, both the start time and the steady state magnitude of voltage pulses 1022 and 1026 are substantially the same; however, both the start times and the steady state magnitudes of voltage pulses 1024 and 1028 are different from each other. The different start times and steady state magnitudes of voltage pulses 1024 and 1028 may compensate for impedance differences of the first pathway P1 906 and the second pathway 908. The different start times and steady state magnitudes of voltage pulses 1024 and 1028 are selected such that voltage pulse 1030 and voltage pulse 1032 are substantially symmetric, in one embodiment.

Other voltage pulse attributes can also be used to, for example, compensate for different impedances. In one embodiment, the end time of two voltage pulses are used to compensate for impedance differences of the first pathway P1 906 and the second pathway 908. For example, the end time could be different as applied to the first pathway P1 906 and the second pathway 908, but substantially the same at the select transistors. Herein, “substantially the same end time of two voltage pulses” means that the time difference in end times of the two voltage pulses is less than 3% of the shorter of the two second ramp times of the two voltage pulses. Two voltage pulses that do not have substantially the same end time are defined as having different end times. In one embodiment, the time difference in end times of the two voltage pulses is less than 2% of the shorter of the two second ramp times of the two voltage pulses. In one embodiment, the time difference in end times of the two voltage pulses is less than 1% of the shorter of the two second ramp times of the two voltage pulses.

In one embodiment, two different voltage pulses applied to two of the pathways P1 906, P2 908, P3 910, P4 912 have different pulse attributes to achieve substantially the same pulse duration of two voltage pulses at the select transistors. Herein, “substantially the same pulse duration of two voltage pulses” means that the time difference in pulse duration of the two voltage pulses is less than 3% of the shorter of the two pulse durations. In one embodiment, the difference in pulse durations of the two voltage pulses at the select transistors is less than 2% of the shorter of the two pulse durations. In one embodiment, the difference in pulse durations of the two voltage pulses at the select transistors is less than 1% of the shorter of the two pulse durations.

FIG. 11 is a flowchart of one embodiment of a process 1100 of a two-sided GIDL erase. The process 1100 is used to erase memory cells that are connected between two select transistors 680, 670, in one embodiment. Reference will be made to the circuit of FIG. 9A when discussing process 1100; however, process 1100 is not limited to the circuit of FIG. 9A. The process 1100 is used to erase a NAND string of memory cells, in one embodiment. The NAND string is in a three-dimensional memory array, in one embodiment. Process 1100 may be performed by control circuit of memory device 100. For example, process 1100 may be performed by state machine 112 and/or controller 122 (or equivalently functioned circuits), in combination with all or a subset of the other circuits depicted in FIG. 1. In one embodiment, state machine 112 instructs voltage circuitry (e.g., P1 circuitry 922, P2 circuitry 924, P3 circuitry 926, and/or P4 circuitry 928) to apply voltage pulses to various pathways (or in some cases to leave the voltage floating). In some embodiments of process 1100, the voltages that are applied in steps 1102 and 1104 depend on the location of the block that is selected for erase, which may be used to compensate for block location dependent impedance mismatch between pathways. In some embodiments of process 1100, the voltages that are applied in steps 1102 and 1104 depend on the current temperature, which may be used to compensate for temperature dependent impedance mismatch between pathways.

Step 1102 includes causing a first GIDL voltage between two terminals of a first select transistor 680. Step 1102 may include a state machine 112 (or other circuitry or logic) instructing a voltage circuit to apply one or more voltages to one or more pathways. For example, state machine 112 may instruct P1 circuitry 922 to apply voltage V_P1 a to the first pathway P1 906 and P3 circuitry 926 to apply voltage V_P3 a to the third pathway P3 910, in one embodiment. State machine 112 may control the timing such that P1 circuitry 922 applies voltage V_P1 a to the first pathway P1 906 while P3 circuitry 926 applies voltage V_P3 a to the third pathway P3 910. Therefore, the first GIDL voltage is given by V_P1 b-V_P3C. Note that both V_P1 a and V_P3C may have a transient component and a steady state component.

Step 1102 includes P1 circuitry 922 applying voltage V_P1 a to first pathway P1 906 while P3 circuitry 926 allows the voltage on the third pathway P3 910 to float, in one embodiment. In this case, the voltage on the terminal (e.g., gate terminal) of select transistor 680 that is connected to the third pathway P3 910 may increase due to capacitive coupling. The net result is that the first GIDL voltage is given by V_P1 b minus the floating voltage on the gate terminal of select transistor 680.

Step 1104 includes causing a second GIDL voltage between two terminals of a first select transistor 680. Step 1104 may include a state machine 112 instructing the voltage circuit to apply one or more voltages to one or more pathways. For example, state machine 112 may instruct P2 circuitry 924 to apply voltage V_P2 a to the second pathway P2 908, and instruct P4 circuitry 928 to apply voltage V_P4 a to the fourth pathway P4 912, in one embodiment. State machine 112 may control the timing such that P2 circuitry 924 applies voltage V_P2 a to the second pathway P2 908 while P4 circuitry 928 applies voltage V_P4 a to the fourth pathway P4 912. Therefore, the second GIDL voltage is given by V_P2 b-V_P4 b. Note that both V_P2 a and V_P4 b may have first and second transient periods and a steady state period.

Step 1104 includes P2 circuitry 924 applying voltage V_P2 a to second pathway P2 908 while P4 circuitry 928 allows the voltage on the fourth pathway P4 912 to float, in one embodiment. In this case, the voltage on the terminal (e.g., gate terminal) of select transistor 670 that is connected to the fourth pathway P4 912 may increase due to capacitive coupling. The net result is that the second GIDL voltage is given by V_P2 b minus the floating voltage on the gate terminal of select transistor 670. Note that when the third pathway P3 910 and the fourth pathway P4 912 are left floating, factors such as the initial voltage on the pathways P3 910, P4 912 and/or the floating time can be used to achieve different voltages at the first and second select transistors 680, 670. For example, using different initial voltages on the pathways P3 910, P4 912 can result in different floating voltage during the first transient period.

Step 1102 results in a first GIDL voltage (e.g., Vgidl_d). Step 1104 results in a second GIDL voltage (e.g., Vgidl_s). In one embodiment, the first GIDL voltage (e.g., Vgidl_d) is substantially symmetric with the second GIDL voltage (e.g., Vgidl_s). In one embodiment, the steady state magnitude of the first GIDL voltage is substantially the same as the steady state magnitude of the second GIDL voltage. In one embodiment, both the start time and the steady state magnitude of the first GIDL voltage are substantially the same as the start time and the steady state magnitude of the second GIDL voltage.

Step 1102 results in a first GIDL current (e.g., Igidl_d). Step 1104 results in a second GIDL current (e.g., Igidl_s). In one embodiment, the magnitude of the first GIDL current (e.g., Igidl_d) is substantially the same as the magnitude of the second GIDL current (e.g., Igidl_s) during the first transient periods and the steady state periods of the first and the second GIDL voltages. In one embodiment, the first GIDL current (e.g., Igidl_d) is substantially symmetric with the second GIDL current (e.g., Igidl_s). In one embodiment, both the start time and the steady state magnitude of the first GIDL current are substantially the same time as the start time and the steady state magnitude of the second GIDL current.

In one embodiment, the steady state magnitudes of the first and second GIDL voltages (at the terminals of the select transistors) are different from each other; however, the magnitudes of the first and second GIDL currents are substantially the same during the steady state periods of the first and the second GIDL voltages. In one embodiment, the steady state magnitudes of the first and second GIDL voltages (at the terminals of the select transistors) are different from each other; however, the magnitudes of the first and second GIDL currents are substantially the same during the first transient periods and the steady state periods of the first and the second GIDL voltages. This may be used to compensate for structural differences at each end of the NAND string. Such structural differences could result in different GIDL currents for the two select transistors 680, 670 even if the steady state GIDL voltages have the same magnitude.

In one embodiment, the steady state magnitudes of V_P1 a-V_P3 a is different than the steady state magnitudes of V_P2 a-V_P4 a; however, the magnitudes of the first and second GIDL currents are substantially the same during the steady state periods of V_P1 a-V_P3 a and V_P2 a-V_P4 a. In one embodiment, the steady state magnitudes of V_P1 a-V_P3 a is different than the steady state magnitudes of V_P2 a-V_P4 a; however, the magnitudes of the first and second GIDL currents are substantially the same during both the first transient periods and the steady state periods of V_P1 a-V_P3 a and V_P2 a-V_P4 a. This may be used to compensate for impedance differences at each end of the NAND string. For example, this may be used to compensate for impedance mismatches between pathway P1 906 and pathway P2 908. As another example, this may be used to compensate for impedance mismatches between pathway P2 910 and pathway P4 912. Such impedance mismatches could result in different GIDL currents for the two select transistors 680, 670 even if the steady state magnitude of V_P1 a-V_P3 a is the same as the steady state magnitude of V_P2 a-V_P4 a.

In one embodiment, steps 1002 and 1104 include applying voltages having substantially the same magnitude to a first end of pathway P1 906 and to a first end of a pathway P2 908. For example, V_P1 a and V_P2 a have the substantially same magnitude, in one embodiment. V_P1 a and V_P2 a have substantially the same start time and substantially the same steady state magnitude, in one embodiment. Steps 1002 and 1104 also include applying voltages having different magnitudes to a first end of pathway P3 910 and to a first end of a pathway P4 912. For example, voltages V_P3 a and V_P4 a have different magnitudes. Voltages V_P3 a and V_P4 a have different start times and different steady state magnitudes, in one embodiment. Applying the voltages to pathways P1 906, P2 908, P3 910, and P4 912 results in substantially the same voltage between two terminals of SGD transistor 680 and SGS transistor 670, in one embodiment. For example, with reference to FIG. 9A, Vgidl_d has substantially the same magnitude as Vgidl_s. In one embodiment, Vgidl_d and Vgidl_s have substantially the same start times and substantially the same steady state magnitudes.

Step 1106 includes applying an erase enable voltage to control gates of memory cells between the two select transistors 680, 670. Step 1106 is performed while causing the first and second GIDL voltages. Step 1106 includes applying erase enable voltages to word lines that are connected to the control gates of the memory cells, in one embodiment. The erase enable voltage has a steady state magnitude between 0V to 0.5V, in one embodiment. The steady state magnitude of the erase enable voltage could be higher than 0.5V.

FIGS. 12A-12C depict voltage pulses to show further details of one site of embodiments of two-sided GIDL erase. FIG. 12A depicts voltage pulses to show how a voltage pulse attribute of steady state magnitude can be configured in a two-sided GIDL erase. FIG. 12B depicts voltage pulses to show how a voltage pulse attribute of start time can be configured in a two-sided GIDL erase. FIG. 12C depicts voltage pulses to show how a voltage pulse attribute of ramp time can be configured in a two-sided GIDL erase.

Referring now to FIG. 12A, voltage pulse 1202 a represents voltage pulse V_P1 a that is applied by P1 circuitry 922 to one end of pathway 906, in one embodiment. Voltage pulse 1204 a represents voltage pulse V_P2 a that is applied by P2 circuitry 924 to one end of pathway 908, in one embodiment. The two voltage pulses 1202 a, 1204 a have different steady state magnitudes (SS1, SS2). The difference in steady state magnitudes is represented by double headed arrow 1205. In one embodiment, the steady state magnitudes of these voltage pulses are different to compensate for different impedances of pathway P1 906 and pathway P2 908.

Voltage pulse 1202 b represents voltage pulse V_P1 b that arrives at the other end of pathway 906, in one embodiment. Thus, voltage pulse V_P1 b is applied to one terminal (e.g., drain) of select transistor 680. Voltage pulse 1204 b represents voltage pulse V_P2 b that arrives at the other end of pathway 908, in one embodiment. Thus, voltage pulse V_P2 b is applied to one terminal (e.g., drain) of select transistor 670. The difference in steady state magnitude between pulses 1202 b and 1204 b is less than the difference in steady state magnitude between pulses 1202 a and 1204 a. The two voltage pulses 1202 b, 1204 b have substantially the same steady state magnitudes (at the respective select transistors 680, 670). Note that the magnitude gap between pulse 1202 b and 1204 b may be exaggerated so that a magnitude gap can be seen in the Figure.

FIG. 12B depicts possible voltage pulses in one embodiment of operating the memory device of FIG. 9A or 9B. Voltage pulse 1212 a represents voltage pulse V_P1 a that is applied by P1 circuitry 922 to one end of pathway 906, in one embodiment. Voltage pulse 1214 a represents voltage pulse V_P2 a that is applied by P2 circuitry 924 to one end of pathway 908, in one embodiment. The two voltage pulses 1212 a, 1214 a have the same steady state magnitudes, but different start times. In this embodiment, the start time of these voltage pulses are different to compensate for different impedances of pathway P1 906 and pathway P2 908. Pulse 1212 a starts at time t4, whereas pulse 1214 a starts at time t6.

Voltage pulse 1212 b represents voltage pulse V_P1 b that arrives at the other end of pathway 906, in one embodiment. Thus, voltage pulse V_P1 b is applied to one terminal (e.g., drain) of select transistor 680. Voltage pulse 1014 b represents voltage pulse V_P2 b that arrives at the other end of pathway 908, in one embodiment. Thus, voltage pulse V_P2 b is applied to one terminal (e.g., drain) of select transistor 670. Voltage pulse 1212 b starts at time t6, whereas voltage pulse 1214 b starts at time t8. The gap in time between t7 and t8 is less than the gap in time between t5 and t6. The two voltage pulses 1212 b, 1214 b have substantially the same start time (at the respective select transistors 670, 670). Note that the time gap between t7 and t8 may be exaggerated so that a time gap can be seen in the Figure.

FIG. 12C depicts possible voltage pulses in one embodiment of operating the memory device of FIG. 9A or 9B. Voltage pulse 1222 a represents voltage pulse V_P1 a that is applied by P1 circuitry 922 to one end of pathway 906, in one embodiment. Voltage pulse 1224 a represents voltage pulse V_P2 a that is applied by P2 circuitry 924 to one end of pathway 908, in one embodiment. The two voltage pulses 1222 a, 1224 a have the same steady state magnitudes and start times, but different first ramp times. In this embodiment, the first ramp times of these voltage pulses are different to compensate for different impedances of pathway P1 906 and pathway P2 908. Voltage pulse 1222 a has a first ramp time of R1, whereas voltage pulse 1224 a has a first ramp time of R2.

Voltage pulse 1222 b represents voltage pulse V_P1 b that arrives at the other end of pathway 906, in one embodiment. Thus, voltage pulse V_P1 b is applied to one terminal (e.g., drain) of select transistor 680. Voltage pulse 1224 b represents voltage pulse V_P2 b that arrives at the other end of pathway 908, in one embodiment. Thus, voltage pulse V_P2 b is applied to one terminal (e.g., drain) of select transistor 670. The two voltage pulses 1222 b, 1224 b have substantially the first ramp times R1′, R2′. The time difference between R2′ and R1′ is less than the time difference between R2 and R1. Note that the differences in first ramp time may be exaggerated so that a ramp time gap can be seen in the Figure.

The concepts in FIGS. 12A-12C may also be applied to the third pathway P3 910 and the fourth pathway P4 912. Thus, with reference to FIG. 12A, voltage pulse 1202 a represents V_P3 a, voltage pulse 1204 a represents V_P4 a, voltage pulse 1202 b represents V_P3C, and voltage pulse 1204 b represents V_P4 b, in one embodiment. With reference to FIG. 12B, voltage pulse 1212 a represents V_P3 a, voltage pulse 1214 a represents V_P4 a, voltage pulse 1212 b represents V_P3C, and voltage pulse 1214 b represents V_P4 b, in one embodiment. With reference to FIG. 12C, voltage pulse 1222 a represents V_P3 a, voltage pulse 1224 a represents V_P4 a, voltage pulse 1222 b represents V_P3C, and voltage pulse 1202 b represents V_P4 b, in one embodiment.

FIGS. 12A-12C each focus on one voltage pulse attribute to show how the voltage pulses at the select transistors can be impacted. The concepts in FIGS. 12A-12C may be combined. In one embodiment, the concepts in FIGS. 12A and 12B are combined (by using different initial steady state magnitudes and start times) such that both steady state magnitude and start time at the select transistors are substantially the same. In one embodiment, the concepts in FIGS. 12A and 12C are combined (by using different initial steady state magnitudes and first ramp times) such that both steady state magnitude and first ramp time at the select transistors are substantially the same. In one embodiment, the concepts in FIGS. 12B and 12C are combined (by using different first ramp times and start times) such that both start time and ramp time at the select transistors are substantially the same. In one embodiment, the concepts in FIGS. 12A, 12B and 12C are combined (by using different initial steady state magnitudes start times, and first ramp times) such that steady state magnitude, start time and first ramp time at the select transistors are substantially the same.

FIG. 13A is a schematic diagram of one embodiment of a NAND string and pathways connected to select transistors. The NAND string 900 is similar to the string of FIG. 9A. The pathways differ from the pathways in FIG. 9A in that the same voltage is applied to both the pathway P1 906 connected to the first transistor 680 and the pathway P2 908 connected to the second transistor 670. The NAND string in FIG. 13A may be implemented with the NAND string depicted in FIGS. 3B, 4, 6A, and 6B, in one embodiment. However, the NAND string in FIG. 13A is not limited to the NAND string depicted in FIGS. 3B, 4, 6A, and 6B.

Pathway P1 906 is divided into three sections 906 a, 906 b, and 906 c. Section 906 a has an impedance, which is represented by R_sla and C_sla. Section 906 b has an impedance, which is represented by R_x and C_x. Section 906 c has an impedance, which is represented by R_bl and C_bl. Section 906 a is connected to P2 circuitry 924 and may include a portion of the source line. Section 906 c includes the bit line and is connected to one terminal of select transistor 680. Section 906 b includes transistors 1302 and 1304, as well as an electrically conductive pathway.

The impedance of one or more of sections 906 a, 906 b, and/or 906 c may depend on the location of the block that is selected for the memory operation. In one embodiment, the impedance of section 906 c depends on the location of the block that is selected for the memory operation. It is possible that the impedance of one or more of the sections 906 a, 906 b, and/or 906 c does not depend on the location of the block that is selected for the memory operation. For example, in one embodiment, the impedance section 906 b does not depend on the location of the block that is selected for the memory operation. The impedance of one or more of sections 906 a, 906 b, and/or 906 c may also depend on the temperature.

Pathway P2 908 is connected to one terminal (e.g., drain terminal) of the second select transistor 670. Pathway P2 908 includes the source line, in one embodiment. In one embodiment, the source line is buried in the substrate below the NAND string. Pathway P2 908 may include other elements such as switches (e.g., transistors). Pathway P2 908 is divided into two sections in FIG. 13A. One section has an impedance, which is represented by resistance (R_sla) and a capacitance (C_sla). Another section has an impedance, which is represented by resistance (R_slb) and a capacitance (C_slb). Resistances (R_sla, R_slb) and capacitances (C_sla, C_slb) include a source line resistance and a source line capacitance, in one embodiment. The impedance of Pathway P2 908 may or may not depend on the location of the selected block. The impedance of Pathway P2 908 may depend on the temperature.

P2 circuitry 924 is configured to apply a voltage pulse V_Pxa to one end of pathway P2 908. P2 circuitry 924 may be any electrical component that is capable of providing a voltage. The voltage is relative to some common point, such as ground. P2 circuitry 924 may include one or more charge pumps. In one embodiment, P2 circuitry 924 comprises a source line driver (e.g., 362, 364, 366, or 368 in FIG. 3C).

Due to the impedance of pathway P2 908, there may be an RC delay along the pathway P2 908. Due to the impedance of pathway P2 908, there may be a voltage drop along the pathway P2 908. The voltage pulse is referred to as V_Pxd where section 906 a and 906 b meet. The voltage pulse is referred to as V_Pxs at the other end of the pathway P2 908. The voltage pulse is referred to as V_Pxc where sections 906 b and 906 c meet. The voltage pulse is referred to as V_Pxd where section 906 c connects to the first select transistor 680.

Transistors 1302 and 1304 are used to provide a voltage to the first select transistor 680 along pathway 906. Transistor 1302 is used to access voltage V_Pxb, and provide a version of V_Pxb to transistor 1304. The version of the voltage V_Pxb that is provided transistor 1304 may be delayed and/or reduced in magnitude (relative to the version accessed by transistor 1302) due to the impedance. Transistor 1304 is used to provide voltage V_Pxc to one end of section 906 c. Transistor 1302 is referred to as a buried source line driver, in one embodiment.

Pathways P3 910 and P4 912 are also depicted in FIG. 13A, as well as P3 circuitry 926 and P4 circuitry 928. In some embodiments, the impedance of Pathways P3 910 and P4 912 depends on the location of the selected block and/or the temperature.

Therefore, voltage V_Pxd is applied to one terminal (e.g., drain) of transistor 680. Another voltage may be applied to another terminal (e.g., gate) of transistor 680 via the select line SGD. Therefore, a GIDL voltage Vgidl_d may be provided to the first select transistor 680. In one embodiment, the select line SGD is left floating. However, via capacitive coupling the voltage on the gate of transistor 680 rises such that the GIDL voltage Vgidl_d may be caused at the first select transistor.

Also, voltage V_Pxs is applied to one terminal (e.g., drain) of transistor 670. Another voltage may be applied to another terminal (e.g., gate) of transistor 670 via the select line SGS. Therefore, a GIDL voltage Vgidl_s may be provided to the first select transistor 680. In one embodiment, the select line SGS is left floating. However, via capacitive coupling the voltage on the gate of transistor 670 rises such that the GIDL voltage Vgidl_s may be caused at the first select transistor.

The impedances of pathways P1 906 and P2 908 may be different from each other. In one embodiment, voltage pulses that are applied to the SGD select line and the SGS select line at each end of the NAND string are configured to compensate for different impedances of pathway P1 906 and pathway P2 908. For example, the voltage pulses applied to the SGD select line and the SGS select line may have different values for one or more voltage pulse attributes (e.g., start time, ramp time, steady state magnitude).

In one embodiment, a control circuit applies substantially symmetric voltage pulses to pathways P1 906 and P2 908 that result in asymmetric voltage pulses at the terminals of select transistor 680 and select transistor 670. For example, the same voltage (V_Pxa) may be applied to both pathway P1 906 and P2 908. However, the waveforms of voltage V_Pxd and V_Pxs are asymmetric voltage pulses due to different impedances of pathway P1 906 and P2 908, in one embodiment. The control circuit also applies asymmetric voltage pulses to pathways P3 910 and P4 912 that result in Vgidl_d and Vgidl_s being substantially symmetric voltage pulses, in one embodiment.

Note that although the example in FIG. 13A is with respect to creating GIDL voltages, the voltages are not required to be GIDL voltages. FIG. 13B is a schematic diagram of one embodiment of a NAND string and pathways connected to select transistors. The NAND string 900 is similar to the string of FIG. 13A. However, a GIDL voltage and GIDL current are not generated in this embodiment. The voltage between the gate terminal 1320 to bit line terminal 1322 for select transistor 680 is labeled as Vg_bl. The voltage between the gate terminal 1330 to bit line terminal 1332 for select transistor 670 is labeled as Vg_sl. The gate terminal 1320 to bit line terminal 1322 for select transistor 680 has substantially the same steady state magnitude as the gate terminal 1330 to bit line terminal 1332 voltage for select transistor 670, in one embodiment. The gate terminal 1320 to bit line terminal 1322 voltage for select transistor 680 is a first voltage pulse, and the gate terminal 1330 to bit line terminal 1332 voltage for select transistor 670 is a second voltage pulse, in one embodiment. The first voltage pulse and the second voltage pulse are substantially symmetric voltage pulses, in one embodiment.

The impedances of one or more of pathway P1 906, pathway P2 908, pathway P3 910, and/or pathway P4 912 in FIG. 13A and/or 13B depends on the location of a block comprising memory cells that is selected to perform a memory operation, in some embodiments. As will be discussed more fully below, the length of a pathway may depend on the location of the selected block. In some embodiments, the impedance depends on the length of the path. Moreover, the block location dependence of the impedance can differ for the pathways. For example, pathway P1 906 may be relatively long for selected block A, but relatively short for selected block B. In contrast, pathway P3 910 (or pathway P2 908) may be relatively short for selected block A, but relatively long for selected block B. A consequence of the foregoing is that the impedance mismatch between two pathways depends on the location of the selected block, in some embodiments. One or more control circuits compensate for block location dependent impedance mismatch between pathways during memory operations on non-volatile memory cells, in some embodiments.

In some embodiments, the impedances of one or more of pathway P1 906, pathway P2 908, pathway P3 910, and/or pathway P4 912 depends on temperature. Additionally, the impedances of one or more of pathway P1 906, pathway P2 908, pathway P3 910, and/or pathway P4 912 may vary at different rates in response to change in temperature

FIG. 14A is a diagram of one embodiment of P3 circuitry 926 that is configured to provide a voltage pulse to an SGD select line. The P3 circuitry 926 may be used to provide a voltage pulse to the SGD select line in FIG. 13A. The P3 circuitry 926 includes a high voltage (HV) pump 1410, an operational amplifier 1402, transistor 1404, fixed value resistor 1406, and variable value resistor 1408. The P3 circuitry 926 has an output that provides voltage V_SGD, which may be provided to the SGD select line. In one embodiment, V_SGD is provided to the pathway P3 910.

The HV pump 1410 may include one or more charge pumps and is configured to provide high voltages. The HV pump 1410 provides a high voltage to the operational amplifier 1402. The operational amplifier 1402 output is connected to the gate of transistor 1404. The inverting input of the operational amplifier 1402 is provided with a reference voltage (Ref). The non-inverting input of the operational amplifier 1402 is connected between the fixed value resistor 1406 and the variable value resistor 1408. The value of the variable value resistor 1408 may be adjusted to adjust the magnitude of V_SGD.

FIG. 14B is a diagram of one embodiment of P4 circuitry 928 that is configured to provide a voltage pulse to an SGS select line. The P4 circuitry 928 may be used to provide a voltage pulse to the SGS select line in FIG. 13A. The P4 circuitry 928 includes a high voltage (HV) pump 1410, an operational amplifier 1412, transistor 1414, fixed value resistor 1416, and variable value resistor 1418. The P4 circuitry 928 has an output that provides voltage V_SGS, which may be provided to the SGS select line. In one embodiment, V_SGS is provided to the pathway P4 912.

The HV pump 1410 may be the same HV pump 1410 that is used with the P3 circuitry 926. The HV pump 1410 may provide the same voltage to both P3 circuitry 926 and P4 circuitry 928. However, it is not required that HV pump 1410 provide the same voltage to both P3 circuitry 926 and P4 circuitry 928. The operation of P4 circuitry 928 is similar to P3 circuitry 926. The value of fixed value resistor 1416 may be equal to the value of fixed value resistor 1406. However, variable value resistor 1418 may be set to a different resistance than variable value resistor 1408. Thus, even while using the same voltage from HV pump 1410, different magnitude voltages may be provided to the SGS select line and the SGD select line.

FIG. 15A is a graph of voltage pulses that occur at the select transistors 680, 670 in one embodiment of a two-sided GIDL erase. The voltage pulses occur in one embodiment of operation of the circuit of FIG. 13A. Voltage pulse 1502 is the voltage V_pxd at one terminal (e.g., drain) of the first select transistor 680. Voltage pulse 1504 is the voltage V_pxs at one terminal (e.g., drain) of the second select transistor 670. Note voltage pulses 1502 and 1504 have different steady state magnitudes. This may be due to the different impedances (or impedance mismatch) between the first pathway P1 906 and the second pathway P2 908.

Voltage pulse 1506 is the voltage at the gate terminal of the first select transistor 680. The voltage Vgidl_d is the difference between the magnitudes of voltage pulse 1502 and voltage pulse 1506. Voltage pulse 1508 is the voltage the gate terminal of the second select transistor 670. The voltage Vgidl_s is the difference between the magnitudes of voltage pulse 1504 and voltage pulse 1508. The magnitude of voltage Vgidl_d is substantially equal to the magnitude of voltage Vgidl_s.

Note that graph of voltage pulses in FIG. 15A could apply to memory operations other than a two-sided GIDL erase. For example, these voltage pulses could occur during an erase that is not a GIDL erase. Thus, the voltage difference between voltage pulse 1504 and voltage pulse 1508 is not required to be a GIDL voltage. Likewise, the voltage difference between voltage pulse 1502 and voltage pulse 1506 is not required to be a GIDL voltage. Also, the voltage pulses could occur during memory array operations such as program or read. In one embodiment, the voltage difference between voltage pulse 1504 and voltage pulse 1508 is Vg_sl in FIG. 13B. In one embodiment, the voltage difference between voltage pulse 1502 and voltage pulse 1506 is Vg_bl in FIG. 13B.

FIG. 15B is a graph of voltage pulses that are applied to pathways, in one embodiment of a two-sided GIDL erase. The voltage pulses may be applied to various pathways to result in the voltage pulses of FIG. 15A. Voltage pulse 1512 is the voltage V_pxa, which is provided by P2 circuitry 924, in one embodiment. Voltage pulse 1516 is the voltage applied to the SGD select line, in one embodiment. Voltage pulse 1516 is provided to pathway P3 910 by P3 circuitry 926, in one embodiment. Voltage pulse 1518 is the voltage applied to the SGS select line, in one embodiment. Voltage pulse 1518 is provided to pathway P4 912 by P4 circuitry 928, in one embodiment.

The voltage difference between the steady state magnitude of voltage pulse 1512 and voltage pulse 1516 is referred to by double-sided arrow 1522, in FIG. 15B. The voltage difference between the steady state magnitude of voltage pulse 1512 and voltage pulse 1518 is referred to by double-sided arrow 1524, in FIG. 15B. These two voltage differences have different magnitudes in order to compensate for different impedances of the first pathway P1 906 and the second pathway P2 908, in one embodiment. Note that even though there are voltage differences 1522, 1524 in FIG. 15B, the GIDL voltages (Vgidl_d, Vgidl_s) in FIG. 15A have substantially the same magnitude.

Note that graph of voltage pulses in FIG. 15B could apply to memory operations other than a two-sided GIDL erase. For example, these voltage pulses could be applied during an erase that is not a GIDL erase. Also, the voltage pulses could be applied during memory array operations such as program or read. Thus, the voltage pulses in FIG. 15B could be applied to the pathways in one embodiment of FIG. 13B.

FIG. 16 depicts voltage pulses that occur at the select transistors in one embodiment of a two-sided GIDL erase. The voltage pulses occur in one embodiment of operation of the circuit of FIG. 13A. Voltage pulse 1602 is the voltage V_pxd at one terminal (e.g., drain) of the first select transistor 680. Voltage pulse 1604 is the voltage V_pxs at one terminal (e.g., drain) of the second select transistor 670. Note voltage pulses 1602 and 1604 have different start times. This may be due to the different impedances (or impedance mismatch) between the first pathway P1 906 and the second pathway P2 908. Note that both of these voltage pulses may result due to V_Pxa (as well as V_Pxb).

Voltage pulse 1612 is the voltage at the gate terminal of the first select transistor 680. Voltage pulse 1614 is the voltage the gate terminal of the second select transistor 670. Note voltage pulses 1612 and 1614 have different start times. The differences in these start times is due at least in part to differences in start times of voltages applied to the SGD select line and the SGS select line. For example, the differences in these start times is due at least in part to differences in start times of voltages applied to pathway P3 910 and pathway P4 912.

Voltage pulse 1622 (solid line) is the voltage Vgidl_d between the drain and gate terminals of the first select transistor 680. Voltage pulse 1624 (dotted line) is the voltage Vgidl_s between the drain and gate terminals of the second select transistor 670. Voltage pulses 1622 and 1624 are substantially symmetric. The steady state magnitudes of voltage pulses 1622 and 1624 are substantially the same. The start times of voltage pulses 1622 and 1624 occur at substantially the same time. The first ramp times of voltage pulses 1622 and 1624 are substantially the same.

In the example of FIG. 16, the first ramp times of voltage pulses 1602 and 1604 may be substantially the same, but it is not required that the first ramp times be substantially the same. In the event that the first ramp times are not substantially the same, an adjustment can be made to the first ramp time of voltage pulse 1612 and/or 1614 to compensate such that the voltage pulses 1622 and 1624 are substantially symmetric.

Note that graph of voltage pulses in FIG. 16 could occur at the select transistors during memory operations other than a two-sided GIDL erase. For example, these voltage pulses could occur during an erase that is not a GIDL erase. Also, the voltage pulses could occur during memory array operations such as program or read. Thus, the voltage pulses in FIG. 16 could occur at the select transistors in one embodiment of FIG. 13B.

FIG. 17 is a diagram of voltage pulses that are applied to various pathways in one embodiment of a two-sided GIDL erase. The diagram is used to illustrate a technique for timing the starting of the voltages on the SGS and SGD select lines, in one embodiment. Voltage pulse 1702 is applied to both the first pathway P1 906 and the second pathway P2 908. P2 circuitry 924 applies the voltage pulse 1702 to section 906 a (see FIG. 13A), in one embodiment. Therefore, the voltage pulse 1702 will travel along pathway 906 to select transistor 680, and also along pathway 908 to select transistor 670. As noted herein, pathway 906 and pathway 908 may have different impedances. Thus, there may be substantial differences between the voltages at the drain terminals of the select transistors 680, 670. For example, the voltages at the drain terminals of the select transistors 680, 670 may start at different times, as in voltage pulses 1602 and 1604 of FIG. 16.

Voltage pulse 1704 represents the voltage applied to the SGS select line. Voltage pulse 1704 is applied to pathway P4 912 by P4 circuitry 928, in one embodiment. Voltage pulse 1704 starts at time ta, which corresponds to the point at which voltage pulse 1702 reaches a magnitude of Vst_src.

Voltage pulse 1706 represents the voltage applied to the SGD select line. Voltage pulse 1706 is applied to pathway P3 910 by P3 circuitry 926, in one embodiment. Voltage pulse 1706 starts at time tb, which corresponds to the point at which voltage pulse 1702 reaches a magnitude of Vst_dr.

The technique for starting the voltage pulse 1704 may be used to control the timing of the voltage pulse output by P3 circuitry 926 of FIG. 14A. The technique for starting the voltage pulse 1706 may be used to control the timing of the voltage pulse output by P4 circuitry 928 of FIG. 14B.

The technique for starting the voltage pulses 1704 and 1706 that is shown in FIG. 17 may be used to result in voltage pulses 1612 and 1614 (see FIG. 16) at the control gate terminals of the select transistors 680, 670. Thus, the technique for starting the voltage pulses 1704 and 1706 that is shown in FIG. 17 may result in voltage pulses 1622 and 1624 being substantially symmetric.

FIG. 18 shows voltage pulses of one embodiment of a two-sided GIDL erase. Voltage pulses for voltages at the drain and gate terminals of the select transistors 680, 670 are depicted. Voltage pulse 1802 is the voltage at the drain terminal of the first select transistor 680. With reference to FIG. 9A, voltage pulse 1802 represents V_P1 b. Voltage pulse 1804 is the voltage at the gate terminal of the first select transistor 680. With reference to FIG. 9A, voltage pulse 1804 represents V_P3C. Voltage pulse 1806 is the voltage at the drain terminal of the second select transistor 670. With reference to FIG. 9A, voltage pulse 1806 represents V_P2 b. Voltage pulse 1808 is the voltage at the gate terminal of the second select transistor 670. With reference to FIG. 9A, voltage pulse 1808 represents V_P4 b.

Voltage pulse 1810 is a voltage at the control gates of the memory cells of the NAND string. In this embodiment, the voltage on the control gates of memory cells is raised to an erase inhibit voltage while other voltage pulses 1802-1818 are transient. At time t1, voltage pulses 1802 and 1810 begin to rise. At time t2, the voltage pulse 1810 at the control gates of the memory cells has reached the erase inhibit voltage. The erase inhibit voltage has a sufficiently high magnitude such that even if the NAND string channel has been charged up by the GIDL current, erase of the memory cells is inhibited. Note that even at lower memory cell control gate voltages erase may be inhibited. By time t3 all of voltage pulses 1802-1808 have reached their steady state values. At time t4 (after all of voltage pulses 1802-1808 have reached their steady state values), voltage pulse 1810 begins to fall to an “erase enable voltage.” The erase enable voltage has a sufficiently low magnitude such that if the NAND string channel has been charged up by the GIDL current, erase of the memory cells is enabled.

Therefore, the control gates of the memory cells are not reduced below the erase inhibit voltage until all of the voltage pulses 1802-1808 have reached their steady state values. Therefore, the memory cells will not begin to erase until the first transient period for all of the voltages (1802, 1804, 1806, 1808) is over. This eliminates possible negative effects that could occur during the first transient periods of voltages (1802, 1804, 1806, 1808). Therefore, this eliminates possible negative effects that could occur due to asymmetries between transient GIDL voltages and/or transient GIDL currents at each end of the NAND string.

FIG. 19 is a diagram of one embodiment of an apparatus 1900 that is configured to compensate for impedance differences between pathways. The apparatus 1900 includes an impedance compensation circuit 1940, P5 circuitry 1922, P6 circuitry 1924, P7 circuitry 1926, and P8 circuitry 1928. The apparatus 1900 also includes a number of pathways P5 1906, P6 1908, P7 1910, and P8 1912. In one embodiment, apparatus 1900 is part of memory system 100. The transistors 1970, 1980 reside in memory structure 126, in one embodiment. The transistors 1970, 1980 are select transistors on a NAND string, in one embodiment. For example, transistor 1980 could be a drain side select transistor (e.g., transistor 680), and transistor 1970 could be a source side select transistor (e.g., transistor 670). However, the transistors 1970, 1980 are not required to be select transistors on a NAND string. The transistors 1970, 1980 are not required to be part of a NAND string.

Pathway P5 1906 is connected to one terminal (e.g., source or drain terminal) of transistor 1980. Pathway P5 1906 has an impedance, which is represented by resistance (R_P5) and a capacitance (C_P5). Pathway P6 1908 is connected to one terminal (e.g., source or drain terminal) of transistor 1970. Pathway P6 1908 has an impedance, which is represented by resistance (R_P6) and a capacitance (C_P6).

Pathway P7 1910 is connected to one terminal (e.g., gate terminal) of transistor 1980. Pathway P7 1910 has an impedance, which is represented by resistance (R_P7) and a capacitance (C_P7). Pathway P8 1912 is connected to one terminal (e.g., gate terminal) of transistor 1970. Pathway P8 1912 has an impedance, which is represented by resistance (R_P8) and a capacitance (C_P8).

The impedances of one or more of pathway P5 1906, pathway P6 1908, pathway P7 1910, and/or pathway P8 1912 depends on the location of a block comprising memory cells that is selected to perform a memory operation, in some embodiments. As will be discussed more fully below, the length of a pathway may depend on the location of the selected block. In some embodiments, the impedance depends on the length of the path. Moreover, the block location dependence of the impedance can differ for the pathways. For example, pathway P5 1906 may be relatively long for selected block A, but relatively short for selected block B. In contrast, pathway P7 1906 (or pathway P6 1908) may be relatively short for selected block A, but relatively long for selected block B. A consequence of the foregoing is that the impedance mismatch between two pathways depends on the location of the selected block, in some embodiments. The impedance compensation circuit 1940 compensates for block location dependent impedance mismatch between pathways during memory operations on non-volatile memory cells, in some embodiments.

In some embodiments, the impedances of one or more of pathway P5 1906, pathway P6 1908, pathway P7 1910, and/or pathway P8 1912 depends on the temperature or change in temperature.

P5 circuitry 1922 is configured to apply a voltage pulse V_P5 a to one end of pathway P5 1906. P5 circuitry 1922 may comprise any electrical components that are capable of providing a voltage. The voltage is relative to some common point, such as ground. P5 circuitry 1922 includes one or more charge pumps, in one embodiment. Due to the impedance of pathway P5 1906, there may be an RC delay along the pathway P5 1906. Due to the impedance of pathway P5 1906, there may be a voltage drop along the pathway P5 1906. The voltage pulse is referred to as V_P5 b at the other end of the pathway P5 1906 to indicate the possible delay and/or change in magnitude.

P6 circuitry 1924 is configured to apply a voltage pulse V_P6 a to one end of pathway P6 1908. P6 circuitry 1924 may comprise any electrical components that are capable of providing a voltage. The voltage is relative to some common point, such as ground. P6 circuitry 1924 includes one or more charge pumps, in one embodiment. Due to the impedance of pathway P6 1908, there may be an RC delay along the pathway P6 1908. Due to the impedance of pathway P6 1908, there may be a voltage drop along the pathway P6 1908. The voltage pulse is referred to as V_P6 b at the other end of the pathway P6 1908 to indicate the possible RC delay and/or change in magnitude.

P7 circuitry 1926 is configured to apply a voltage pulse V_P7 a to one end of pathway P7 1910. P7 circuitry 1926 may comprise any electrical components that are capable of providing a voltage. The voltage is relative to some common point, such as ground. P7 circuitry 1926 includes one or more charge pumps, in one embodiment. Due to the impedance of pathway P7 1910, there may be an RC delay along the pathway P7 191. Due to the impedance of pathway P7 1910, there may be a voltage drop along the pathway P7 1910. The voltage pulse is referred to as V_P7 b at the other end of the pathway P7 1910 to indicate the possible RC delay and/or change in magnitude.

P8 circuitry 1928 is configured to apply a voltage pulse V_P6 a to one end of pathway P8 1912. P8 circuitry 1928 may comprise any electrical components that are capable of providing a voltage. The voltage is relative to some common point, such as ground. P8 circuitry 1928 includes one or more charge pumps, in one embodiment. Due to the impedance of pathway P8 1912, there may be an RC delay along the pathway P8 1912. Due to the impedance of pathway P8 1912, there may be a voltage drop along the pathway P8 1912. The voltage pulse is referred to as V_P8 b at the other end of the pathway P8 1912 to indicate the possible RC delay and/or change in magnitude.

Therefore, voltage V_P5 b is applied to one terminal (e.g., drain or source) of transistor 1980, with voltage V_P7 b is applied to another terminal (e.g., gate) of transistor 1980, in one embodiment. The difference V_P7 b-V_P5 b is referred to as V7_5. The voltage V_x appears at the other terminal (e.g., source or drain) of transistor 1980. In one embodiment, V_x is greater than V_P5 b. In one embodiment, V_x is less than V_P5 b.

Therefore, voltage V_P6 b is applied to one terminal (e.g., drain or source) of transistor 1970, with voltage V_P8 b is applied to another terminal (e.g., gate) of transistor 1970, in one embodiment. The difference V_P8 b-V_P6 b is referred to as V8_6. The voltage V_y appears at the other terminal (e.g., source or drain) of transistor 1970. In one embodiment, V_y has the same magnitude as V_x. However, V_y and V_x are not required to have the same magnitude. In one embodiment, V_y is greater than V_P6 b. In one embodiment, V_y is less than V_P7 b.

In one embodiment, transistors 1980, 1970 are select transistors for a group of memory cells, such as a NAND string. In one embodiment, pathway P5 1906 includes a bit line, and pathway P6 1908 includes a source line. The voltages V_x and V_y are the voltages that appear at the respective terminals of transistors 1980, 1970 as a result of voltages applied to pathway P5 1906, pathway P6 1908, pathway P7 1910, pathway P8 1912, and the control gates of memory cells in the group of memory cells, such as a NAND string, in one embodiment.

However, transistors 1980, 1970 are not required to be select transistors for a group (e.g., NAND string) of memory cells. In one embodiment, the voltages V_x and V_y are applied to the respective terminals of transistors 1980, 1970 by a control circuit. In one embodiment, a control circuit applies voltages V_x and V_y to drain terminals of transistors 1980, 1970. In one embodiment, a control circuit applies voltages V_x and V_y to source terminals of transistors 1980, 1970.

The impedance compensation circuit 1940 is configured to cause P5 circuitry 1922, P6 circuitry 1924, P7 circuitry 1926, and P8 circuitry 1928 to apply voltage pulses to the respective pathways P5 1906, P6 1908, P7 1910, and P8 1912. In one embodiment, the impedance of pathway P5 1906 is different from the impedance of pathway P6 1908, and the impedance compensation circuit 1940 causes P7 circuitry 1926 and P8 circuitry 1928 to apply voltage pulses to pathways P7 1910 and P8 1912 to compensate for the different impedance of pathways P5 1906 and P6 1908. In one embodiment, the impedance of pathway P7 1910 is different from the impedance of pathway P8 1912, and the impedance compensation circuit 1940 causes P5 circuitry 1922 and P6 circuitry 1924 to apply voltage pulses to pathways P5 1906 and P6 1908 to compensate for the different impedance of pathways P7 1910 and P8 1912.

In one embodiment, the impedance compensation circuit 1940 is configured to cause P5 circuitry 1922 to apply a first voltage pulse (e.g., V_P5 a) to pathway P5 1906; while causing P7 circuitry 1926 to apply a second voltage pulse (e.g., V_P7 a) to pathway P7 1910, while causing P6 circuitry 1924 to apply a third voltage pulse (e.g., V_P6 a) to pathway P6 1908, and while causing P8 circuitry 1928 to apply a fourth voltage pulse (e.g., V_8 a) to pathway P8 1912.

The second voltage pulse and fourth voltage pulses have voltage pulse attributes that compensate for different impedances of pathway P5 1906 and pathway P6 1908, in one embodiment. The second voltage pulse has a first value for a voltage pulse attribute, and the fourth voltage pulse has a second value for the voltage pulse attribute, in one embodiment. The first value and the second value are different to compensate for different impedances of the pathway P5 1906 and pathway P6 1908, in one embodiment.

The voltage pulse attribute is a steady state magnitude, in one embodiment. Thus, the second voltage pulse and fourth voltage pulse have different steady state magnitudes, in one embodiment. The voltage pulse attribute is a start time, in one embodiment. Thus, the second voltage pulse and fourth voltage pulse have different start times, in one embodiment. In one embodiment, the second voltage pulse and fourth voltage pulse have different start times and different steady state magnitudes.

The first voltage pulse and third voltage pulses have voltage pulse attributes that compensate for different impedances of pathway P7 1910 and pathway P8 1912, in one embodiment. The first voltage pulse has a first value for a voltage pulse attribute, and the third voltage pulse has a second value for the voltage pulse attribute, in one embodiment. The first value and the second value are different to compensate for different impedances of pathway P7 1910 and pathway P8 1912, in one embodiment.

The voltage pulse attribute is a steady state magnitude, in one embodiment. Thus, the first voltage pulse and third voltage pulses have different steady state magnitudes, in one embodiment. The voltage pulse attribute is a start time, in one embodiment. Thus, the first voltage pulse and third voltage pulses have different start times, in one embodiment. In one embodiment, the first voltage pulse and third voltage pulses have different start times and different steady state magnitudes.

The impedance compensation circuit 1940 can include hardware only or a combination of hardware and software (including firmware). For example, a controller programmed by firmware to perform the functions described herein is one example of an impedance compensation circuit 1940. An impedance compensation circuit 1940 can include a processor, PGA (Programmable Gate Array), FPGA (Field Programmable Gate Array), ASIC (Application Specific Integrated Circuit), integrated circuit or other type of circuit. The impedance compensation circuit 1940 may include state machine 112. P5 circuitry 1922, P6 circuitry 1924, P7 circuitry 1926, and P8 circuitry 1928 may be part of power control circuit 116, which may execute under control of the state machine 112.

FIG. 20 is a flowchart of one embodiment of a process 2000 of mitigating for impedance mismatch between pathways. Process 2000 is performed by impedance mismatch circuit 1940, in one embodiment. Process 2000 may be used to compensate for impedance mismatch between pathway P1 906 and pathway P2 908 in FIG. 9A, FIG. 9B, FIG. 13A, or FIG. 13B. That impedance mismatch can be temperature dependent. Process 2000 is used to compensate for impedance mismatch between pathway P3 910 and pathway P4 912 in FIG. 9A, FIG. 9B, FIG. 13A, or FIG. 13B. Process 2000 is used to compensate for impedance mismatch between pathway P5 1906 and pathway P6 1908 in FIG. 19, in one embodiment. Process 2000 is used to compensate for impedance mismatch between pathway P7 1910 and pathway P8 1912 in FIG. 19, in one embodiment.

Step 2002 includes applying voltages having substantially the same magnitude to first and second pathways. The first and second pathways have different impedances. The first pathway is connected to a first terminal of a first transistor (e.g., transistor 680 or 1980). The second pathway is connected to a first terminal of a second transistor (e.g., transistor 670 or 1970). In one embodiment, the first pathway is pathway P1 906, the second pathway is pathway P2 908, the third pathway (see step 2004) is pathway P3 910, and the fourth pathway (see step 2004) is pathway P4 912. In one embodiment, the first pathway is pathway P3 910, the second pathway is pathway P4 912, the third pathway (see step 2004) is pathway P1 906, and the fourth pathway (see step 2004) is pathway P2 908. In one embodiment, the first pathway is pathway P5 1906, the second pathway is pathway P6 1908, the third pathway (see step 2004) is pathway P7 1910, and the fourth pathway (see step 2004) is pathway P8 1912. In one embodiment, the first pathway is pathway P7 1910 and the second pathway is pathway P8 1912, the third pathway (see step 2004) is pathway P5 1906, and the fourth pathway (see step 2004) is pathway P6 1908. However, due to an impedance mismatch between the first and second pathways, the voltages have different magnitudes at the respective first terminals of the first transistor.

In one embodiment, the voltages are voltage pulses, in which case the steady state magnitudes of the voltages applied to the first and second pathways have substantially the same magnitude. With reference to FIG. 15B, voltage pulse 1512 is applied to both the first and second pathways, in one embodiment. As noted, due to an impedance mismatch between the first and second pathways, the voltages have different magnitudes at the respective first terminals of the first transistor and the second transistor. For example, with reference to FIG. 15A, voltage pulse 1502 is the voltage at the first terminal of the first select transistor (provided by the first pathway), and voltage pulse 1504 is the voltage at the first terminal of the second select transistor (provided by the second pathway).

Step 2004 includes applying voltages having different magnitudes to third and fourth pathways. The third pathway is connected to a second terminal of the first transistor (e.g., transistor 680 or 1980). The fourth pathway is connected to a second terminal of the second transistor (e.g., transistor 670 or 1970). The combination of voltages applied to the four pathways results in a first voltage between the first and second terminals of the first transistor, and second voltage between the first and second terminals of the second transistor. The first voltage and the second voltage have substantially the same magnitude, in one embodiment.

In one embodiment, with reference to FIG. 12A, voltage pulse 1202 a is applied to the third pathway, and voltage pulse 1204 a is applied to the fourth pathway. In one embodiment, with reference to FIG. 15B, voltage pulse 1516 is applied to the third pathway, and voltage pulse 1518 is applied to the fourth pathway.

The third and fourth pathways could have the same impedance, but this is not required. Regardless of whether or not the third and fourth pathways have the same impedance, the voltages that arrive at the respective second terminals of the first and second transistors have different magnitudes. The different magnitudes compensate for different magnitudes of voltages at the first terminals of the first and second transistors. For example, with reference to FIG. 15A, voltage pulse 1506 is the voltage at the second terminal of the first select transistor (provided by the third pathway), and voltage pulse 1508 is the voltage at the second terminal of the second select transistor (provided by the fourth pathway).

Applying voltages to the first, the second, the third, and the fourth pathways results in substantially the same magnitude voltage between the first and the second terminals of the first transistor and between the first and the second terminals of the second transistor. For example, with reference to FIG. 19, the voltage that is marked V7_5 has substantially the same magnitude as the voltage that is marked V8_6.

FIG. 21 is a flowchart of one embodiment of a process 2100 of mitigating for impedance mismatch between pathways. Process 2100 is performed by impedance mismatch circuit 1940, in one embodiment. Process 2100 may be used to compensate for impedance mismatch between pathway P1 906 and pathway P2 908 in FIG. 9A, FIG. 9B, FIG. 13A, or FIG. 13B. Process 2100 is used to compensate for impedance mismatch between pathway P3 910 and pathway P4 912 in FIG. 9A, FIG. 9B, FIG. 13A, or FIG. 13B. Process 2100 is used to compensate for impedance mismatch between pathway P5 1906 and pathway P6 1908 in FIG. 19, in one embodiment. Process 2100 is used to compensate for impedance mismatch between pathway P7 1910 and pathway P8 1912 in FIG. 19, in one embodiment. In some embodiments, the impedance mismatch can be temperature dependent.

Step 2102 includes applying substantially symmetric voltage pulses to first and second pathways that results in asymmetric voltage pulses at respective first terminals of first and second transistors. The first and second pathways have different impedances. The first pathway is connected to a first terminal of a first transistor (e.g., transistor 680 or 1980). The second pathway is connected to a first terminal of a second transistor (e.g., transistor 670 or 1970). In one embodiment, the first pathway is pathway P1 906, the second pathway is pathway P2 908, the third pathway (see step 2104) is pathway P3 910, and the fourth pathway (see step 2104) is pathway P4 912. In one embodiment, the first pathway is pathway P3 910, the second pathway is pathway P4 912, the third pathway (see step 2004) is pathway P1 906, and the fourth pathway (see step 2104) is pathway P2 908. In one embodiment, the first pathway is pathway P5 1906, the second pathway is pathway P6 1908, the third pathway (see step 2104) is pathway P7 1910, and the fourth pathway (see step 2004) is pathway P8 1912. In one embodiment, the first pathway is pathway P7 1910 and the second pathway is pathway P8 1912, the third pathway (see step 2104) is pathway P5 1906, and the fourth pathway (see step 2104) is pathway P6 1908. However, due to an impedance mismatch between the first and second pathways, the voltage pulses are asymmetric at the respective first terminals of the first transistor.

With reference to FIG. 15B, voltage pulse 1512 is applied to both the first and second pathways, in one embodiment. As noted, due to an impedance mismatch between the first and second pathways, the voltage pulses are asymmetric at the respective first terminals of the first transistor. For example, with reference to FIG. 15A, voltage pulse 1502 is the voltage at the first terminal of the first select transistor (provided by the first pathway), and voltage pulse 1504 is the voltage at the first terminal of the second select transistor (provided by the second pathway).

Step 2104 includes applying asymmetric voltage pulses to third and fourth pathways. The third pathway is connected to a second terminal of the first transistor (e.g., transistor 680 or 1980). The fourth pathway is connected to a second terminal of the second transistor (e.g., transistor 670 or 1970). In one embodiment, with reference to FIG. 12A, voltage pulse 1202 a is applied to the third pathway, and voltage pulse 1204 a is applied to the fourth pathway. In one embodiment, with reference to FIG. 15B, voltage pulse 1516 is applied to the third pathway, and voltage pulse 1518 is applied to the fourth pathway. In one embodiment, the asymmetry includes different steady state magnitudes. In one embodiment, the asymmetry includes different start times. In one embodiment, the asymmetry includes different start times and different steady state magnitudes.

In one embodiment, the voltage pulses in step 2104 do not have substantially the same steady state voltage magnitudes. In one embodiment, the difference in voltage magnitudes of the voltage pulses in step 2104 for at least one point in time during the first transient period of either of the two voltages is more than 3% of the larger steady state magnitude of the two voltages.

The third and fourth pathways could have the same impedance, but this is not required. Regardless of whether or not the third and fourth pathways have the same impedance, the voltage pulses that arrive at the respective second terminals of the first and second transistors are asymmetric, in one embodiment. For example, with reference to FIG. 15A, voltage pulse 1506 is the voltage at the second terminal of the first select transistor (provided by the third pathway), and voltage pulse 1508 is the voltage at the second terminal of the second select transistor (provided by the fourth pathway).

The asymmetry of the voltage pulses applied to the third and fourth pathways compensates for the asymmetry of voltage pulses at the first terminals of the first and second transistors. In one embodiment, the asymmetry compensates for different steady state magnitudes of the voltage pulses at the first terminals of the first and second transistors. In one embodiment, the asymmetry compensates for different start times of the voltage pulses at the first terminals of the first and second transistors. In one embodiment, the asymmetry compensates for different start times and different steady state magnitudes of the voltage pulses at the first terminals of the first and second transistors.

The combination of voltages applied to the four pathways results a voltage pulse between the first and second terminals of the first transistor, and voltage pulse between the first and second terminals of the second transistor, in one embodiment. For example, with reference to FIG. 19, the voltage V7_5 represents one voltage pulse and the voltage that is marked V8_6 represents another voltage pulse. These two voltage pulses have substantially the same steady state magnitude, in one embodiment. These two voltage pulses are substantially symmetric, in one embodiment.

In one embodiment, the combination of voltages applied to the four pathways may result a first voltage difference waveform between the first and second terminals of the first transistor, and second voltage difference waveform between the first and second terminals of the second transistor. The voltage difference waveforms could be voltage pulses, but are not required to be voltage pulses, as the term voltage pulse is defined herein. Each voltage difference waveform has a steady state magnitude, in one embodiment. The steady state magnitude refers to the magnitude when the voltage difference waveform is at a stable level. Although the voltage is relatively stable when at a steady state magnitude, there may be some small variations in the steady state magnitude due to, for example, noise or other non-ideal factors. The steady state magnitude of the voltage difference waveforms does not necessarily occur during the steady state periods of voltage pulses applied to the pathways. In one embodiment, the combination of voltages applied to the four pathways result in a first start time of the first voltage difference waveform and a second start time of the second voltage difference waveform occurring at substantially the same time.

FIG. 22 is a diagram of plane 2202 that contains blocks (BLK) of non-volatile memory cells. The diagram illustrates various drivers that provide voltages, as well as pathways that deliver the voltages to the blocks. In this example, there are “z+1” blocks. Because there may be a large number of blocks in a plane, not all blocks are depicted. There may be many blocks between BLK2 and BLKi, as indicated by the gap between those blocks. Likewise, there may be many blocks between BLKi+2 and BLKz−1, as indicated by the gap between those blocks.

There are “n+1” bit lines (BL0, BL1, . . . , BLn). There may be many bit lines between BL9 and BLn, as indicated by the gap between those bit lines. There is a sense amplifier (SA0, SA1, . . . SAn) connected to each bit line. For example, sense amplifier SA0 is connected to bit line BL0. The sense amplifiers are one embodiment of sense blocks 150 depicted in FIG. 1. Thus, the sense amplifiers may also be referred to as sense blocks. The sense amplifiers are able to provide voltages to the bit lines. Each of the bit lines is connected to multiple blocks of memory cells. In one embodiment, each bit line is connected to one string comprising non-volatile memory cells in each block. With reference to FIG. 4, the bit line 414 is connected to the SGD transistor of NAND string 484 through a bit line contact 521.

The portion of the bit line that is between the sense amplifier and a selected block may be referred to as a pathway. Thus, a single bit line may be considered to have multiple different pathways, which may have sections that overlap with each other. With reference to FIGS. 9A, 9B, pathway P1 906 represents a portion of a bit line between a sense amplifier and the selected block, in one embodiment. P1 circuitry 922 is implemented with a sense amplifier, in one embodiment. With reference to FIG. 19, pathway P5 1906 represents a portion of bit line between a sense amplifier and the selected block, and P5 circuitry 1922 is implemented with a sense amplifier, in one embodiment.

The impedance of the portion of the bit line that is between the sense amplifier and a selected block depends on the distance between the sense amplifier and the selected block, in some embodiments. Stated another way, the impedance of the portion of the bit line that is between the sense amplifier and a selected block depends on the location of the selected block, in some embodiments. For example, with reference to FIG. 9A, pathway P1 906 may have a different impedance depending on what block the NAND string 900 is in. Thus, the impedance of the pathway between the sense amplifier and the selected block depends on the block location, in some embodiments.

FIG. 22 also depicts a global drain side select line (SGDg) and a global source side select line (SGSg). The global drain side select line is connected to the SGD driver 752. The global source side select line is connected to the SGS driver 762. The global drain side select line provides voltages to local SGD through transfer transistors, in one embodiment. The global source side select line provides voltages to local SGS through transfer transistors, in one embodiment. An example of such transfer transistors is depicted in FIG. 6C. Note that the transfer transistors, the local SGG and the local SGS that are shown in FIG. 6C, are not depicted in FIG. 22. Note that the word line drivers that are shown in FIG. 6C are not depicted in FIG. 22. The local SGD and the local SGS are connected to strings comprising non-volatile memory cells and select transistors.

With reference again to FIG. 22, the impedance of the portion of the SGDg that is between the SGD driver 752 and a selected block depends on the distance between the SGD driver 752 and the selected block, in some embodiments. Stated another way, the impedance of the portion of the SGDg that is between the SGD driver 752 and a selected block depends on the location of the selected block, in some embodiments. Thus, the impedance of the pathway between the SGD driver 752 and the selected block depends on the block location, in some embodiments.

The impedance of the portion of the SGSg that is between the SGS driver 762 and a selected block depends on the distance between the SGS driver 762 and the selected block, in some embodiments. Stated another way, the impedance of the portion of the SGSg that is between the SGS driver 762 and a selected block depends on the location of the selected block, in some embodiments. Thus, the impedance of the pathway between the SGS driver 762 and the selected block depends on the block location, in some embodiments.

With reference to FIGS. 9A, 9B, pathway P3 910 represents a portion of SGDg and a portion of the local SGD, in one embodiment. P3 circuitry 926 is implemented with SGD driver 752, in one embodiment. With reference to FIGS. 9A, 9B, pathway P4 912 represents a portion of SGSg and a portion of the local SGS, in one embodiment. P4 circuitry 928 is implemented with SGS driver 762, in one embodiment.

With reference to FIG. 19, pathway P7 1910 represents a portion of SGDg and a portion of the local SGD, in one embodiment. P7 circuitry 1926 is implemented with SGD driver 752, in one embodiment. With reference to FIG. 19 pathway P8 1912 represents a portion of SGSd and a portion of the local SGS, in one embodiment. P8 circuitry 1928 is implemented with SGS driver 762, in one embodiment.

The impedance of different pathways may depend on block location in very different ways. As one example, the impedance of the pathway that provides the bit line voltages to the blocks may increase with the lower block numbers (e.g., increase with distance from the sense amplifiers). In contrast, the impedance of the pathway that provides the SGD driver voltage to the blocks may increase with the higher block numbers (e.g., increase with distance from the SGD driver 752). Thus, due at least in part to the different physical location of the voltage sources (e.g., sense amplifier, SGD driver, SGS driver), there may be a very different block location impedance dependence for different pathways.

Note that there may be an impedance mismatch between two pathways that provide voltages to a selected block during a memory operation. Moreover, the impedance mismatch may depend on the location of the selected block. This may be due to the aforementioned differences in the block location impedance dependences for different pathways. For example, when BLK0 is selected the pathway that provides the bit line voltage may be at its highest impedance, whereas the pathway that provides the SGD voltage may be near its lowest impedance. In contrast, when BLKz is selected the pathway that provides the bit line voltage may be at its lowest impedance, whereas the pathway that provides the SGD voltage may be at its highest impedance.

In some embodiments, one or more control circuits are configured to compensate for such location dependent impedance mismatches between pathways. For example, the timing of the voltages from the sense amplifiers and the SGD driver 752 can be controlled to mitigate block location dependent impedance mismatches. For example, a delay may be added to one of the voltages (relative to the other) to mitigate block location dependent impedance mismatches. The length of the delay depends on the location of the selected block, in some embodiments. As another example, the steady state magnitudes of voltages from the sense amplifiers and the SGD driver 752 can be controlled to mitigate block location dependent impedance mismatches.

The physical location of the sense amplifiers, SGD driver 752, and SGS driver 762 may vary depending on implementation. With reference to FIG. 3, the sense amplifiers, SGD driver 752, and SGS driver 762 are located in one of the peripheral regions 304, 305, in one embodiment. The sense amplifiers, SGD driver 752, and SGS driver 762 are located in the substrate 301 under the blocks (e.g., circuitry under array), in one embodiment. In one embodiment, a peripheral region (e.g., 304 and/or 305) and the substrate 301 under the blocks are used for the sense amplifiers, SGD driver 752, and SGS driver 762.

FIG. 23 is a diagram of a plane 2302 that contains blocks (BLK) of non-volatile memory cells. The diagram illustrates various drivers that provide voltages, as well as pathways that deliver the voltages to the blocks. The diagram is similar to the one of FIG. 22 in that it depicts z+1 blocks, n+1 bit lines, SGDg, SGSg, SGD driver 752, and SGS driver 762 from. However, the sense amplifiers are depicted in a different location in FIG. 23. Also, a source line (SL) driver 2306 is depicted in FIG. 23. The SGD driver 752, the SGS driver 762, the SL driver 2306, and the sense amplifiers are referred to as driver circuitry 2304. In one embodiment, driver circuitry 2304 resides in the substrate 301 under the plane 2202. This may be referred to herein as “circuitry under array.” Some, or all, of the driver circuitry 2304 could instead reside in a peripheral region (e.g., peripheral region 304, 306 in FIG. 3).

In the embodiment of FIG. 23, there is a line that connects each sense amplifier to a bit line. The connection points to the bit lines may be at different points along the bit line (with respect to block location). For example, line 2308 connects sense amplifier SA0 to bit line BL0, and line 2310 connects sense amplifier SAm to bit line BLm. The connection point for line 2308 is somewhere between blocks BLK2 and BLKi. The connection point for line 2310 is approximately at block BLKz−1. Note that the sense amplifiers may be located under the plane 2302. Thus, the lines 2308, 2310 may represent pathways each having a significant section that extends in the z-direction (see FIG. 3).

The SL driver 2306 is located as depicted by one of the source line drivers 362-368 in FIG. 3C, in one embodiment. FIG. 23 depicts a buried source line 511, and is connected to the source line driver 2306. The buried source line 511 extends under the entire plane 2302, in one embodiment. The buried source line 511 is one embodiment of Pathway P2 908 (see FIG. 9A, 9B). The buried source line 511 is one embodiment of Pathway P2 908 (see FIGS. 9A, 9B, 13A, 13B). In some embodiments, the impedance of the buried source line 511 does not significantly depend on the location of the selected block. In some embodiments, the impedance of the buried source line 511 does significantly depend on the location of the selected block.

FIG. 24 is a diagram to illustrate pathways to a selected block. The diagram depicts the plane 2302 and driver circuitry 2304 of FIG. 23 with some arrows added to illustrate portions of pathways to BLK0. For example, a pathway between sense amplifier SA0 and block BLK0 has a first portion 2308 between SA0 and bit line BL0 and a second portion 2312. A pathway between sense amplifier SAm and block BLK0 has a pathway first portion 2310 between SAm and bit line BL0 m and a second portion 2314. A pathway between SGD driver 752 and block BLK0 has a first portion 2416 and a second portion 2418 along SGDg. A pathway between SGS driver 762 and block BLK0 has a first portion 2420 between SGS driver 762 and SGSg and a second portion 2422 along SGSg.

FIG. 25 is a diagram to illustrate pathways to a selected block. The diagram depicts the plane 2302 and driver circuitry 2304 of FIG. 23 with some arrows added to illustrate portions of pathways to BLKz. For example, a pathway between sense amplifier SA0 and block BLKz has a first portion 2308 between SA0 and bit line BL0 and a second portion 2512. A pathway between sense amplifier SAm and block BLKz has a pathway first portion 2310 between SAm and bit line BL0 m and a second portion 2510 along bit line BLm. A pathway between SGD driver 752 and block BLKz has a first portion 2416 and a second portion 2518 along SGDg. A pathway between SGS driver 762 and block BLKz has a pathway first portion 2420 between SGS driver 762 and SGSg and a second portion 2522 along SGSg.

FIG. 26 is a graph depicting voltage versus time for signals that may be generated for the memory system in FIGS. 23-25. Four of the curves (2604-2610) show the voltage at the selected block for pathways that are driven by either sense amplifier SA0 or SAm. Curve 2602 is a reference curve that depicts the voltage versus time at the sense amplifier that provides the voltage that is delivered by the pathway. An example of when block BLK0 is the selected block and an example of when block BLKz is the selected block are considered.

Curve 2604 corresponds to the pathway from sense amplifier SAm to block BLKz. Specifically, curve 2604 depicts the voltage where the second portion 2510 of the pathway connects to block BLKz (see FIG. 25). Curve 2606 corresponds to the pathway from sense amplifier SA0 to block BLK0. Specifically, curve 2606 depicts the voltage where the second portion 2312 of the pathway connects to block BLK0 (see FIG. 24). Curve 2608 corresponds to the pathway from sense amplifier SA0 to block BLKz. Specifically, curve 2608 depicts the voltage where the second portion 2512 of the pathway connects to block BLKz (see FIG. 25). Curve 2610 corresponds to the pathway from sense amplifier SAm to block BLK0. Specifically, curve 2610 depicts the voltage where the second portion 2314 of the pathway connects to block BLKz (see FIG. 24).

Curves 2604, 2610 show that, for bit line BLm, there is a greater delay for the case when BLK0 is selected than when BLKz is selected. The impedance of the pathway may also attenuate the reference voltage. Hence, curve 2610 may have a lower steady state magnitude (for the bit line voltage VBL, at the selected block) than curve 2604. Curves 2606, 2608 show that, for BL0, there is a greater delay for the case when BLKz is selected than when BLK0 is selected. The impedance of the pathway may also attenuate the reference voltage. Hence, curve 2608 may have a lower steady state magnitude than curve 2606. However, there is not as much separation between curves 2606 and 2608, as there is between curves 2604 and 2610. The relationships may different from these examples depending on the locations of the sense amplifiers.

FIG. 26 also depicts voltage versus time for signals from the SGD driver 752 for FIGS. 23-25. Curve 2612 is a reference curve that depicts the voltage versus time at the SGD driver 752. The same two examples of when block BLK0 is the selected block and when block BLKz is the selected block are considered. Curve 2614 corresponds to the pathway from the SGD driver 752 to block BLK0. Specifically, curve 2614 depicts the voltage where the second portion 2418 of the pathway connects to block BLK0 (see FIG. 24). Curve 2616 corresponds to the pathway from the SGD driver 752 to block BLKz. Specifically, curve 2616 depicts the voltage where the second portion 2518 of the pathway connects to block BLKz (see FIG. 25). These curves 2614, 2616 show that there is a greater delay for the case when BLKz is selected than when BLK0 is selected, for SGDg. The impedance of the pathway may also attenuate the reference voltage. Hence, curve 2616 may have a lower steady state magnitude (for VSGD at the selected block) than curve 2614. The voltage versus time curves at selected blocks for signals from the SGS driver 762 may be similar to the curves 2614, 2616.

One aspect to highlight is that for pathways from the SGD driver 752, there is a greater delay for BLKz than for BLK0. In contrast, for the pathways from sense amplifier SAn, there is a greater delay for BLK0 than for BLKz. Hence, the way in which the pathway impedance depends on block location can be quite different for pathways from different drivers (which may be due to the different physical locations of the drivers).

A relationship between the bit line voltage and the SGS voltage during ramp time may be derived from the curves of FIG. 26. The term “Δv_BL_SG” will be used to refer to the difference in the voltage between the bit line and the SGD during the ramp time. This voltage is the drain to gate voltage of the drain side select transistor, in one embodiment. Recall that this voltage may play a part in creating a GIDL voltage at the select transistor. The value of Δv_BL_SG may get progressively smaller for the following cases: BLKz_BLm, BLKz_BL1, BLKz_BL0, BLK0_BL0, BLK1_BL1, BLK0_BLm. This order may be different if, for example, the sense amplifiers are located differently from the example in FIGS. 23-25. A consequence of the foregoing is the generation of GIDL voltage in the select transistor may depend on the location of the selected block.

FIG. 27 is a flowchart of an embodiment of a process 2700 of compensating for impedance mismatch. The process may be used for compensate for block location dependent impedance mismatches of two or more pathways to a block that is selected for a memory operation. Process 2700 will be discussed with reference to FIGS. 23-26, but is not limited thereto. For the purpose of illustration one pathway may be a pathway from sense amplifier SA0 to the selected block, and a second pathway may be from the SGD driver 752 to the selected block. Other pathways may also be considered. For example, the pathway from the SGS driver 762 to the selected block, as well as the pathway from the SL driver 2306 to the selected block, may be considered.

Step 2702 includes initiating a memory operation in a selected block comprising memory cells. In one embodiment, the memory operation is an erase. In one embodiment, the memory operation is a program. In one embodiment, the memory operation is a read. The memory operation is not required to be performed on all memory cells in the block. For example, the memory operation could be performed on memory cells connected to a selected word line in the selected block.

Step 2704 includes determining a relationship between a first signal and a second signal to compensate for an impedance mismatch. In one embodiment, the relationship is a delay of one of the signals relative to the other signal. The delay depends on the location of the selected block. FIGS. 28-30, to be discussed below, provide details of an embodiment for compensating for an impedance mismatch by controlling a delay of one of the signals relative to the other signal.

In one embodiment, the relationship is a first steady state magnitude of the first signal relative to a second steady state magnitude of the second signal. FIG. 31, to be discussed below, provide details of an embodiment for compensating for an impedance mismatch by controlling steady state magnitudes of signals.

In one embodiment, the relationship is a first ramp time of the first signal relative to a second ramp time of the second signal.

Step 2706 includes applying the first signal to a first driver connected to a first pathway to the selected block. Step 2708 includes applying the second signal to a second driver connected to a second pathway to the selected block.

In one embodiment, the first driver is a sense amplifier and the second driver is SGD driver 752. In one embodiment, the first driver is SL driver 762 and the second driver is SGS driver 762. In one embodiment, the first driver is a sense amplifier and the second driver is SL driver 762.

When process 2700 is repeated for other blocks, the amount of compensation (e.g., delays) depends on the location of the selected block, in some embodiments.

FIG. 28 is a graph depicting voltage versus time at selected blocks for several signals that may be generated for the memory system in FIGS. 23-25. The curves cover similar pathways discussed in the example of FIG. 26. However, in FIG. 28 no significant differences are depicted in steady state magnitudes. This is to focus on the differences in the start times of the signals at the respective blocks.

Thus, four of the curves (2804-2810) show the voltage at the selected block for pathways that are driven by either sense amplifier SA0 or SAm in FIGS. 23-25. As will the example of FIG. 26, an example of when block BLK0 is the selected block and an example of when block BLKz is the selected block are considered in FIG. 28. Curve 2804 corresponds to the pathway from sense amplifier SAm to block BLKz. Specifically, curve 2804 depicts the voltage where the second portion 2510 of the pathway connects to block BLKz (see FIG. 25). Curve 2806 corresponds to the pathway from sense amplifier SA0 to block BLK0. Specifically, curve 2806 depicts the voltage where the second portion 2312 of the pathway connects to block BLK0 (see FIG. 24). Curve 2808 corresponds to the pathway from sense amplifier SA0 to block BLKz. Specifically, curve 2808 depicts the voltage where the second portion 2512 of the pathway connects to block BLKz (see FIG. 25). Curve 2810 corresponds to the pathway from sense amplifier SAm to block BLK0. Specifically, curve 2810 depicts the voltage where the second portion 2314 of the pathway connects to block BLKz (see FIG. 24).

FIG. 28 also depicts voltage versus time at selected blocks for signals from the SGD driver 752 for FIGS. 23-25. The same two examples of when block BLK0 is the selected block and when block BLKz is the selected block are considered. Curve 2814 corresponds to the pathway from the SGD driver 752 to block BLK0. Specifically, curve 2814 depicts the voltage where the second portion 2418 of the pathway connects to block BLK0 (see FIG. 24). Curve 2816 corresponds to the pathway from the SGD driver 752 to block BLKz. Specifically, curve 2816 depicts the voltage where the second portion 2518 of the pathway connects to block BLKz (see FIG. 25).

In one embodiment, the signal at the sense amplifier and/or the SGD driver 752 is delayed to control the relative timing of the bit line voltage (at the selected block) and the drain side select line (at the selected block). For example, the relative timing of two voltages at the drain side select transistor associated with the bit line are controlled. These two voltages are the bit line voltage at one terminal of the drain side select transistor and the select line voltage at the gate terminal of the drain side select transistor. In FIG. 28, curve 2820 represents a target curve for the bit line voltage (at the select transistor in the selected block). Curve 2820 overlaps with curve 2810, in this example. Curve 2820 represent a target curve for the drain side select line voltage (at the select transistor in the selected block).

FIG. 28 depicts a parameter “BL_ON_COMP”, which is a delay factor. The length of the delay is different for each of the four cases (with no delay for curve 2810). For example, curve 2804, which corresponds to the pathway from sense amplifier SAm to block BLKz has the longest delay (due to the pathway have a relatively short delay). Thus, by starting the signal at SAm later (when the selected block is BLKz) by the delay factor given by BL_ON_COMP, the curve 2804 may approach or equal the target curve 2820. Similar reasoning applies to curves 2806 and 2808.

FIG. 28 depicts a parameter “SGD_ON_COMP”, which is a delay factor. The length of the delay is different for the two curves. For example, curve 2814, which corresponds to the pathway from SGD driver 752 to block BLK0 has the longer delay (due to the pathway have a relatively short delay). Thus, by starting the signal at SGD driver 752 later (when the selected block is BLK0) by the delay factor given by SGD_ON_COMP, the curve 2814 may approach or equal the target curve 2830. Similar reasoning applies to curve 2816.

FIG. 29 depicts further details of an embodiment of controlling the timing of the signals from the sense amplifiers and SGD driver 752. Such timing control may be used in process 2700. FIG. 29 shows a default signal for having a sense amplifier begin to deliver the bit line voltage. The parameter BL_ON_COMP may be used to delay the start of the bit line voltage by a certain number of clock periods (see CLK). FIG. 29 shows a default signal for having an SGD driver 752 begin to deliver the drain side select line voltage. The parameter SGD_ON_COMP may be used to delay the start of the drain side select line voltage by a certain number of clock periods (see CLK).

FIG. 30 is a table showing one embodiment of compensation parameters. The blocks are divided into eight zones in this example. There could be more or fewer zones. The zones are based on the physical locations of the blocks. There could be the same number of blocks in each zone, but that is not required. One column is for BL0, one column is for BLn, and one column is for SGD. There could be more columns for other bit lines. Some bit lines can use the same parameters. Thus, it is not necessary to have a column for each bit line. Each of the compensation parameters may be a number of clock cycles (including zero) to delay the onset of the signal (see, for example, FIG. 29). It is possible that two zones have the same parameter for a signal (e.g., the same parameter could be used for two entries in a column).

The principles depicted in FIGS. 28-30 may be applied to signal parameters other than a delay (or start time) of a signal. In one embodiment, the steady state magnitude of a signal is controlled in order to control the relative steady state magnitudes of two signals. For example, referring again to FIG. 26, a compensation can be made at the sense amplifiers (depending on the selected block) such that that steady state bit line voltages are all the same. Likewise, a compensation can be made at the SGD driver 752 (depending on the selected block) such that that steady state SGD voltages are all the same. FIG. 31 is a table of an embodiment that controls the steady state magnitudes of the bit line voltage from a sense amplifier and the SGD voltage from the SGD driver 752. FIG. 31 shows eight zones for the blocks. There could be more or fewer zones. One column is for BL0, one column is for BLn, and one column is for SGD. There could be more columns for other bit lines. Some bit lines can use the same parameters. Thus, it is not necessary to have a column for each bit line.

Other parameters such as ramp rate can be controlled to mitigate impedance mismatch between two sets of pathways. The principles depicted in FIGS. 28-31 may be applied to other drivers. In an embodiment, the timing of the SGS driver 762 may be controlled in a similar manner as the timing of the SGD driver 752. The SGS driver 762 may have the same delay factors for each block as the SGD driver 752, or different delay factors may be used.

Note that in order to mitigate impedance mismatch between two sets of pathways it is not required that there be a mitigation factor for each set of pathways. For example, with reference to FIG. 28 instead of having two mitigation factors (e.g., BL_ON_COMP, SGD_ON_CMP), in one embodiment, only one of the two factors is used. To help illustrate, an example of mitigating for different steady state voltages on the bit line and SGD (see FIG. 26) will be discussed. First, an example of two mitigation factors will be reviewed. One mitigation factor is to control the steady state magnitude at the sense amplifier such that VBL at the select transistor is at a target level. Another mitigation factor is to control the steady state magnitude at the SGD driver 752 such that VSGD at the gate of the select transistor is at a target level. Next, an example of using one mitigation factor will be discussed. The bit line voltage may be allowed to vary depending on location of the selected block. In other words, there is not a mitigation factor applied at the sense amplifier. The voltage at the SGD driver 752 is controlled such that the voltage between two terminals of the drain side select transistor is the same for all blocks, in one embodiment. Thus, when determining the mitigation factor for the SGD driver 752 not only is the impedance of the pathway from the SGD driver 752 to the selected block considered, but the impedance of the pathway from the sense amplifier to the selected block is also considered. Thus, one mitigation factor may be used to compensate for impedance mismatch between two pathways.

In some embodiments, impedance mismatch between more than two pathways are mitigated. In one embodiment, a target is to have the voltage across two terminals of a drain side select transistor be substantially the same as the voltage across two terminals of a source side select transistor. For example, with reference to FIG. 9A a target is to have Vgidl_d substantially the same as Vgidl_s. With reference to FIG. 9B a target is to have Vg_bl substantially the same as Vg_sl.

With reference to FIG. 9A, in one embodiment, the voltage V_P1 b (at transistor 680) depends significantly on the location of the selected block. Stated another way, the voltage V_P1 b depends significantly on the impedance between the sense amplifier and transistor 680. With reference to FIG. 9A, in one embodiment, the voltage V_P3 b (at transistor 680) depends significantly on the location of the selected block. Stated another way, the voltage V_P3 b depends significantly on the impedance between the SGD driver 752 and transistor 680. With reference to FIG. 9A, in one embodiment, the voltage V_P4 b (at transistor 670) depends significantly on the location of the selected block. Stated another way, the voltage V_P4 b depends significantly on the impedance between the SGS driver 762 and transistor 670. With reference to FIG. 9A, in one embodiment, the voltage V_P2 b (at transistor 670) does not depend to a significant extent on the location of the selected block. However, it is possible that the voltage V_P2 b (at transistor 670) could depend greatly on the location of the selected block.

In one embodiment, rather than attempting to control the bit line voltage and/or the source line voltage to achieve the aforementioned matching of the voltages across the respective two terminals of the select transistors, the voltages at the SGD driver 752 and the SGS driver 762 are controlled. For example, with reference to FIG. 19, P7 circuitry 1926 comprises the SGD driver 752, P8 circuitry 1928 comprises the SGS driver 762, P5 circuitry 1922 comprises a sense amplifier, and P6 circuitry 1924 comprises the SL driver 2306, in one embodiment. The various pathways P5 1906, P6 1908, P7 1910, and P8 112 are implemented by the various pathways in FIGS. 23-25, in one embodiment. As discussed, the impedance of such pathways may depend on the location of the selected block.

In one embodiment, there is an impedance mismatch between pathway P5 1906 and P6 1908. Moreover, the impedance mismatch depends on the location of the selected block, in some embodiments. As discussed, the impedance of pathways from the sense amplifiers to the selected block depends on the location of the selected block. Hence, whether or not the impedance of pathways from the SL driver 2306 to the selected block depends on the location of the selected block, there is impedance mismatch between pathway P5 1906 and P6 1908 that depends on the location of the selected block. As has been discussed with respect to FIG. 19, techniques are disclosed herein to control the signals at P7 circuitry 1926 (which may comprise the SGD driver 752) and P8 circuitry 1928 (which may comprise the SGS driver 762) to compensate for the block location dependent impedance mismatch between pathway P5 1906 and P6 1908.

Although numerous examples have been presented herein for mitigating block location dependent impedance mismatches, the location is not limited to being a block comprising memory cells. For example, techniques described herein could be used to mitigate location dependent impedance mismatches between pathways to groups of memory cells (where the cells are not necessarily organized in blocks). In this example, the impedance of the pathways may depend on the location of the respective memory cells that are selected for a memory operation.

Technology is described herein to compensate for impedance mismatches between different pathways. One technique to compensate for impedance mismatches between pathways includes accounting for temperature dependence of impedances of the pathways.

In one embodiment, the bit line is made of copper, the word lines are made of tungsten, the select lines (e.g., SGD and SGS) are made of tungsten, and the source line is made of tungsten. In other embodiments, other materials can be used. For example, in some embodiments, the source line is made of polysilicon. It has been observed that the resistance of the copper bit lines increases by approximately 30% in response to a change in temperature from −40 degrees Celsius to 125 degrees Celsius. It has also been observed that the resistance of the tungsten word lines and select lines increase by approximately 15% in response to a change in temperature from −40 degrees Celsius to 125 degrees Celsius. In some implementations, the source line has been observed to increase resistance by approximately 15% in response to a change in temperature from −40 degrees Celsius to 125 degrees Celsius. In other implementations, the source line is shunted; therefore, the resistance of the source line changes very little (close to zero change) or does not change in response to a change in temperature from −40 degrees Celsius to 125 degrees Celsius.

The temperature dependence of resistance results in a temperature dependence of RC delays. For example, the RC delay of the bit lines increase by approximately 30% in response to a change in temperature from −40 degrees Celsius to 125 degrees Celsius. The RC delay of the word lines and select lines increase by approximately 15% in response to a change in temperature from −40 degrees Celsius to 125 degrees Celsius. In some embodiments, the RC delay of the source lines increase by approximately 15% in response to a change in temperature from −40 degrees Celsius to 125 degrees Celsius and in other embodiments the RC delay of the source lines does not increase (or increases by a very small amount) in response to the increase in temperature.

As the temperature changes, different signal lines (and, therefore, different pathways) may experience a different change in resistance causing a different change in RC delays. For example, in one embodiment, as the temperature increases, the RC delays in the bit line increase at least twice as fast as the RC delays in the source line. Looking back at FIG. 9, this means that pathway P1 906 will experience change in impedance per change in temperature at a different rate than pathway P2 908. In other words, as the temperature changes, the change in RC delay of pathway P1 906 will be different (e.g., greater) than the change in RC delay of pathway P2 908. The technology proposed herein will account for the different change in resistance and RC delay in response to change in temperature.

The bit line will also change impedance (and RC delay) in response to change in temperature differently than the select lines and word lines. Therefore, some embodiments include compensating for the temperature dependent mismatch of impedance between bit lines and select lines or word lines. Some embodiments compensate for the temperature dependent mismatch of impedance between other pathways.

In some embodiments, the select lines (e.g., SGD and SGS) will experience different changes in impedance in response to changes in temperature. For example, SGD may experience a different change in impedance (and RC delay) in response to change in temperature than SGS. Therefore, some embodiments include compensating for the temperature dependent mismatch of impedance between different select lines. Other signal lines and pathways may also experience different temperature dependent changes in impedance that may be compensated for.

In one embodiment, capacitance does not significantly change in response to change in temperature. However, the different temperature dependent changes in resistance of the different pathways will result in result in differences in RC delays of the different pathways and, therefore, differences in ramp time of voltage pulses communicated in the different pathways. In one example, at cold temperatures bit line resistance will drop by a greater amount than the resistance of the source line. As a result, at cold temperatures the RC delays will drop more (percentage wise) for a bit line as compared to the source line. It is proposed to compensate for the more significant decrease in bit line RC delay versus the decrease in source line delay. This concept is illustrated in FIG. 32, which is a graph of voltage versus time for the beginning of voltage pulses (or other electrical signals) applied to the bit line and source line at two different temperatures. Curve 3200 represents the beginning of voltage pulses (or other electrical signal) transmitted on the bit line and the source line at a high temperature. That is, at the high temperature, the voltage curve for the bit line is the same as the voltage curve for the source line because the RC delay of the bit line is the same as the RC delay of the source line and any temperature independent impedance mismatches (described above) have been compensated for.

When the temperature decreases, the RC delay of the bit line will decrease and the RC delay of the source line will decrease; however, the RC delay of the bit line will decrease more than the RC delay of the source line will decrease. This is depicted in FIG. 32 as curve 3204 represents the beginning of a voltage pulse (or other electrical signal) transmitted on the bit line at a low temperature (e.g., −40 degrees Celsius) and curve 3202 represents the beginning of a voltage pulse (or other electrical signal) transmitted on the source line at the same low temperature (e.g., −40 degrees Celsius). Note that a decrease in RC delay results in the voltage reaching steady state voltage faster. As can be seen from FIG. 32, curve 3204 reaches steady state voltage 3210 faster than curve 3206 reaches steady state voltage 3210 because the bit line has a lower RC delay than the source line at the low temperature. It is proposed to compensate for this mismatch in impedance (e.g., mismatch in RC delay) by adjusting the impedance of either the pathway that includes the bit line or the pathway that includes the source line. For example, arrow 3206 represents one embodiment of compensating for this mismatch in impedance (e.g., mismatch in RC delay) by adjusting the impedance of the pathway that includes the bit line such that curve 3204 becomes the same as curve 3202. In other embodiments, the compensation can be made to the source line such that curve 3202 becomes the same as curve 3204. In other embodiments, the compensation can be made to both the source line and the bit line such that both curves 3202 and 3204 change. The same principles can be applied to other pathways.

FIG. 33 is a flow chart describing one embodiment of a process for compensating based on temperature for a temperature dependent impedance mismatch between a first pathway and a second pathway during a memory operation on the plurality of non-volatile memory cells. The temperature dependent impedance mismatch between the first pathway and the second pathway can be a mismatch of resistance, capacitance and/or RC delay. In the embodiment illustrated in FIG. 33, the memory operation is an erase operation; however, the process can also be used with other operations (e.g., programming/writing or reading) by changing step 3310. In one embodiment, the process of FIG. 33 is performed by a control circuit (defined above) connected to the first pathway and the second pathway, where the first pathway and the second pathway are connected to a plurality of non-volatile memory cells.

Step 3302 of FIG. 33 includes sensing a temperature. The temperature can be sensed on the memory chip (e.g., temperature sensor 117), in the controller (e.g., temperature sensor 242), in the memory system (e.g., temperature sensor 244) or outside the memory system (and provided to the memory system by the host or other entity). The sensed temperature can be an absolute temperature or a relative temperature. The sensed temperature need not be in Fahrenheit or Celsius, but can be a signal indicative of relative temperature or relative change in temperature.

Step 3304 of FIG. 33 includes compensating based on temperature for a temperature dependent impedance mismatch between the first pathway and the second pathway. In one example, step 3304 includes compensating for a mismatch of RC delays, a mismatch of resistance and/or a mismatch of capacitance. In various embodiments, the control circuit is configured to compensate based on temperature for the temperature dependent impedance mismatch between the first pathway and the second pathway by adjusting impedance of the first pathway based on temperature, adjusting impedance of the second pathway based on temperature, delaying a start time of a voltage pulse (or other electrical signal) applied to the first pathway based on temperature, delaying a start time of a voltage pulse (or other electrical signal) applied to the second pathway based on temperature, changing a steady state magnitude of a voltage pulse applied to the first pathway based on temperature, changing a steady state magnitude of a voltage pulse applied to the second pathway based on temperature, changing a ramp time of a voltage pulse applied to the first pathway based on temperature, changing a ramp time of a voltage pulse applied to the second pathway based on temperature, adjusting resistance of the first pathway based on temperature, adjusting resistance of the second pathway based on temperature, adjusting capacitance of the first pathway based on temperature, and/or adjusting capacitance of the second pathway based on temperature. Note that adjusting a parameter based on temperature includes adjusting the parameter based on change in temperature.

Step 3306 includes compensating for an impedance mismatch between the first pathway and the second pathway based on distance to one or more voltage sources (e.g., a location dependent impedance mismatch), as discussed above. In various embodiments, the control circuit is configured to compensate for the impedance mismatch between the first pathway and the second pathway based on distance to one or more voltage sources (e.g., mismatch based on location of the memory cells) by adjusting impedance of the first pathway based on location of the memory cells, adjusting impedance of the second pathway based on location of the memory cells, delaying a start time of a voltage pulse (or other electrical signal) applied to the first pathway based on location of the memory cells, delaying a start time of a voltage pulse (or other electrical signal) applied to the second pathway based on location of the memory cells, changing a steady state magnitude of a voltage pulse applied to the first pathway based on location of the memory cells, changing a steady state magnitude of a voltage pulse applied to the second pathway based on location of the memory cells, changing a ramp time of a voltage pulse applied to the first pathway based on location of the memory cells, changing a ramp time of a voltage pulse applied to the second pathway based on location of the memory cells, adjusting resistance of the first pathway based on location of the memory cells, adjusting resistance of the second pathway based on location of the memory cells, adjusting capacitance of the first pathway based on location of the memory cells, and/or adjusting capacitance of the second pathway based on location of the memory cells. One set of embodiments of performing step 3306 is discussed above with respect to FIGS. 22-31.

Step 3308 includes compensating for a temperature independent impedance mismatch between the first pathway and the second pathway. In one embodiment, a temperature independent impedance mismatch is a difference between impedances that is not dependent on temperature. For example, if two pathways have different components with different resistances and/or different capacitances, then there exists a temperature independent impedance mismatch between the two pathways. In various embodiments, the control circuit is configured to compensate for a temperature independent impedance mismatch between the first pathway and the second pathway by adjusting impedance of the first pathway, adjusting impedance of the second pathway, delaying a start time of a voltage pulse (or other electrical signal) applied to the first pathway, delaying a start time of a voltage pulse (or other electrical signal) applied to the second pathway, changing a steady state magnitude of a voltage pulse applied to the first pathway, changing a steady state magnitude of a voltage pulse applied to the second pathway, changing a ramp time of a voltage pulse applied to the first pathway, changing a ramp time of a voltage pulse applied to the second pathway, adjusting resistance of the first pathway, adjusting resistance of the second pathway, adjusting capacitance of the first pathway, and/or adjusting capacitance of the second pathway. One set of embodiments of performing step 3306 is discussed above with respect to FIGS. 9A-21.

Step 3310 includes erasing the plurality of non-volatile memory cells. Other memory operations can be performed instead of or in addition to an erase operation. In one embodiment, the control circuit is configured to erase the plurality of non-volatile memory cells by applying voltage pulses to the bit line, the source line, the first select line and the second select line to cause a first GIDL current from the first select transistor into the data memory cells and a second GIDL current from the second select transistor into the data memory cells, such that the first GIDL current and the second GIDL current cause the data memory cells to change threshold voltages, as described in more detail above. In one example implementation, the control circuit is configured to compensate based on temperature for the temperature dependent impedance mismatch between the first pathway and the second pathway by adjusting at least one of the first GIDL current and the second GIDL current based a temperature sensed by the temperature sensor. Since the memory operation is an erase operation, the control circuit is configured to compensate based on temperature for the temperature dependent impedance mismatch between the first pathway and the second pathway when providing voltage pulses to the plurality of non-volatile memory cells for the erase operation.

FIG. 34 is a diagram of a NAND string (or other set of connected non-volatile memory cells) and pathways that may provide voltages to select transistors of the NAND string. FIG. 34 provides an example of compensating based on temperature for a temperature dependent impedance mismatch between a first pathway and a second pathway during a memory operation on a plurality of non-volatile memory cells. In one embodiment, the structure of FIG. 34 performs the process of FIG. 33.

The NAND string of FIG. 34 includes a first select transistor 3401 at one end of the NAND string and a second select transistor 3402 at the other end of the NAND string. The first select transistor 3401 may be referred to as a drain side select transistor, and is analogous to select transistor 680 of FIG. 9A. The second select transistor 3402 may be referred to as a source side select transistor, and is analogous to select transistor 670 of FIG. 9A. There are a number of data memory cells 3400 connected between the two select transistors (also referred to as select gates). The control gates of data memory cells are connected to various data word lines (e.g., WL0-WLn). In one embodiment, the NAND string of FIG. 34 is implemented as the NAND string depicted in FIGS. 4, 6A, and 6B. However, the NAND string of FIG. 34 is not limited to the NAND string depicted in FIGS. 4, 6A, and 6B.

FIG. 34 depicts four examples of pathways P1 3406, P2 3408, P3 3410, and P4 3412. Pathway P1 3406 is connected to one terminal (e.g., drain terminal) of the first select transistor 3401. Pathway P1 3406 resides along a bit line, in one embodiment. Pathway P1 3406 may include other elements such as switches (e.g., transistors). Pathway P1 3406 may also be referred to as an electrically conductive pathway. Pathway P1 3406 has an impedance, which is represented by resistance (R_P1) and a capacitance (C_P1). Resistance (R_P1) and capacitance (C_P1) include a bit line resistance and a bit line capacitance, in one embodiment. Resistance (R_P1) and a capacitance (C_P1) may include resistances and/or capacitances of other components along the pathway P1. P1 circuitry 922 (a voltage source) is configured to apply a voltage pulse to one end of pathway P1 3406. Due to the impedance of pathway P1 3406, there may be an RC delay along the pathway P1 3406. Due to the impedance of pathway P1 3406, there may be a voltage drop along the pathway P1 3406.

Pathway P2 3408 is connected to one terminal (e.g., drain terminal) of the second select transistor 3402. Pathway P2 3408 resides along a source line. Pathway P2 3408 may include other elements such as switches (e.g., transistors). Pathway P2 3408 may also be referred to as an electrically conductive pathway. Pathway P2 3408 has an impedance, which is represented by resistance (R_P2) and a capacitance (C_P2). Resistance (R_P2) and capacitance (C_P2) include a source line resistance and a source line capacitance, in one embodiment. Resistance (R_P2) and a capacitance (C_P2) may include resistances and/or capacitances of other components along the pathway P2. P2 circuitry 924 is configured to apply a voltage pulse to pathway P2 3408. Due to the impedance of pathway P2 3408, there may be an RC delay along the pathway P2 3408. Due to the impedance of pathway P2 3408, there may be a voltage drop along the pathway P2 3408.

Pathway P3 3410 is connected to one terminal (e.g., gate terminal) of the first select transistor 3401. Pathway P3 3410 resides along a select line. The select line is referred to as a drain side select line. The select line includes a global drain side select line (in one embodiment). Pathway P3 3410 may include other elements such as switches (e.g., transistors). Pathway P3 3410 may also be referred to as an electrically conductive pathway. Pathway P3 3410 has an impedance, which is represented by resistance (R_P3) and a capacitance (C_P3). Resistance (R_P3) and capacitance (C_P3) include a select line resistance and a select line capacitance, in one embodiment. Resistance (R_P3) and a capacitance (C_P3) may include resistances and/or capacitances of other components along the pathway P3 3410. P3 circuitry 926 (a voltage source) is configured to apply a voltage pulse V to pathway P3 3410. Due to the impedance of pathway P3 3410, there may be an RC delay along the pathway P3 3410. Due to the impedance of pathway P3 3410, there may be a voltage drop along the pathway P3 3410.

Pathway P4 3412 is connected to one terminal (e.g., gate terminal) of the second select transistor 3402. Pathway P4 3412 resides along a select line. The select line is referred to as a source side select line. The select line includes a global source side select line (in one embodiment). Pathway P4 3412 may include other elements such as switches (e.g., transistors). Pathway P4 3412 may also be referred to as an electrically conductive pathway. Pathway P4 3412 has an impedance, which is represented by resistance (R_P4) and a capacitance (C_P4). Resistance (R_P4) and capacitance (C_P4) include a select line resistance and a select line capacitance, in one embodiment. Resistance (R_P4) and a capacitance (C_P4) may include resistances and/or capacitances of other components along the pathway P4 3412. P4 circuitry 928 (a voltage source) is configured to apply a voltage pulse to pathway P4 3412. Due to the impedance of pathway P4 3412, there may be an RC delay along the pathway P4 3412. Due to the impedance of pathway P4 3412, there may be a voltage drop along the pathway P4 3412.

As discussed above with respect to FIG. 9A, the voltages applied to transistors 3401 and 3402 cause GIDL voltages and GIDL currents in order to perform an erase operation.

In one embodiment and as discussed above, voltage pulses that are applied to pathways at each end of the NAND string are configured to compensate for different impedances of the pathways at each end of the NAND string. For example, the voltage pulses applied to pathway P1 3406 and pathway P2 3408 may be configured to compensate for different impedances of the pathway P1 3406 and pathway P2 3408. As another example, the voltage pulses applied to pathway P3 3410 and pathway P4 3412 may be configured to compensate for different impedances of the pathway P3 3410 and pathway P4 3412. In one embodiment, the voltage pulses applied to pathway P3 3410 and pathway P4 3412 are configured to compensate for different impedances of the pathway P1 3406 and pathway P2 3408.

As discussed above, one or more attributes of voltage pulses that are applied to pathways at each end of the NAND string is configured such that a first erase voltage at the first select transistor 3401 is substantially symmetric with a second erase voltage at the second select transistor 3402 Achieving substantially symmetric erase voltages may include setting one or more attributes of the voltage pulses to compensate for different impedances of pathways at each end of the NAND string.

Additionally, as discussed above, in some embodiments the impedances of one or more of pathway P1 3406, pathway P2 3408, pathway P3 3410, and/or pathway P4 3412 depends on the location of a block comprising memory cells 3400 that is selected to perform a memory operation. The length of a pathway may depend on the location of the selected block with respect to the voltage sources. In some embodiments, the impedance depends on the length of the path. Moreover, the block location dependence of the impedance can differ for the different pathways.

FIG. 34 also depicts control circuit 3470, which is an electrical circuit that can include state machine 112, controller 122, a microprocessor, a microcontroller, control circuitry 110, read/write circuits 128, decoders and/or any of the other embodiments of the control circuit described above. Control circuit 3470 is connected to P1 circuitry 922, P2 circuitry 924, P3 circuitry 926, and P4 circuitry 928. Control circuit 3470 compensates for different impedances of the pathways in step 3308 of FIG. 33, in the manner discussed above with respect to FIGS. 9A-21. For example, control circuit 3470 controls P1 circuitry 922, P2 circuitry 924, P3 circuitry 926, and P4 circuitry 928 in order to set one or more attributes of the voltage pulses (or other electrical signal), such as start time, steady state voltage and ramp time to compensates for different impedances of the pathways.

Control circuit 3470 also compensates for location dependent impedance mismatch between pathways during memory operations on data non-volatile memory cells 3400 in step 3306 of FIG. 33, in the manner discussed above with respect to FIGS. 22-31. For example, control circuit 3470 controls P1 circuitry 922, P2 circuitry 924, P3 circuitry 926, and P4 circuitry 928 in order to set one or more attributes of the voltage pulses (or other electrical signal), such as start time (including delays to the start time), steady state voltage and ramp time to compensate for location dependent impedance mismatches between pathways during memory operations.

The circuit of FIG. 34 also includes a temperature sensor circuit 3490 connected to control circuit 3470. In one embodiment, temperature sensor circuit 3490 can be any of temperature sensor 117, temperature sensor 242, temperature sensor 244, or a different temperature sensor. Temperature sensor circuit 3490 is configured to sense a current temperature and communicate that temperature to control circuit 3470 and (in some embodiments) other components in the memory system. Control circuit 3470 compensates, based on the current temperature sensed by temperature sensor circuit 3490, for temperature dependent impedance mismatches between pathways during memory operations on the non-volatile memory cells 3400 in step 3304 of FIG. 33. For example, control circuit 3470 controls P1 circuitry 922, P2 circuitry 924, P3 circuitry 926, and P4 circuitry 928 in order to set one or more attributes of the voltage pulses (or other electrical signal), such as start time (including delays to the start time), steady state voltage and ramp time to compensates for temperature dependent impedance mismatch between pathways during memory operations.

The circuit of FIG. 34 also includes means for changing the impedance of each of the pathways. For example, pathway P1 3406 includes temperature compensation circuit (TCC) 3430 and a transfer transistor 3432 for connecting TCC 3430 to the bit line (BL). Transfer transistor 3432 has three terminals. One terminal is connected to TCC 3430. A second terminal is connected to the bit line. The third terminal (i.e., the gate) is connected to TCC 3434, which receives a voltage from voltage source 3436 (thus, the third terminal of transfer transistor 3432 is indirectly connected to voltage source 3436). TCC 3430 receives the voltage (e.g., the voltage pulse) from P1 circuitry 922. TCC 3430 is configured to add any of multiple additional impedances to the pathway P1 3406 depending on a temperature sensed by the temperature sensor circuit 3490. TCC 3434 is configured to add any of multiple additional impedances to the pathway from voltage source 3436 to the gate of transfer transistor 3432 depending on a temperature sensed by the temperature sensor circuit 3490. Control circuit 3470 is connected to TCC 3430, TCC 3434, voltage source 922 and voltage source 3436. In one embodiment, control circuit 3470 is configured to adjust the first GIDL current by instructing TCC 3430 to add zero, one or more of the multiple additional impedances between the voltage source 922 and the bit line BL based on the temperature sensed by the temperature sensor circuit 3490 and/or change the timing/slope/magnitude of the voltage applied to the bit line by instructing TCC 3434 to add zero, one or more of the multiple additional impedances based on the temperature sensed by the temperature sensor circuit 3490.

Pathway P2 3408 includes TCC 3440 and a transfer transistor 3442 for connecting TCC 3440 to the source line (SL). TCC 3440 receives the voltage (e.g., the voltage pulse) from P2 circuitry 924. Transfer transistor 3442 has three terminals. One terminal is connected to TCC 3440. A second terminal is connected to the source line SL. The third terminal (i.e., the gate) is connected to TCC 3444, which receives a voltage from voltage source 3446 (thus, the third terminal of transfer transistor 3442 is indirectly connected to voltage source 3446). TCC 3440 is configured to add any of multiple additional impedances to the pathway P4 3408 depending on a temperature sensed by the temperature sensor circuit 3490. TCC 3444 is configured to add any of multiple additional impedances to the pathway from voltage source 3446 to the gate of transfer transistor 3442 depending on a temperature sensed by the temperature sensor circuit 3490. Control circuit 3470 is connected to TCC 3440, TCC 3444, voltage source 924 and voltage source 3446. In one embodiment, control circuit 3470 is configured to adjust the second GIDL current by instructing TCC 3440 to add zero, one or more of the multiple additional impedances between the voltage source 924 and the bit line BL based on the temperature sensed by the temperature sensor circuit 3490 and/or change the timing/slope/magnitude of the voltage applied to the bit line by instructing TCC 3444 to add zero, one or more of the multiple additional impedances based on the temperature sensed by the temperature sensor circuit 3490.

Pathway P3 3410 includes temperature compensation circuit (TCC) 3450 and a transfer transistor 3452 for connecting TCC 3450 to the select line SGD. TCC 3450 receives the voltage (e.g., the voltage pulse) from P3 circuitry 926. Transfer transistor 3452 has three terminals. One terminal is connected to TCC 3450. A second terminal is connected to the select line SGD. The third terminal (i.e., the gate) is connected to TCC 3454, which receives a voltage from voltage source 3456 (thus, the third terminal of transfer transistor 3452 is indirectly connected to voltage source 3456). TCC 3450 is configured to add any of multiple additional impedances to the pathway P3 3410 depending on a temperature sensed by the temperature sensor circuit 3490. TCC 3454 is configured to add any of multiple additional impedances to the pathway from voltage source 3456 to the gate of transfer transistor 3452 depending on a temperature sensed by the temperature sensor circuit 3490. Control circuit 3470 is connected to TCC 3450, TCC 3454, voltage source 926 and voltage source 3456. In one embodiment, control circuit 3470 is configured to adjust the first GIDL current by instructing TCC 3450 to add zero, one or more of the multiple additional impedances between the voltage source 926 and the select line SGD based on the temperature sensed by the temperature sensor circuit 3490 and/or change the timing/slope/magnitude of the voltage applied to the select line SGD by instructing TCC 3454 to add zero, one or more of the multiple additional impedances based on the temperature sensed by the temperature sensor circuit 3490.

Pathway P4 3412 includes TCC 3460 and a transfer transistor 3462 for connecting TCC 3460 to the select line SGS. TCC 3460 receives the voltage (e.g., the voltage pulse) from P4 circuitry 928. Transfer transistor 3462 has three terminals. One terminal is connected to TCC 3460. A second terminal is connected to the select line SGS. The third terminal (i.e., the gate) is connected to TCC 3464, which receives a voltage from voltage source 3466 (thus, the third terminal of transfer transistor 3462 is indirectly connected to voltage source 3466). TCC 3460 is configured to add any of multiple additional impedances to the pathway P4 3412 depending on a temperature sensed by the temperature sensor circuit 3490. TCC 3464 is configured to add any of multiple additional impedances to the pathway from voltage source 3466 to the gate of transfer transistor 3462 depending on a temperature sensed by the temperature sensor circuit 3490. Control circuit 3470 is connected to TCC 3460, TCC 3464, voltage source 928 and voltage source 3466. In one embodiment, control circuit 3470 is configured to adjust the second GIDL current by instructing TCC 3460 to add zero, one or more of the multiple additional impedances between the voltage source 928 and the select line SGS based on the temperature sensed by the temperature sensor circuit 3490 and/or change the timing/slope/magnitude of the voltage applied to the bit line by instructing TCC 3464 to add zero, one or more of the multiple additional impedances based on the temperature sensed by the temperature sensor circuit 3490.

Temperature compensation circuits 3430, 3434, 3440, 3444, 3450, 3454, 3460 and 3464 (separately or together) provide one embodiment of the means for control circuit 3470 to compensate based on temperature for a temperature dependent impedance mismatch between the first pathway and the second pathway during a memory operation on the plurality of non-volatile memory cells 3400. For example, based on a current temperature, control circuit 3470 can change the impedance of the various pathways. Although FIG. 34 shows all four pathways P1, P2, P3 and P4 having the temperature compensation circuits, in some embodiments less than all four pathways include the additional temperature compensation circuits. For example, in one embodiment, only pathway P1 3406 includes the additional temperature compensation circuits.

In one embodiment, any one or more of the voltage sources 922, 924, 926, 928, 3436, 3446, 3456 and 3466 can be combined.

FIG. 35 is a diagram of a NAND string (or other set of connected non-volatile memory cells) and pathways that may provide voltages to select transistors of the NAND string. FIG. 35 provides another example of compensating based on temperature for a temperature dependent impedance mismatch between a first pathway and a second pathway during a memory operation on a plurality of non-volatile memory cells. In one embodiment, the structure of FIG. 35 performs the process of FIG. 33. The NAND string of FIG. 35 is similar to the NAND string of FIG. 34, including drain side select transistor 3401, source side select transistor 3402 and data memory cells 3400. Some of the pathways of FIG. 35 differ from the pathways in FIG. 34. For example, the same voltage (from voltage source 924) is applied to both the pathway P1 3406′ connected to the drain side select transistor 3401 and the pathway P2 3408′ connected to source side select transistor 3402.

Pathway P1 3406′ comprises three sections 3406′a, 3406′b, and 3406′c. Section 3406′a has an impedance which is represented by R_sla and C_sla. Section 3406′b has an impedance which is represented by R_x and C_x. Section 3406′c has an impedance which is represented by R_bl and C_bl. Section 3406′a is connected to P2 circuitry 924 and may include a portion of the source line. Section 3406′c may include the bit line and is connected to one terminal of select transistor 3401. Section 3406′b includes transistors 3502 and 3504, as well as an electrically conductive pathway.

The impedance of one or more of sections 3406′a, 3406′b, and/or 3406′c may depend on the location of the block that is selected for the memory operation. It is also possible that the impedance of one or more of the sections 3406′a, 3406′b, and/or 3406′c do not depend on the location of the block that is selected for the memory operation. The impedance of sections 3406′a, 3406′b, and/or 3406′c may depend on the temperature.

Pathway P2 3408′ is connected to one terminal (e.g., drain terminal) of the second select transistor 3402. Pathway P2 3408′ includes the source line. In one embodiment, the source line is buried in the substrate below the NAND string. Pathway P2 3408′ may include other elements such as switches (e.g., transistors). Pathway P2 3408′ is divided into two sections in FIG. 35. One section has an impedance represented by resistance (R_sla) and a capacitance (C_sla). Another section has an impedance represented by resistance (R_slb) and a capacitance (C_slb). In one embodiment, resistances (R_sla, R_slb) and capacitances (C_sla, C_slb) include a source line resistance and a source line capacitance. The impedance of Pathway P2 3408′ may or may not depend on the location of the selected block. The impedance of Pathway P2 3408′ may depend on the temperature.

P2 circuitry (voltage source) 924 is configured to apply a voltage pulse to one end of pathway P2 3408′. Due to the impedance of pathway P2 3408′, there may be an RC delay along the pathway P2 3408′. Due to the impedance of pathway P2 3408′, there may be a voltage drop along the pathway P2 3408′. Transistors 3502 and 3504 are used to provide a voltage to the first select transistor 3401 along pathway 3406′. Pathways P3 3410 and P4 3412 are the same as depicted in FIG. 34.

The circuit of FIG. 35 operates to perform a GIDL based erase process in the same manner as the circuit of FIG. 13A and FIG. 34. Note that although the example in FIG. 35 is with respect to creating GIDL voltages, the voltages are not required to be GIDL voltages.

The impedances of pathways P1 3406′ and P2 3408′ (which overlap) may be different from each other. In one embodiment, voltage pulses that are applied to the SGD select line and the SGS select line at each end of the NAND string are configured to compensate for different impedances of pathway P1 3406′ and pathway P2 3408′. For example, the voltage pulses applied to the SGD select line and the SGS select line may have different values for one or more voltage pulse attributes (e.g., start time, ramp time, steady state magnitude).

FIG. 35 shows control circuit 3470 connected to all of the voltage sources (VS), including P2 circuitry 924, P3 circuitry 926, P4 circuitry 928, voltage source 3446, 3456 and voltage source 3466. In one embodiment, control circuit 3470 control the voltage sources to apply voltage pulses to pathways P1 3406′, P2 3408′, P3 3410 and P4 3412 that result in asymmetric voltage pulses at the terminals of select transistor 3401 and select transistor 3402. Control circuit 3470 compensates for different impedances of the pathways in step 3308 of FIG. 33, in the manner discussed above with respect to FIGS. 9A-21. For example, control circuit 3470 controls P2 circuitry 924, P3 circuitry 926, and P4 circuitry 928 in order to set one or more attributes of the voltage pulse (or other electrical signal), such as start time, steady state voltage and ramp time to compensate for different impedances of the pathways.

Control circuit 3470 also compensates for location dependent impedance mismatches between pathways during memory operations on data non-volatile memory cells 3400 in step 3306 of FIG. 33, in the manner discussed above with respect to FIGS. 22-31. For example, control circuit 3470 controls P2 circuitry 924, P3 circuitry 926, P4 circuitry 928 in order to set one or more attributes of the voltage pulse (or other electrical signal), such as start time (including delays to the start time), steady state voltage and ramp time to compensate for location dependent impedance mismatch between pathways during memory operations.

The circuit of FIG. 35 also includes temperature sensor circuit 3490 connected to control circuit 3470. Control circuit 3470 compensates, based on the current temperature sensed by temperature sensor circuit 3490, for temperature dependent impedance mismatches between pathways during memory operations on non-volatile memory cells in step 3304 of FIG. 33. For example, control circuit 3470 controls P2 circuitry 924, P3 circuitry 926, and P4 circuitry 928 in order to set one or more attributes of the voltage pulse (or other electrical signal), such as start time (including delays to the start time), steady state voltage and ramp time to compensates for temperature dependent impedance mismatch between pathways during memory operations.

The circuit of FIG. 35 also includes means for changing the impedance of each of the pathways. For example, pathway P1 3406′ includes TCC 3430 and transfer transistor 3432 for connecting TCC 3430 to the bit line (BL). TCC 3430 receives the voltage (e.g., the voltage pulse) from P2 circuitry 924 via pathways 3406′a, 3406′b and 3406′c. Transfer transistor 3432 is connected to TCC 3434, as discussed above with respect to FIG. 34. In one embodiment, control circuit 3470 is configured to adjust the first GIDL current by instructing TCC 3430 to add zero, one or more of the multiple additional impedances between the voltage source 924 and the bit line BL based on the temperature sensed by the temperature sensor circuit 3490 and/or change the timing/slope/magnitude of the voltage applied to the bit line by instructing TCC 3434 to add zero, one or more of the multiple additional impedances based on the temperature sensed by the temperature sensor circuit 3490.

Pathway P2 3408 includes TCC 3440 and transfer transistor 3442 for connecting TCC 3440 to the source line (SL). TCC 3440 receives the voltage (e.g., the voltage pulse) from P2 circuitry 924. Transfer transistor is connected to TCC 3444, as discussed above with respect to FIG. 34. In one embodiment, control circuit 3470 is configured to adjust the second GIDL current by instructing TCC 3440 to add zero, one or more of the multiple additional impedances between the voltage source 924 and the bit line BL based on the temperature sensed by the temperature sensor circuit 3490 and/or change the timing/slope/magnitude of the voltage applied to the bit line by instructing TCC 3444 to add zero, one or more of the multiple additional impedances based on the temperature sensed by the temperature sensor circuit 3490. Control circuit 3470 is configured to control pathway P3 3410, pathway P4 3412 and their temperature compensation circuits in the same manner as described above with respect to FIG. 34. In one embodiment, any one or more of the voltage sources 924, 926, 928, 3436, 3446, 3456 and 3466 can be combined.

FIGS. 36A-C provide more details of the temperature compensation circuits discussed above. FIG. 36A shows temperature compensation circuit 3602, which can represent an example implementation of any of temperature compensation circuits 3430, 3434, 3440, 3444, 3450, 3454, 3460 and 3464. Temperature compensation circuit 3602 comprises an input node A and an output node B.

FIG. 36B is a schematic circuit diagram of temperature compensation circuit 3602, which includes three resistors in series: R1, R2 and R3. Input node A is at one end of R1. Output node B is at one end of R3. Internal node C is between R1 and R2. Internal node D is between R2 and R3. Transistor T1 is connected to nodes A and B. The gate of transistor T1 is connected to control signal line CN1. Transistor T2 is connected to nodes C and B. The gate of transistor T2 is connected to control signal line CN2. Transistor T3 is connected to nodes D and B. The gate of transistor T3 is connected to control signal line CN3. In one embodiment, control signals lines CN1, CN2 and CN3 are connected to a control circuit (e.g., control circuit 3470).

FIG. 36C is a table that explains how to use control signals lines CN1, CN2 and CN3 to add zero, one or more of the multiple additional impedances (e.g., resistances R1, R2 and R3) to a pathway. For example, if the control circuit 3470 raises CN1 high (e.g., 2.5 v, 3.5 v, 5 v or another voltage representing logic high and sufficient to turn on the transistor) while keeping CN2 and CN3 both low (e.g., 0 v or another voltage representing logic low and sufficient to not turn on the transistor), then input node A is shorted to output node B such that R1, R2 and R3 are bypassed (e.g., no impedances are added to the pathway) and no compensation is provided. If control circuit 3470 raises CN2 high, while keeping CN1 and CN3 both low, then compensation is provided by adding R1 to the pathway. If the control circuit 3470 raises CN3 high, while keeping CN1 and CN2 both low, then compensation is provided by adding R1 and R2 (R1+R2) to the pathway. If the control circuit 3470 keeps CN1, CN2 and CN3 low, then compensation is provided by adding R1, R1 and R3 (R1+R2+R3) to the pathway. In one embodiment, if the temperature measured by temperature sensor 3490 is greater than 80 degrees Celsius, then control circuit 3470 raises CN1 high (while keeping CN2 and CN3 both low) so that no compensation is provided. In one embodiment, if the temperature measured by temperature sensor 3490 is between 40-80 degrees Celsius, then control circuit 3470 raises CN2 high (while keeping CN1 and CN3 both low) so that the compensation provided to the pathway comprises R1. In one embodiment, if the temperature measured by temperature sensor 3490 is between 0-40 degrees Celsius, then control circuit 3470 raises CN3 high (while keeping CN1 and CN2 both low) so that the compensation provided to the pathway comprises R1+R2. In one embodiment, if the temperature measured by temperature sensor 3490 is less than 0 degrees Celsius, then control circuit 3470 keeps CN1, CN2 and CN3 low so that the compensation provided to the pathway comprises R1+R2+R3.

In one embodiment, temperature compensation circuits 3430, 3434, 3440, 3444, 3450, 3454, 3460 and 3464 are all the same structure. In other embodiments, one or more of temperature compensation circuits 3430, 3434, 3440, 3444, 3450, 3454, 3460 and 3464 are different structures. In other embodiments, temperature compensation circuit 3602 can include a variable resistor or other apparatus that can change resistance in response to one or more control signals.

Although the temperature compensation circuits are discussed above with respect to adding resistance in response to temperature, the control circuit can also use the temperature compensation circuits to add resistance in response to temperature independent impedance mismatches between pathways and/or in response to location dependent impedance mismatches between pathways. For example, the choice of how to control CN1, CN2 and CN3 can be made by the control circuit (or other entity) based on temperature, location and/or differences of pathways impedances.

FIG. 29 discussed above depicts details of an embodiment for controlling the timing of the signals from the sense amplifiers and SGD driver. FIG. 29 shows a default signal for having a sense amplifier begin to deliver the bit line voltage and a default signal for having an SGD driver 752 begin to deliver the drain side select line voltage. The parameter BL_ON_COMP may be used to delay the start of the bit line voltage by a certain number of clock periods and the parameter SGD_ON_COMP may be used to delay the start of the drain side select line voltage by a certain number of clock periods in order to compensate for location dependent impedance mismatches between pathways. FIG. 37 is a derivative of FIG. 29 that adds another embodiment of compensation for temperature dependent impedance mismatch between the first pathway and the second pathway during a memory operation on the plurality of non-volatile memory cells. The signal BL_T_COMP is used to adjust the amount of delay specified by BL_ON_COMP in order to take into account temperature dependent impedance mismatches between pathways. That is, BL_T_COMP can be within a range and the value chosen by the control circuit is used to adjust the value chosen for the delay of BL_ON_COMP. The shaded region of BL_T_COMP shows the range for adjusting BL_ON_COMP. The signal SGD_T_COMP is used to adjust the amount of delay specified by SGD_ON_COMP in order to take into account temperature dependent impedance mismatches between pathways. That is, SGD_T_COMP can be within a range and the value chosen by the control circuit is used to adjust the amount of delay specified by SGD_ON_COMP. The shaded region of SGD_T_COMP shows the range for adjusting SGD_ON_COMP. Therefore, FIG. 37 depicts one embodiment of compensating for temperature dependent impedance mismatch between pathways in combination with compensating for a location dependent impedance mismatch between the pathways (based on distance from the plurality of non-volatile memory cells to one or more voltage sources).

The above discussion provides technology to compensate for impedance mismatches between different pathways. This technology can be used to increase performance and save power.

One embodiment includes a non-volatile storage apparatus comprising a plurality of non-volatile memory cells; a first pathway connected to the plurality of non-volatile memory cells; a second pathway connected to the plurality of non-volatile memory cells; and a control circuit connected to the first pathway and the second pathway. The control circuit is configured to compensate based on temperature for a temperature dependent impedance mismatch between the first pathway and the second pathway during a memory operation on the plurality of non-volatile memory cells.

One embodiment includes a method of operating a non-volatile storage apparatus comprising sensing a temperature and compensating for a mismatch of RC delays between a first pathway connected to a plurality of non-volatile memory cells and a second pathway connected to the plurality of non-volatile memory cells by adjusting impedance of the first pathway based on the sensed temperature. Some implementations further comprise erasing the plurality of non-volatile memory cells, the compensating for the mismatch of RC delays is performed for the erasing of the plurality of memory cells; compensating for an impedance mismatch between the first pathway and the second pathway based on distance to one or more voltage sources; and compensating for a temperature independent impedance mismatch between the first pathway and the second pathway by adjusting magnitude, start time and/or ramp time of a voltage pulse. In some examples, the first pathway includes a temperature compensation circuit, the temperature compensation circuit is configurable to add any of multiple additional impedances to the first pathway, and the adjusting impedance of the first pathway comprises configuring the temperature compensation circuit to add one or more of the additional impedances to the first pathway.

One embodiment includes a non-volatile storage apparatus comprising a temperature sensor configured to sense temperature; a NAND string comprising a first select transistor, a second select transistor, and data memory cells between the first select transistor and the second select transistor; a bit line connected to the first select transistor; a source line connected to the second select transistor; a first select line connected to the first select transistor; a second select line connected to the second select transistor; and a control circuit connected to the bit line, the source line, the first select line; the second select line and the temperature circuit. The control circuit is configured to erase the data memory cells by applying voltage pulses to the bit line, the source line, the first select line and the second select line to cause a first gate induced drain leakage (GIDL) current from the first select transistor into the data memory cells and a second GIDL current from the second select transistor into the data memory cells. The first GIDL current and the second GIDL current cause the data memory cells to change threshold voltages. The control circuit is configured to adjust at least one of the first GIDL current and the second GIDL current based a temperature sensed by the temperature sensor.

For purposes of this document, reference in the specification to “an embodiment,” “one embodiment,” “some embodiments,” or “another embodiment” may be used to describe different embodiments or the same embodiment.

For purposes of this document, a connection may be a direct connection or an indirect connection (e.g., via one or more others parts). In some cases, when an element is referred to as being connected or coupled to another element, the element may be directly connected to the other element or indirectly connected to the other element via intervening elements. When an element is referred to as being directly connected to another element, then there are no intervening elements between the element and the other element. Two devices are “in communication” if they are directly or indirectly connected so that they can communicate electronic signals between them.

For purposes of this document, the term “based on” may be read as “based at least in part on.”

For purposes of this document, without additional context, use of numerical terms such as a “first” object, a “second” object, and a “third” object may not imply an ordering of objects, but may instead be used for identification purposes to identify different objects.

For purposes of this document, the term “set” of objects may refer to a “set” of one or more of the objects.

The foregoing detailed description has been presented for purposes of illustration and description. It is not intended to be exhaustive or to limit to the precise form disclosed. Many modifications and variations are possible in light of the above teaching. The described embodiments were chosen in order to best explain the principles of the proposed technology and its practical application, to thereby enable others skilled in the art to best utilize it in various embodiments and with various modifications as are suited to the particular use contemplated. It is intended that the scope be defined by the claims appended hereto. 

What is claimed is:
 1. A non-volatile storage apparatus, comprising: a plurality of non-volatile memory cells; a first pathway connected to the plurality of non-volatile memory cells; a second pathway connected to the plurality of non-volatile memory cells; and a control circuit connected to the first pathway and the second pathway, the control circuit is configured to compensate based on temperature for a temperature dependent impedance mismatch between the first pathway and the second pathway during a memory operation on the plurality of non-volatile memory cells.
 2. The non-volatile storage apparatus of claim 1, wherein: the control circuit is configured to compensate based on temperature for the temperature dependent impedance mismatch between the first pathway and the second pathway by adjusting an impedance of the first pathway based on temperature.
 3. The non-volatile storage apparatus of claim 1, wherein: the control circuit is configured to compensate based on temperature for the temperature dependent impedance mismatch between the first pathway and the second pathway by delaying a start time of a voltage pulse applied to the first pathway based on temperature.
 4. The non-volatile storage apparatus of claim 1, wherein: the control circuit is configured to compensate based on temperature for the temperature dependent impedance mismatch between the first pathway and the second pathway by changing a steady state magnitude of a voltage pulse applied to the first pathway based on temperature.
 5. The non-volatile storage apparatus of claim 1, wherein: the memory operation is an erase operation; and the control circuit is configured to compensate based on temperature for the temperature dependent impedance mismatch between the first pathway and the second pathway when providing voltage pulses to the plurality of non-volatile memory cells for the erase operation.
 6. The non-volatile storage apparatus of claim 1, further comprising: a temperature sensor circuit connected to the control circuit, the temperature sensor circuit is configured to sense a current temperature, the control circuit is configured to compensate based on the current temperature from the temperature sensor for the temperature dependent impedance mismatch between the first pathway and the second pathway.
 7. The non-volatile storage apparatus, of claim 1 wherein: the control circuit is configured to compensate based on temperature for the temperature dependent impedance mismatch between the first pathway and the second pathway by adjusting an impedance of the first pathway based on compensating for the first pathway changing impedance per a change in temperature at a different rate than the second pathway changing impedance per the change in temperature.
 8. The non-volatile storage apparatus of claim 1, further comprising: a temperature sensor configured to sense temperature, the temperature sensor is connected to the control circuit, the plurality of non-volatile memory cells comprise a NAND string that includes a first select transistor and a second select transistor, the plurality of non-volatile memory cells are between the first select transistor and the second select transistor; a bit line connected to the first select transistor and the control circuit, the first pathway includes the bit line; a source line connected to the second transistor; and the control circuit, the second pathway include the source line; a first select line connected to the first select transistor and the control circuit; and a second select line connected to the second select transistor and the control circuit.
 9. The non-volatile storage apparatus, of claim 8, wherein: the control circuit is configured to erase the plurality of non-volatile memory cells by applying voltage pulses to the bit line, the source line, the first select line and the second select line to cause a first gate induced drain leakage (GIDL) current from the first select transistor into the data memory cells and a second GIDL current from the second select transistor into the data memory cells, the first GIDL current and the second GIDL current cause the data memory cells to change threshold voltages; and the control circuit is configured to compensate based on temperature for the temperature dependent impedance mismatch between the first pathway and the second pathway by adjusting at least one of the first GIDL current and the second GIDL current based a temperature sensed by the temperature sensor.
 10. The non-volatile storage apparatus of claim 8, further comprising: a transfer transistor having a first terminal, a second terminal and a third terminal; a first temperature compensation circuit connected to the first terminal, the first temperature compensation circuit is configured to add any of multiple additional impedances to the first pathway depending on a temperature sensed by the temperature sensor, the second terminal is connected to the bit line; a first voltage source connected to the first temperature compensation circuit; and a second voltage source connected to the third terminal.
 11. The non-volatile storage apparatus of claim 10, further comprising: a second temperature compensation circuit connected to and between the second terminal and the second voltage source, the second temperature compensation circuit is configured to add any of multiple additional impedances between the second terminal and the second voltage source.
 12. The non-volatile storage apparatus of claim 1, wherein: the control circuit is configured to compensate for the temperature dependent impedance mismatch between the first pathway and the second pathway and compensate for a temperature independent impedance mismatch between the first pathway and the second pathway.
 13. The non-volatile storage apparatus of claim 1, wherein: the control circuit is configured to compensate for the temperature dependent impedance mismatch between the first pathway and the second pathway in combination with compensating for a location dependent impedance mismatch between the first pathway and the second pathway based on distance from the plurality of non-volatile memory cells to one or more voltage sources.
 14. The non-volatile storage apparatus of claim 1, further comprising: a third pathway connected to the plurality of non-volatile memory cells; and a fourth pathway connected to the plurality of non-volatile memory cells, the control circuit is connected to the third pathway and the fourth pathway, the control circuit is configured to adjust the first pathway to compensate for the temperature dependent impedance mismatch between the first pathway and the second pathway, the control circuit is configured to compensate for an impedance mismatch between the third pathway and the fourth pathway.
 15. A method of operating a non-volatile storage apparatus, comprising: sensing a temperature; and compensating for a mismatch of RC delays between a first pathway connected to a plurality of non-volatile memory cells and a second pathway connected to the plurality of non-volatile memory cells by adjusting impedance of the first pathway based on the sensed temperature.
 16. The method of claim 15, further comprising: erasing the plurality of non-volatile memory cells, the compensating for the mismatch of RC delays is performed for the erasing of the plurality of memory cells.
 17. The method of claim 15, wherein: the first pathway includes a temperature compensation circuit, the temperature compensation circuit is configurable to add any of multiple additional impedances to the first pathway; and the adjusting impedance of the first pathway comprises configuring the temperature compensation circuit to add one or more of the additional impedances to the first pathway.
 18. The method of claim 15, further comprising: compensating for an impedance mismatch between the first pathway and the second pathway based on distance to one or more voltage sources.
 19. A non-volatile storage apparatus, comprising: a temperature sensor circuit configured to sense temperature; a vertical NAND string comprising a first select transistor, a second select transistor, and data memory cells between the first select transistor and the second select transistor; a bit line connected to the first select transistor; a source line connected to the second select transistor; a first select line connected to the first select transistor; a second select line connected to the second select transistor; and a control circuit connected to the bit line, the source line, the first select line the second select line and the temperature sensor circuit; the control circuit is configured to perform an erase operation on the data memory cells by applying voltage pulses to the bit line, the source line, the first select line and the second select line to cause a first gate induced drain leakage (GIDL) current from the first select transistor into the data memory cells and a second GIDL current from the second select transistor into the data memory cells, the first GIDL current and the second GIDL current cause the data memory cells to change threshold voltages and become erased; the control circuit is configured to compensate for a temperature dependent impedance mismatch between the bit line and the source line during the erase operation on the data memory cells by adjusting at least one of the first GIDL current and the second GIDL current based on a temperature sensed by the temperature sensor circuit.
 20. The non-volatile storage apparatus of claim 19, further comprising: a voltage source; and a temperature compensation circuit connected to and between the bit line and the voltage source, the temperature compensation circuit is connected to the control circuit, the temperature compensation circuit is configured to add any of multiple additional impedances between the voltage source and the bit line in response to the control circuit, the control circuit is configured to adjust the first GIDL current by instructing the temperature compensation circuit to add one or more of the multiple additional impedances between the voltage source and the bit line based on the temperature sensed by the temperature sensor circuit. 